JPWO2015001896A1 - Liquid crystal display - Google Patents

Abstract

The liquid crystal display device of the present invention is an array comprising a counter substrate (100) provided with a black matrix (2) having a plurality of pixel openings, an optical sensor (S1), an active element, and metal wiring. And a substrate (300), and a liquid crystal cell having a liquid crystal layer sandwiched between both substrates (100, 300), wherein the black matrix (2) has a detection wavelength range of 680 nm to 800 nm. The transmittance is 50% or more, and the transmittance is such that the transmittance is higher on the longer wavelength side. The photosensor (S1) has a sensitivity range including the detection wavelength range, is located closer to the liquid crystal layer than the active element, and is formed so as to overlap the black matrix (2) when viewed in plan. ing. The metal wiring is formed of copper or a copper alloy at least on the surface layer so as to fill a region overlapping the optical sensor (S1) when viewed in plan.

Description

The present invention relates to a liquid crystal display device including an optical sensor, and more particularly, to a liquid crystal display device capable of improving the sensitivity in the infrared region of the optical sensor.
This application claims priority based on Japanese Patent Application No. 2013-142043 for which it applied to Japan on July 5, 2013, and uses the content here.

As a means for directly inputting selection information and the like from a display screen of a liquid crystal display device, a capacitive method using a touch panel has recently been widely used. Generally, the touch panel is used by being attached to a display screen of a liquid crystal display device or the like.
However, the touch panel has a problem that it is difficult for an observer away from the display screen to operate. In addition, since the thickness and weight of the touch panel are added to the display device, the touch panel has been obstructed to be thin and light in small devices such as mobile phones and tablets.

  For this reason, an optical sensor is provided inside the liquid crystal display device so that an observer from a position away from the display screen can perform an operation, and sensing using the optical sensor is being studied. In addition, in a liquid crystal display device provided with an optical sensor, it is desired to realize accurate color separation in fields such as imaging, color copying, and optical communication.

  For example, Patent Document 1 uses a color filter substrate having a detection filter and a photoelectric sensor, and performs input from a screen using visible light having a first wavelength and invisible light having a second wavelength. An input technique is disclosed. Specifically, in order to solve the problem that the number of processes is increased by separately providing an infrared filter that transmits infrared light that is invisible light, a technique for solving such a problem by overlapping the colors of the color filters. Is described.

  However, in the structure in which the colors of the color filters described in Patent Document 1 are overlapped, there is a possibility that an inappropriate step is generated in the liquid crystal alignment. Further, in the structure in which the colors of the color filters are overlapped, the transmission band of the detection filter (infrared filter) is 800 nm or later, and this structure is not suitable for red, green, and blue color separation. Specifically, there is a problem that light in a wavelength range from about 680 nm to about 800 nm cannot be separated well.

  For example, Patent Document 2 discloses a technique in which a transistor is provided at a position overlapping a photodiode. However, the technique described in Patent Document 2 is a technique for manufacturing a display device at a low cost or reducing the size and weight, and does not disclose any technique for improving the sensitivity of a photodiode that is an optical sensor. Also, wiring technology and oxide semiconductor technology related to transistors and photodiodes are not disclosed.

  Further, for example, Patent Document 3 discloses a technique related to an active matrix display substrate including a thin film transistor. However, Patent Document 3 does not disclose any technology for improving the sensitivity of an optical sensor or oxide semiconductor technology. Patent Document 3 describes performing wet etching on copper or an alloy containing copper using an alkaline aqueous solution containing an oxidizing agent.

  However, as disclosed in Patent Document 3, it is difficult to perform wet etching so as not to damage the amorphous silicon constituting the field effect transistor (TFT, Thin-Film Transistor). Further, when dry etching is performed on copper or an alloy containing copper, contamination by copper ions is significant, and it is more difficult to perform dry etching so as not to damage the amorphous silicon. Further, even in dry etching when forming a channel layer of amorphous silicon, the channel portion may be contaminated, and it has not been put to practical use in a copper wiring technique in a TFT process of an amorphous recon semiconductor.

Japanese Unexamined Patent Publication No. 2009-129397 Japanese Unexamined Patent Publication No. 2013-008991 Japanese Unexamined Patent Publication No. 10-307303

  The present invention has been made in view of such a conventional situation, and an object thereof is to provide a liquid crystal display device excellent in sensitivity while using optical sensing.

In order to solve the above problems, some embodiments of the present invention provide the following liquid crystal display device.
The liquid crystal display device according to the first aspect of the present invention includes a first transparent substrate, and at least a black matrix having a plurality of pixel openings and a transparent resin layer are stacked in this order on the first transparent substrate. A counter substrate, a second transparent substrate, and a plurality of active elements each including at least a photosensor, an oxide semiconductor as a channel layer, and a metal wiring are disposed on the second transparent substrate. An array substrate, and a liquid crystal cell formed by bonding the counter substrate and the array substrate so as to face each other through a liquid crystal layer, wherein the black matrix detects light having a wavelength of 680 nm to 800 nm. In the wavelength region, the transmittance is 50% or more, and the transmittance is such that the transmittance is higher on the longer wavelength side than the wavelength at which the transmittance is 50% or more. The sensor has a sensitivity range including the detection wavelength range, is located closer to the liquid crystal layer than the active element, and is formed so as to overlap the black matrix when viewed from the counter substrate. The metal wiring has at least a surface layer made of copper or a copper alloy, and is formed so as to fill a region overlapping with the optical sensor when viewed in plan from the counter substrate.

The liquid crystal display device according to the second aspect of the present invention has a first transparent substrate, has at least a plurality of pixel openings on the first transparent substrate, and shields light in the visible light region and infrared region. A counter substrate formed by laminating a light-shielding layer, a color filter having red, green, and blue colored pixels in each of the plurality of pixel openings, a black matrix, and a transparent resin layer in this order. An array substrate comprising: a second transparent substrate; and a plurality of active elements each including at least a photosensor, an oxide semiconductor as a channel layer, and a metal wiring on the second transparent substrate. A liquid crystal cell in which the counter substrate and the array substrate are bonded to each other through a liquid crystal layer, and the black matrix transmits light in a detection wavelength region of light wavelength of 680 nm to 800 nm. Rate is A superimposing part that has 0% or more and has a transmission characteristic that further increases the transmittance on a longer wavelength side than the wavelength at which the transmittance is 50% or more, and overlaps with any of the red layer, the green layer, and the blue layer have. The sensor has a sensitivity range including the detection wavelength range, is located closer to the liquid crystal layer than the active element, and is formed so as to overlap the black matrix when viewed from the counter substrate. The metal wiring has at least a surface layer made of copper or a copper alloy, and is formed so as to fill a region overlapping with the optical sensor when viewed in plan from the counter substrate.

  A liquid crystal display device according to a third aspect of the present invention includes a first transparent substrate, a black matrix having at least a plurality of pixel openings on the first transparent substrate, and a red layer on the plurality of pixel openings. A counter substrate formed by laminating a color filter having green and blue colored pixels and a transparent resin layer in this order, and a second transparent substrate, on the second transparent substrate An array substrate comprising at least a photosensor, a plurality of active elements each including an oxide semiconductor as a channel layer, and a metal wiring; and the liquid crystal layer includes the counter substrate and the array substrate. The black matrix has a transmittance of 50% or more in the detection wavelength range of light wavelength of 680 nm or more and 800 nm or less, and the transmittance is 50% or more. And has a transmission characteristic from the consisting wavelength becomes further high transmittance in a long wavelength side, the red layer, the green layer, having a superimposition unit that superimposes either of the blue layer. The sensor has a sensitivity range including the detection wavelength range, is located closer to the liquid crystal layer than the active element, and is formed so as to overlap the black matrix when viewed from the counter substrate. The metal wiring has at least a surface layer made of copper or a copper alloy, and is formed so as to fill a region overlapping with the optical sensor when viewed in plan from the counter substrate.

  In the liquid crystal display device according to the aspect of the present invention, it is preferable that the black matrix includes a plurality of organic pigments as main coloring materials.

  In the liquid crystal display device of the above aspect of the present invention, the oxide semiconductor is preferably a composite metal oxide selected from two or more of gallium, indium, zinc, hafnium, tin, yttrium, titanium, germanium, and silicon. .

  In the liquid crystal display device according to the aspect of the present invention, the color filter includes a position where the red layer and the black matrix overlap, a position where the green layer and the black matrix overlap, and the blue layer and the black matrix. It is preferable to have the said superimposition part in each of the position where and overlap. Furthermore, it is preferable that the optical sensor is provided in a lower portion of each of the colored pixels of the red layer, the green layer, and the blue layer and in a lower portion of the overlapping portion in a plan view.

  The liquid crystal display device according to the aspect of the present invention preferably further includes a backlight unit that is provided on the opposite side of the liquid crystal cell from the counter substrate and emits light in a wavelength region longer than 680 nm.

  It is preferable that the liquid crystal display device according to the aspect of the present invention further includes an optical sensor that is formed so as to overlap the pixel opening when viewed in plan from the counter substrate and has a sensitivity range at least in the visible light range.

  According to the liquid crystal display device of the present invention, it is possible to provide a liquid crystal display device with excellent sensitivity while using optical sensing.

It is a graph which shows the reflective characteristic of the metal according to a wavelength. It is a principal part expanded sectional view which shows the liquid crystal display device which concerns on 1st Embodiment of this invention. FIG. 2 is a partial plan view showing a plurality of pixel openings of the liquid crystal display device according to the first embodiment of the present invention. 1 is a schematic cross-sectional view showing a liquid crystal display device according to a first embodiment of the present invention. It is a graph which shows the wavelength selective transmission characteristic of a black matrix. It is sectional drawing along the A-A 'line of FIG. It is a partial top view which shows the several pixel opening part of the liquid crystal display device which concerns on 2nd Embodiment of this invention. It is a schematic cross section which shows the liquid crystal display device which concerns on 2nd Embodiment of this invention. It is a principal part expanded sectional view which shows the liquid crystal display device which concerns on 2nd Embodiment of this invention. It is a graph which shows the transmission characteristic which accumulated the transmission characteristic of the green layer, and the transmission characteristic of the green layer and the black matrix. It is a graph which shows the transmission characteristic which accumulated the transmission characteristic of the red layer, and the transmission characteristic of the red layer and the black matrix. It is a graph which shows the transmission characteristic which accumulated the transmission characteristic of the blue layer, and the transmission characteristic of the blue layer and the black matrix. It is a fragmentary sectional view which shows the liquid crystal display device of 3rd Embodiment.

Hereinafter, embodiments of a liquid crystal display device according to the present invention will be described with reference to the drawings. The following embodiments are specifically described for better understanding of the gist of the invention, and do not limit the present invention unless otherwise specified. In addition, in the drawings used in the following description, in order to make the features of the present invention easier to understand, there is a case where a main part is shown in an enlarged manner for convenience, and the dimensional ratio of each component is the same as the actual one. Not necessarily.
In each embodiment, the same or substantially the same function and component are denoted by the same reference numerals, and description thereof is omitted or only described when necessary. Moreover, in each embodiment, only a characteristic part is demonstrated and description is abbreviate | omitted about the part which is not different from the component of a well-known liquid crystal display device.

  In each embodiment, the display unit of the liquid crystal display device will be described as a pixel. A pixel is a minimum display unit of a polygon having at least two parallel sides and partitioned by a black matrix. In each embodiment, the pixel is substantially synonymous with the opening of the black matrix or the opening of the light shielding layer. In each embodiment, various liquid crystal driving methods can be applied.

  For example, an IPS method (In Plane Switching, a horizontal electric field method using horizontally aligned liquid crystal molecules), a VA method (Vertical Alignment: a vertical electric field method using vertically aligned liquid crystal molecules), a HAN (Hybrid-aligned Nematic), and TN (Twisted Nematic), OCB (Optically Compensated Bend), CPA (Continuous Pinwheel Alignment), ECB (Electrically Controlled Birefringence) or TBA (TransBend). The liquid crystal layer may include liquid crystal molecules having positive dielectric anisotropy or liquid crystal molecules having negative dielectric anisotropy.

  The rotation direction (operation direction) of the liquid crystal molecules when the liquid crystal driving voltage is applied may be a direction parallel to the surface of the substrate or a direction rising perpendicular to the plane of the substrate. The direction of the liquid crystal driving voltage applied to the liquid crystal molecules may be a horizontal direction, a two-dimensional or three-dimensional oblique direction, or a vertical direction.

  As a semiconductor applicable to the optical sensor of each embodiment, an amorphous silicon semiconductor having sensitivity from the visible region (for example, a wavelength of light of 400 nm to 700 nm) to an infrared region, and a polycrystal having a main sensitivity in the near vision outside region and the blue wavelength region. Examples include a silicon semiconductor, a microcrystalline silicon semiconductor, a silicon germanium (SiGe) semiconductor, an oxide semiconductor typified by IGZO (registered trademark) and ITZO (registered trademark).

  When these semiconductors are used, it is desirable to adjust the band gap to give the sensitivity range of the optical sensor to the target wavelength range. In the SiGe semiconductor, the band gap can be continuously changed by the addition ratio of Ge, the light receiving wavelength of the light receiving element can be adjusted, and the sensitivity in the infrared region can be imparted. A SiGe semiconductor having a Ge concentration gradient can also be used. For example, by using a semiconductor compound such as GaAs, InGaAs, PbS, PbSe, SiGe, or SiGeC, an optical sensor suitable for infrared light detection can be formed.

  A liquid crystal display device incorporating a photosensor is easily affected by temperature and a backlight unit. In order to prevent an input malfunction of a finger or a laser due to noise caused by the backlight unit or external light, compensation of the optical sensor may be required. When a silicon photodiode having a channel layer formed of polysilicon or amorphous silicon is used as an optical sensor, a dark current may be generated due to a change in environmental temperature or the like, and noise other than observation light may be added to observation data. .

  As a switching element for driving a liquid crystal layer or an optical sensor, a field effect transistor (active element, TFT) including an oxide semiconductor as a channel layer can be employed. Here, an oxide semiconductor is an oxide semiconductor containing at least two kinds of oxides of indium, gallium, tin, zinc, hafnium, yttrium, titanium, germanium, and silicon. As this oxide semiconductor, a composite metal oxide of indium, gallium, and zinc called IGZO can be exemplified. The channel layer formed using an oxide semiconductor may be either an amorphous material or a crystallized material, but a crystallized material is preferably used from the viewpoint of stability of electric characteristics (eg, Vth) of the transistor. The channel thickness of the oxide semiconductor is preferably about 2 nm to 80 nm, for example.

  The metal wiring of the array substrate having such a TFT can be at least two layers of metal wiring using copper or a copper alloy as a surface layer. As the metal wiring, for example, a copper alloy in which one or more elements selected from magnesium, titanium, nickel, molybdenum, indium, tin, zinc, aluminum, calcium, and the like are added to copper can be used. The element added to copper is not limited to the above elements, and the amount added to copper is preferably 3 atomic percent or less with respect to the atomic percent of copper. If it is 1 atomic percent or less, the light reflectance of the metal wiring is not greatly reduced, and a high light reflectance can be secured. An addition amount of 1 atomic percent or less is more preferable.

  The surface layer of the metal wiring referred to here is a metal layer on the liquid crystal layer side (position close to the liquid crystal layer, optical sensor side, position close to the optical sensor) when the array substrate is viewed as a cross section along the thickness direction. (First metal layer). The lower metal layer (second metal layer) is located on the array substrate side (position close to the array substrate) with respect to the surface copper or copper alloy.

  For the second metal layer, a refractory metal such as titanium, molybdenum, tantalum or tungsten or an alloy containing these materials can be preferably employed. A copper alloy of the first metal layer or a titanium alloy having an etching rate close to that of the first metal layer can be selected as the second metal layer. The film thickness of the copper or copper alloy and the film thickness of the second metal layer are preferably formed to be in the range of 50 nm to 500 nm, for example.

  The method for forming the first metal layer and the second metal layer using the oxide semiconductor layer, copper or copper alloy as the surface layer is not limited, but vacuum film formation by sputtering is preferable in terms of production efficiency. With the sputtering film forming apparatus, a metal wiring composed of the first metal layer and the second metal layer can be efficiently formed on a transparent substrate having a large area with high throughput. The first metal layer made of copper or copper alloy on the oxide semiconductor is selectively etched with, for example, an oxidizing alkali etchant, and a pattern can be formed as a metal wiring without damaging the oxide semiconductor. A metal wiring and a metal layer using copper or a copper alloy as a surface layer, which has been difficult with a silicon-based semiconductor transistor, can be easily processed, and a transistor element can be formed.

  For example, as shown in FIG. 1, the first metal layer made of copper or a copper alloy exhibits a high reflectance on the long wavelength side of light, particularly 600 nm or more. As shown in FIG. 2, by forming a metal wiring so as to overlap (fill the lower part) with the first optical sensor S1 and the second optical sensor S2, directly incident light and reflected light reflected by the metal wiring. Can be received, and the light receiving sensitivity of the first optical sensor S1 and the second optical sensor S2 can be improved. In the embodiment shown in FIG. 2, the transistor including the oxide semiconductor channel layer 26 is shown as a bottom gate structure, but is not limited to the bottom gate structure. For example, a transistor having a top gate structure, a double gate structure, a dual gate structure, or the like can be employed.

<First Embodiment>
When performing color display, the liquid crystal display device according to the first embodiment is assumed to be a liquid crystal display device including a backlight unit including, for example, a red light emitting LED, a green light emitting LED, and a blue light emitting LED. When color display is not performed, a white light emitting LED or a fluorescent lamp may be used as the backlight unit.

FIG. 3 is a partial plan view showing a plurality of pixel openings of the liquid crystal display device according to the embodiment of the present invention. In FIG. 3, only 8 pixels are shown, but in actuality, a display surface of a liquid crystal display device in which a large number of pixels, for example, 1280 pixels in the X direction and 768 pixels in the Y direction are arranged. Part.
The plurality of pixels P, P... Are partitioned by pixel openings 20 formed in the black matrix 2. The optical sensor includes a first optical sensor (optical sensor) S1 and a second optical sensor S2, and is disposed in each pixel P. The structure in which the first photosensor S1 and the second photosensor S2 are arranged is a structure in which one set of photosensors is provided for a plurality of pixels, that is, a plurality of sets of photosensors are not provided for all pixels. One set of photosensors may be arranged in one selected pixel (at a predetermined interval) among the pixels (decimation arrangement).

  The first photosensor S1 is disposed at a position covered with the black matrix 2 (position overlapping the black matrix 2). On the other hand, the second photosensor S2 is disposed in the pixel opening 20 so that incident light enters from the outside to the inside of the display surface. The first photosensor S1 and the second photosensor S2 are not necessarily arranged in the same pixel P, but the first photosensor S1 and the second photosensor S2 are provided at positions close to each other for the calculation of received light data. It is preferable.

  In the present embodiment, by subtracting the light reception data of the first light sensor S1 from the light reception data of the second light sensor S2, it is possible to extract the light reception data in the visible region excluding the infrared region. At the time of this subtraction, for example, the first photosensor S1 and the second photosensor S2 can subtract the dark current that each has, so that highly accurate received light data can be obtained.

  FIG. 4 is a schematic cross-sectional view showing a liquid crystal display device 400 provided with the backlight unit 13 on the back surface side (position close to the back surface) of the array substrate 300. A polarizing plate 15 is provided as an optical control element on the front and back surfaces of the liquid crystal cell 200, and the first photosensor S <b> 1 and the second photosensor S <b> 2 are disposed below the liquid crystal layer 6. For example, a pointer such as the observer's finger 16 reflects the light 18 emitted from the backlight unit 13 and is received as incident light 19 by the first optical sensor S1 and the second optical sensor S2. The incident light 19 is not limited to the reflected light from the pointer such as the finger 16 but may be incident light from a laser pointer, for example. A part of the incident light 19 is reflected by the metal wiring 24 disposed so as to fill the lower part of the first optical sensor S1, and is received by the first optical sensor S1. Thereby, the detection sensitivity of the incident light 19 is increased. The backlight unit 13 includes, for example, a red light emitting LED, a green light emitting LED, a blue light emitting LED, and an infrared light emitting LED as the light source 14.

2 is a cross-sectional view showing a cross section taken along line BB ′ of FIG.
Below the first photosensor S1, a metal wiring 24 constituting a source line, a drain line, or the like, or a dummy pattern 25 made of a metal layer is provided at a portion where the metal wiring 24 is not formed. For example, the dummy pattern 25 can be simultaneously formed in the same layer as the gate line in the manufacturing process. Although not shown in FIG. 2, a metal wiring 24 such as a source line or a drain line, or a dummy pattern 25 made of a metal layer is provided at a portion where the metal wiring 24 is not formed, below the second photosensor S2. Yes.

  The first photosensor S1 and the second photosensor S2 (not shown) are, in order, in a direction from a position close to the liquid crystal layer 6 to a position far from the liquid crystal layer 6, a P-type semiconductor amorphous silicon 35, and an intrinsic semiconductor (I-type) amorphous silicon 36. , N-type semiconductor amorphous silicon 37 is stacked. For example, a P-type semiconductor amorphous silicon 35 can be formed to a thickness of 5 nm to 50 nm, an I-type semiconductor amorphous silicon 36 can be formed to a thickness of 100 nm to 1000 nm, and an N-type semiconductor amorphous silicon 37 can be formed to a thickness of 20 nm to 200 nm. .

An upper electrode 21 and a lower electrode 22 functioning as a light-transmitting conductive film (transparent conductive film) are disposed on the upper surface of the P-type semiconductor amorphous silicon 35 and the lower surface of the N-type semiconductor amorphous silicon 37, respectively. Yes. The transparent conductive film is made of, for example, ITO (Indium Tin
Oxide) is formed from a conductive metal oxide. The upper electrode 21 can be, for example, a zigzag fine line pattern or a comb-like thin line pattern. By devising the pattern shape of the upper electrode 21, the current collection effect by the lower electrode 22 can be increased.

  In order to improve sensitivity on the first optical sensor S1 and the second optical sensor S2, for example, a columnar structure, a concavo-convex structure, a quantum dot, or the like may be laminated with a transparent resin or the like. It is also preferable to add particles or dyes having a wavelength conversion function to these structures. The formation positions of the P-type semiconductor and the N-type semiconductor may be interchanged, or may be formed side by side in the horizontal direction. Amorphous silicon can also be microcrystalline silicon.

  As shown in the drawing, the first optical sensor S1 and the second optical sensor S2 are formed on a substrate on which a transistor made of an oxide semiconductor is formed in advance using, for example, a known amorphous silicon semiconductor process.

  The first photosensor S <b> 1 is electrically connected to the electrode 24 from the lower electrode 22 through the contact hole 23 and the metal wiring 20. The upper electrode 21 of the first photosensor S1 is connected to a common electrode wiring through a contact hole (not shown). Thereby, when the reset signal is given, the potential of the first photosensor S1 can be made a common potential. The insulating layer 33 is made of, for example, silicon oxide, silicon oxynitride, aluminum oxide, a mixed oxide containing these materials, or a photosensitive and alkali developable acrylic resin. The second photosensor S2 (not shown in FIG. 2) can be formed in the same manner as the first photosensor S1.

  A plurality of transistors can be provided below the first optical sensor S1 and the second optical sensor S2, and the first optical sensor S1 and the second optical sensor S2 can be driven. The plurality of transistors made of an oxide semiconductor can be used as, for example, a selection transistor, an amplifying transistor, a resetting transistor, a liquid crystal driving transistor, or the like of the first photosensor S1 or the second photosensor S2. When the capacity of the first photosensor S1 or the second photosensor S2 is small, a capacitor can be provided in an auxiliary manner.

  As shown in FIG. 1, the light reflectance of copper or copper alloy constituting the metal wiring 24 exhibits a high reflectance on the long wavelength side of light, particularly 600 nm or more. As shown in FIG. 2, the pattern of the metal wiring 24 is disposed in a region that fills the lower part of the first photosensor S1 and the second photosensor S2, that is, overlaps the first photosensor S1 and the second photosensor S2. Thus, the first light sensor S1 and the second light sensor S2 can receive the reflected light reflected by the metal wiring 24. As a result, the light receiving efficiency of the first photosensor S1 and the second photosensor S2 can be improved.

  The black matrix 2 in this embodiment has a transmittance of 50% or more and a transmittance of 50% or more in a detection wavelength region of 680 nm or more and 800 nm or less as indicated by a line BLK1 indicating wavelength selective transmission characteristics in FIG. It has a transmission characteristic that has a higher transmittance on the longer wavelength side than the wavelength, and does not substantially transmit visible light but transmits infrared light. The half-value wavelength of the black matrix 2 can be adjusted within a range of about 680 nm to 800 nm by selecting and combining organic pigment species. Here, the half-value wavelength is defined as the wavelength of light at which the transmittance is 50%. The material configuration of the black matrix 2 will be described in detail later.

FIG. 6 is a cross-sectional view taken along the line AA ′ in FIG. 3, and a configuration as a liquid crystal display device will be described. Note that illustration of a driving transistor, a polarizing plate, an alignment film, and the like of the liquid crystal layer is omitted.
The liquid crystal molecules of the liquid crystal layer 6 in FIG. 6 have an initial horizontal orientation on one surface of the array substrate 30 and rotate on the surface with a voltage applied between the pixel electrode 31 and the common electrode 32. Display is performed by controlling the transmittance of light emitted from the backlight unit. The dielectric anisotropy of the liquid crystal molecules may be positive or negative. A transparent electrode such as ITO is not formed on the transparent resin layer 12 (first transparent resin layer) of the counter substrate 100. The orientation film on the transparent resin layer 12 is not shown.

Second Embodiment
In the second embodiment, as shown in FIGS. 7 and 8, the red layer R, the green layer G, and the blue layer B are located at positions corresponding to the pixel openings 20 formed in the black matrix 2 of the liquid crystal display device. It is the structure which comprises the arrange | positioned color filter (The green layer G part is expanded and shown in FIG. 7, 8). The first photosensor S1 and the second photosensor S2 are formed in each of the plurality of pixels, as in the first embodiment. The liquid crystal molecules in the liquid crystal layer 6 are liquid crystals having an initial alignment of vertical alignment, and are driven by a voltage applied between the counter electrode (common electrode) 52 and the pixel electrode 51, fall down in the horizontal direction when a voltage is applied, and transmit light. To do. The polarizing plate is crossed Nicol and normally off.

FIG. 8 is a cross-sectional view taken along the line CC ′ of FIG. A light shielding layer 3 is arranged in a predetermined pattern with substantially the same shape as the black matrix 2, and a second transparent resin layer 4 is formed on the color filter. The formation of the second transparent resin layer can be omitted.
For example, the light-shielding layer 3 is formed using light-shielding carbon as a color material, and substantially does not transmit both visible light and infrared light. The black matrix 2 has a characteristic that it does not substantially transmit the visible region in which the same plurality of organic pigments as those in the first embodiment are mixed but transmits the infrared region.

  The black matrix 2 according to the embodiment of the present invention has a 50% transmittance wavelength (half-value wavelength) in the range of about 680 nm to 800 nm, as represented by the lines BLK1 and BLK2 showing the wavelength selective transmission characteristics of FIG. Can be set. This half-value wavelength can be adjusted by adjusting the combination of organic pigments, the pigment ratio, or the film thickness of the black matrix 2.

  As shown in FIG. 9, the black matrix 2 of the present embodiment has an overlapping portion that overlaps the color filter (green layer G in FIG. 9) in a region where the light shielding layer 3 and the metal wiring 24 are not patterned. FIG. 9 is a cross-sectional view taken along the line D-D ′ of FIG. 7.

  FIG. 10 is a graph illustrating an example of the transmission characteristic GLBLK in which the transmission characteristic GL of the green layer G pattern and the green layer G pattern and the transmission characteristic BLK1 of the black matrix 2 (see FIGS. 5 and 9) are overlapped. . The transmission characteristic GL corresponds to the light reception data of the second photosensor S2 shown in FIG. The transmission characteristic GLBLK corresponds to the light reception data of the first photosensor S1 shown in FIG.

  The high-precision green detection data in the visible light region is obtained by detecting the light detected by optically overlapping the green layer G pattern and the black matrix 2 from the light detection data detected via the green layer G pattern. It is obtained by subtracting the detection data. The calculation processing of these data is performed by the processing unit 34, and only the green detection data in the visible light region can be extracted.

  FIG. 11 is a graph showing an example of the transmission characteristic RLBLK in which the transmission characteristic RL of the pattern of the red layer R and the transmission characteristic BLK1 of the black matrix 2 (see FIGS. 5 and 9) are superimposed. . The transmission characteristic RL corresponds to the light reception data of the second photosensor S2 shown in FIG. The transmission characteristic RLBLK corresponds to the light reception data of the first photosensor S1 shown in FIG.

  The high-precision red detection data in the visible light range is obtained by detecting the light detected by optically superimposing the red layer R pattern and the black matrix 2 from the light detection data detected via the red layer R pattern. It is obtained by subtracting the detection data. The calculation process of these data is performed by the processing unit 34, and only red detection data in the visible light region can be extracted.

  FIG. 12 is a graph showing an example of the transmission characteristic BLBLK in which the transmission characteristic BL of the blue layer B pattern and the blue layer B pattern and the transmission characteristic BLK1 of the black matrix 2 are overlapped. The transmission characteristic BL corresponds to the light reception data of the second photosensor S2 shown in FIG. The transmission characteristic BLBLK corresponds to the light reception data of the first photosensor S1 shown in FIG.

  The high-precision blue detection data in the visible light range is obtained by detecting the light detected by optically overlapping the blue layer B pattern and the black matrix 2 from the light detection data detected via the blue layer B pattern. It is obtained by subtracting the detection data. The calculation processing of these data is performed by the processing unit 34, and only blue detection data in the visible light region can be extracted.

  The subtraction of the first light sensor S1 and the second light sensor S2 first light reception data can compensate for the dark current due to the change in the environmental temperature, etc. at the time of the calculation, so that more accurate light reception data is extracted. it can. If the incident light is outside light such as sunlight or outside light such as in a dark room, it is possible to feed back the received light data to the brightness adjustment of the liquid crystal display device in accordance with each light receiving condition.

  For the purpose of acquiring light reception data in the near infrared region, for example, only from 680 nm to 800 nm, for example, the first photosensor S1 located below the overlapping portion where the pattern of the red layer R and the black matrix 2 overlap. From the light reception data, the light reception data of the first optical sensor S1 located under the overlapping portion where the pattern of the blue layer B and the black matrix 2 overlap is subtracted. As a result, light reception data between 680 nm and 800 nm can be extracted. At this time, the dark current can be compensated at the same time.

  In FIG. 9, the backlight unit (not shown) can be provided with solid light emitting elements (LEDs) for emitting red, green, and blue light. For example, a red LED, a green LED, and a blue LED perform time-division (field sequential) light emission and synchronization control with the liquid crystal in the pixel portion. Thereby, full color display can be performed. Furthermore, by adding an infrared light emitting LED in addition to a red LED, a green LED, and a blue LED, it is possible to irradiate a pointer such as a finger with infrared light emitted from the infrared light emitting LED. Can be used.

  The first optical sensor S1 can be applied to infrared light sensing. Red, green, and blue light emission are also used together and reflected in the received light data can be applied to color copying and personal authentication. For example, with high definition of 300 ppi or more, the liquid crystal display device including the liquid crystal display device substrate according to the embodiment of the present invention can be applied to a personal authentication system such as finger recognition.

  In the case where a silicon photodiode is used for the optical sensor of the liquid crystal display device according to the embodiment of the present invention, a PIN diode or a PN diode may be used. In the case of a PIN diode, the arrangement of the P-type region / intrinsic region / N-type region may be arranged in the horizontal direction on the surface of the transparent substrate, or may be laminated in the direction perpendicular to the surface of the transparent substrate. good.

As described above, the position of the black matrix 2 is provided in the liquid crystal display device according to the present invention and the pattern of the red layer R is superimposed, the black matrix 2 and the green layer pattern is superimposed position G, the black matrix 2 By using the overlapping portions provided at the positions where the pattern of the blue layer B is overlapped, color separation with high accuracy becomes possible.
With a liquid crystal display device having a display device substrate according to an embodiment of the present invention, for example, color copying, color imaging, use as a motion sensor, touch sensing using an infrared region, optical communication, etc. are possible. It becomes.

  Since the light-shielding layer 3 and the black matrix 2 have different near-infrared transmittances, alignment (positioning) in the manufacturing process can be performed with light having a wavelength of 800 nm, for example. The formation pattern of the light shielding layer 3 of the present embodiment can be used as a frame portion having high light shielding properties that surrounds four surrounding sides including a plurality of openings. A mark for alignment in the light shielding layer 3 can be formed on the transparent substrate in advance.

<Third Embodiment>
The third embodiment is an embodiment of the present invention in which the black matrix 2 is formed prior to the formation of the red layer R pattern, the green layer G pattern, and the blue layer B pattern.
FIG. 13 shows a partial cross-sectional view of the liquid crystal display device of the third embodiment.
The liquid crystal molecules of the liquid crystal layer 6 of the third embodiment are liquid crystals having an initial alignment of vertical alignment, and are driven by a voltage applied between the counter electrode (common electrode) 52 and the pixel electrode 51, and in the horizontal direction when the voltage is applied. Fall down and transmit light. The polarizing plate is crossed Nicol and normally off.

  If the purpose is not color separation but touch sensing using the infrared region, the arrangement of the second photosensor S2 can be omitted. For the purpose of touch sensing using the near-infrared region, only the superimposing portion where the black matrix 2 and the red layer R pattern, the green layer G pattern, or the blue layer B pattern overlap each other is the first optical sensor. What is necessary is just to arrange | position to S1. The first photosensor S1 can be formed with various densities, for example, one for each pixel, or one for every three or six pixels.

<Examples of constituent materials>
Below, an example of the constituent material in each member of the liquid crystal device shown by each embodiment mentioned above is listed.
(Transparent resin)
The photosensitive coloring composition used for forming the color filter composed of the pixel pattern of the black matrix 2, the light shielding layer 3 and the red layer R, the green layer G, and the blue layer B is a pigment dispersion (hereinafter referred to as a paste). In addition, it contains a polyfunctional monomer, a photosensitive resin or a non-photosensitive resin, a polymerization initiator, a solvent, and the like. For example, highly transparent organic resins such as photosensitive resins and non-photosensitive resins used in this embodiment are collectively referred to as transparent resins.

  As the transparent resin, a thermoplastic resin, a thermosetting resin, or a photosensitive resin can be used. Examples of the thermoplastic resin include butyral resin, styrene-maleic acid copolymer, chlorinated polyethylene, chlorinated polypropylene, polyvinyl chloride, vinyl chloride-vinyl acetate copolymer, polyvinyl acetate, polyurethane resin, and polyester resin. Acrylic resins, alkyd resins, polystyrene resins, polyamide resins, rubber resins, cyclized rubber resins, celluloses, polybutadiene, polyethylene, polypropylene, polyimide resins, and the like can be used. As the thermosetting resin, for example, epoxy resin, benzoguanamine resin, rosin-modified maleic acid resin, rosin-modified fumaric acid resin, melamine resin, urea resin, phenol resin and the like can be used. The thermosetting resin may be generated by reacting a melamine resin and a compound containing an isocyanate group.

(Alkali-soluble resin)
For the formation of the light shielding layer 3 and the black matrix 2, the first transparent resin layer 12, the second transparent resin layer 11, and the color filter according to the present embodiment, a photosensitive resin composition capable of forming a pattern by photolithography is used. Is preferred. These transparent resins are desirably resins imparted with alkali solubility. As the alkali-soluble resin, a resin containing a carboxyl group or a hydroxyl group may be used, or another resin may be used. Examples of the alkali-soluble resin include epoxy acrylate resins, novolac resins, polyvinyl phenol resins, acrylic resins, carboxyl group-containing epoxy resins, and carboxyl group-containing urethane resins. Among these resins, as the alkali-soluble resin, it is preferable to use an epoxy acrylate resin, a novolak resin, or an acrylic resin, and an epoxy acrylate resin or a novolak resin is particularly preferable.

(acrylic resin)
The following acrylic resin is illustrated as a representative of transparent resin which can be used for this embodiment.
As acrylic resin, as a monomer, for example, (meth) acrylic acid; methyl (meth) acrylate, ethyl (meth) acrylate, propyl (meth) acrylate, butyl (meth) acrylate, t-butyl (meth) acrylate Alkyl (meth) acrylates such as pendyl (meth) acrylate and lauryl (meth) acrylate; hydroxyl-containing (meth) acrylates such as hydroxyethyl (meth) acrylate and hydroxypropyl (meth) acrylate; ethoxyethyl (meth) acrylate and glycidyl Ether group-containing (meth) acrylates such as (meth) acrylate; and alicyclic (meth) acrylates such as cyclohexyl (meth) acrylate, isobornyl (meth) acrylate, and dicyclopentenyl (meth) acrylate It can be used a polymer obtained using such.

  In addition, these illustrated monomers can be used independently or can use 2 or more types together.

  Furthermore, the acrylic resin may be produced using a copolymer containing a compound such as styrene, cyclohexylmaleimide, or phenylmaleimide that can be copolymerized with the monomers of these materials. In addition, for example, a copolymer obtained by copolymerizing a carboxylic acid having an ethylenically unsaturated group such as (meth) acrylic acid, and a compound containing an epoxy group and an unsaturated double bond such as glycidyl methacrylate By reacting, a resin having photosensitivity may be generated to obtain an acrylic resin. For example, an epoxy group-containing (meth) acrylate polymer such as glycidyl methacrylate, or a copolymer of this polymer and another (meth) acrylate is added with a carboxylic acid-containing compound such as (meth) acrylic acid. Thus, a resin having photosensitivity may be generated and used as an acrylic resin.

(Organic pigment)
Examples of red pigments include C.I. I. Pigment Red 7, 9, 14, 41, 48: 1, 48: 2, 48: 3, 48: 4, 81: 1, 81: 2, 81: 3, 97, 122, 123, 146, 149, 168, 177, 178, 179, 180, 184, 185, 187, 192, 200, 202, 208, 210, 215, 216, 217, 220, 223, 224, 226, 227, 228, 240, 242, 246, 254, 255, 264, 272, 279, or the like can be used.

  Examples of yellow pigments include C.I. I. Pigment Yellow 1, 2, 3, 4, 5, 6, 10, 12, 13, 14, 15, 16, 17, 18, 20, 24, 31, 32, 34, 35, 35: 1, 36, 36: 1, 37, 37: 1, 40, 42, 43, 53, 55, 60, 61, 62, 63, 65, 73, 74, 77, 81, 83, 86, 93, 94, 95, 97, 98, 100, 101, 104, 106, 108, 109, 110, 113, 114, 115, 116, 117, 118, 119, 120, 123, 125, 126, 127, 128, 129, 137, 138, 139, 144, 146, 147, 148, 150, 151, 152, 153, 154, 155, 156, 161, 162, 164, 166, 167, 168, 169, 170, 171, 172, 1 73, 174, 175, 176, 177, 179, 180, 181, 182, 185, 187, 188, 193, 194, 199, 213, 214, etc. can be used.

  Examples of the blue pigment include C.I. I. Pigment Blue 15, 15: 1, 15: 2, 15: 3, 15: 4, 15: 6, 16, 22, 60, 64, 80, and the like can be used. In addition, C.I. I. In the case of Pigment Blue 15: 3, the half-value wavelength in the infrared region is around 760 nm. For example, C.I. I. By adding a small amount of a pigment having a half-value wavelength in the wavelength range of 700 nm to 800 nm, such as a pigment of Pigment Blue 15: 3, the half-value wavelength of the black matrix 2 can be adjusted to a longer wavelength side than, for example, 680 nm.

  Examples of purple pigments include C.I. I. Pigment Violet 1, 19, 23, 27, 29, 30, 32, 37, 40, 42, 50, and the like. Among these pigments, C.I. I. Pigment Violet 23 is preferred.

  Examples of the green pigment include C.I. I. Pigment Green 1, 2, 4, 7, 8, 10, 13, 14, 15, 17, 18, 19, 26, 36, 45, 48, 50, 51, 54, 55, 58, etc. can be used. Among these pigments, C.I. which is a halogenated zinc phthalocyanine green pigment. I. Pigment Green 58 is preferred. As the green pigment, an aluminum halide phthalocyanine pigment may be used.

(Light shielding layer and black matrix colorant)
The light-shielding color material contained in the light-shielding layer 3 and the black matrix 2 is a color material having an absorptivity in the visible light wavelength region and having a light-shielding function. In the present embodiment, for example, an organic pigment, an inorganic pigment, or a dye can be used as the light-shielding color material. The colorant of the black matrix 2 that places importance on the light transmittance in the infrared region is preferably mainly composed of an organic pigment. As the color material of the light shielding layer 3, for example, carbon black, titanium oxide, or the like can be used. Examples of dyes that can be included in the light shielding layer 3 and the black matrix 2 include azo dyes, anthraquinone dyes, phthalocyanine dyes, quinoneimine dyes, quinoline dyes, nitro dyes, carbonyl dyes, and methine dyes. Etc. can be used. As for the organic pigment, for example, the above organic pigment may be applied. These light-shielding color materials may be used alone or in combination of two or more at an appropriate ratio.

  For example, the visible light wavelength range is approximately in the range of 400 to 700 nm.

  The wavelength at which the transmittance of the black matrix 2 according to the present embodiment rises is in the region of approximately light wavelength 680 nm to approximately light wavelength 800 nm. Here, at a light wavelength of about 680 nm, the transmittance of the red layer is kept high. The light wavelength of 800 nm is a rising portion where the transmittance of the blue layer increases.

(Example of black resist applied to light shielding layer)
A preparation example of a black paste (dispersion) used for the light shielding layer will be described.
A mixture having the following composition is stirred and mixed uniformly, and stirred with a bead mill disperser to produce a black paste. Each composition is expressed in parts by mass.
Carbon pigment 20 parts Dispersant 8.3 parts Copper phthalocyanine derivative 1.0 part Propylene glycol monomethyl ether acetate 71 parts

Using the black paste, the mixture having the following composition is stirred and mixed so as to be uniform, filtered through a 5 μm filter, and a black resist applied to the frame portion 1 is prepared. In the present embodiment, the resist refers to a photosensitive coloring composition containing carbon or a pigment.
Black paste 25.2 parts Acrylic resin solution 18 parts Dipentaerythritol penta and hexaacrylate 5.2 parts Photopolymerization initiator 1.2 parts Sensitizer 0.3 part Leveling agent 0.1 part Cyclohexanone 25 parts Propylene glycol monomethyl ether 25 parts of acetate

  In the present embodiment and each of the above embodiments, the main color material in the black resist or the color resist means a color material that occupies 50% or more with respect to the total mass ratio (%) of the color materials included in the resist. For example, in black resist, carbon accounts for 100% of the color material, and carbon is the main color material. In addition, in a black resist whose main color material is carbon, organic pigments such as red, yellow, and blue may be added with a total mass ratio of 10% or less as a guide in order to adjust the color tone or reflected color. .

(Example of black resist used for black matrix)
Examples of mixing organic pigments used in the black matrix 2 are shown below.
C. I. Pigment Red 254 (hereinafter abbreviated as R254)
C. I. Pigment Yellow 185 (hereinafter abbreviated as Y185)
C. I. Pigment Violet 23 (hereinafter abbreviated as V23)
Of these three types of pigments, either Y139 or R254 may be excluded. Further, in addition to these three types of pigments, a small amount of other types of pigments for adjusting the color (transmission wavelength), for example, the above organic pigments may be added in a small amount of 30% by mass or less. For example, halogenated zinc phthalocyanine pigment, halogenated copper phthalocyanine pigment, halogenated aluminum phthalocyanine pigment, or C.I. I Pigment Blue 15: 3 can be used in an amount of 30% by mass or less in order to adjust the rising of spectral characteristics in the vicinity of a light wavelength of 700 nm (adjustment of spectral curve shape).

  The black matrix 2 desirably has a transmittance in the visible range of 5% or less. The visible region is usually approximately the light wavelength 400 nm to 700 nm. In order to set the half-value wavelength of the black matrix 2 in the light wavelength range of 670 nm to 750 nm, it is necessary that the infrared transmittance characteristic rises from around the light wavelength of 660 nm and the transmittance characteristic becomes higher on the long wavelength side. The wavelength range of the low transmittance of the black matrix 2 may be a light wavelength range of approximately 400 nm to 650 nm. Note that setting the transmittance of the black matrix 2 to a low value of 5% or less in the light wavelength range of 400 nm to 650 nm increases the amount of pigment contained in the organic pigment light-shielding layer 14 or the film of the black matrix 2. It can be realized very easily by increasing the thickness.

  Similarly, the wavelength position of the half-value wavelength can be easily adjusted based on the amount of pigment, the composition ratio of purple pigment, green pigment, yellow pigment, red pigment, blue pigment, the thickness of the black matrix 2, and the like described later. Can do. As the green pigment applied to the black matrix 2, various green pigments described later can be applied. In order to set the half-value wavelength of the black matrix 2 to the light wavelength range of 680 nm to 800 nm, as the green pigment or the blue pigment, the rising of the infrared transmittance (for example, the half-value wavelength) is in the range of the light wavelength 680 nm to 800 nm. Pigments are preferred. The adjustment for setting the half-value wavelength to the light wavelength range of 680 nm to 800 nm is realized mainly based on the violet pigment and the green pigment. In order to adjust the spectral characteristics of the black matrix 2, a blue pigment may be added. If the blue pigment is used instead of the purple pigment of the organic pigment mixture example, the half-value wavelength can be adjusted to about 800 nm.

  The mass ratio (%) of R254 may belong to a range of 15 to 40%, for example.

  The mass ratio (%) of Y185 may belong to a range of 10 to 30%, for example.

The mass ratio (%) of V23 may belong to a range of 75 to 30%, for example.
By further adding the above-described green pigment or blue pigment, the mass ratio of the entire pigment of V23 can be lowered.

  When the thickness of the black matrix 2 is, for example, about 1 μm, the purple pigment of V23 is added to the black matrix 2 at any value in the range of 75 to 30%. Thereby, the black matrix 2 has a half-value wavelength on the longer wavelength side than the light wavelength 670 nm. The addition amount of the yellow organic pigment is set to any one of 10 to 30%, and further, the red organic pigment is added to 15 to 40%, and mixing is performed, so that the transmittance of the light wavelength 400 nm to 660 nm of the black matrix 2 is sufficiently obtained. Can be lowered. The transmittance of the organic pigment light-shielding layer 14 is prevented from slightly increasing in the light wavelength range of 400 nm to 660 nm (the transmittance of the black matrix BM is slightly increased from the baseline of the transmittance of 0% in the spectral characteristics). Therefore, accurate color separation can be performed by subtracting the light reception data of the second light sensor S2 from the light reception data of the first light sensor S1. Further, the half-value wavelength and the transmittance of the black matrix 2 can be adjusted by the film thickness of the black matrix 2.

  Usually, before a color resist (coloring composition) is produced based on these pigments, the pigment is dispersed in a resin or a solution to produce a pigment paste (dispersion). For example, in order to disperse the pigment Y185 alone in a resin or solution, the following materials are mixed with 7 parts (mass part) of the pigment Y185.

Acrylic resin solution (solid content 20%) 40 parts Dispersant 0.5 parts Cyclohexanone 23.0 parts In addition, other pigments such as V23, R254, etc. are also dispersed in the same resin or solution, and a black pigment dispersion paste May be generated.

  Below, the composition ratio for producing | generating the black resist 2 based on said pigment dispersion paste is illustrated.

Y139 paste 14.70 parts V23 paste 20.60 parts Acrylic resin solution 14.00 parts Acrylic monomer 4.15 parts Initiator 0.7 parts Sensitizer 0.4 parts Cyclohexanone 27.00 parts PGMAC 10.89 parts A black resist used for the black matrix 2 is formed depending on the composition ratio.

  The black resist which is the main colorant of the pigment used for forming the black matrix 2 is a purple pigment V23 occupying about 58% with respect to the total mass ratio. Many organic pigments have a high transmittance in a wavelength region longer than the light wavelength of about 800 nm. The yellow pigment Y139 is also an organic pigment having a high transmittance in the wavelength region longer than the light wavelength of 800 nm.

For example, the main color material of the black resist may be 100% organic pigment. Or in the black resist 2 which uses an organic pigment as a main color material, in order to adjust light-shielding property, you may add carbon 40% or less of a total mass as a standard.
The colored resist including the black resist described above can be applied on a transparent substrate and patterned by a well-known photolithography process. Alternatively, for example, a pattern can be formed by a dry etching method using a novolac photosensitive resist.

  In the black resist whose main pigment is carbon, an alignment mark is formed in addition to the frame portion, and alignment after application of the black resist is possible using this alignment mark. As shown in FIG. 5, the alignment mark can be recognized using an infrared camera or the like using a difference in transmittance at a light wavelength of 850 nm, for example.

  The liquid crystal display device according to the embodiment of the present invention can be applied in various ways. Examples of electronic devices that can be targeted by the liquid crystal display device of the present invention include a mobile phone, a portable game device, a portable information terminal, a personal computer, an electronic book, a video camera, a digital still camera, a head mounted display, a navigation system, and sound reproduction. Examples thereof include apparatuses (car audio, digital audio player, etc.), copying machines, facsimiles, printers, printer multifunction devices, vending machines, automatic teller machines (ATMs), personal authentication devices, optical communication devices, and the like.

2 ... black matrix, 3 ... light shielding layer, 4, 11 ... second transparent resin layer, 6 ... liquid crystal layer, 10 ... first transparent substrate, 12 ... first transparent resin layer (transparent resin layer), 13 ... backlight unit , 14 ... display section, 15 ... polarizing plate, 16 ... pointer, 20 ... opening (pixel opening), 21 ... upper electrode, 22 ... lower electrode, 24 ... metal wiring, 25 ... dummy pattern (metal layer), 30 2nd transparent substrate 33 ... Insulating layer 34 ... Processing unit 35, 36, 37 ... Amorphous silicon 31, 51 ... Pixel electrode, 32 ... Common electrode, 52 ... Counter electrode (common electrode), 100 ... Display device Substrate (counter substrate), 200 ... liquid crystal cell, 300 ... array substrate, 400 ... liquid crystal display device, R ... red layer, G ... green layer, B ... blue layer, S1 ... first light sensor, S2 ... second light Sensor

[0003]
[0009]
Patent Document 1: Japanese Patent Application Laid-Open No. 2009-12997 Patent Document 2: Japanese Patent Application Laid-Open No. 2013-008991 Patent Document 3: Japanese Patent Application Laid-Open No. 10-307303 Summary of the Invention 0010]
The present invention has been made in view of such a conventional situation, and an object thereof is to provide a liquid crystal display device excellent in sensitivity while using optical sensing.
Means for Solving the Problems [0011]
In order to solve the above problems, some embodiments of the present invention provide the following liquid crystal display device.
The liquid crystal display device according to the first aspect of the present invention includes a first transparent substrate, and at least a black matrix having a plurality of pixel openings and a transparent resin layer are stacked in this order on the first transparent substrate. A counter substrate, a second transparent substrate, and on the second transparent substrate, at least a photosensor, a plurality of active elements including an oxide semiconductor as a channel layer, a metal wiring, and a dummy pattern And a liquid crystal cell formed by bonding the counter substrate and the array substrate so as to face each other through a liquid crystal layer, and the black matrix has a light wavelength of 680 nm or more. In the detection wavelength region of 800 nm or less, the transmittance is 50% or more, and the transmittance is such that the transmittance is higher on the longer wavelength side than the wavelength at which the transmittance is 50% or more. The sensor has a sensitivity range including the detection wavelength range, is located closer to the liquid crystal layer than the active element, and is formed so as to overlap the black matrix when viewed from the counter substrate. At least the metal wiring and the surface layer of the dummy pattern are made of copper or a copper alloy, and the metal wiring and the dummy pattern are formed so as to fill a region overlapping with the optical sensor when viewed in plan from the counter substrate. Yes.
[0012]
The liquid crystal display device according to the second aspect of the present invention has a first transparent substrate, has at least a plurality of pixel openings on the first transparent substrate, and shields light in the visible light region and infrared region. Colored pixels of red layer, green layer and blue layer are arranged in the light shielding layer and the plurality of pixel openings.

[0004]
Each has a counter substrate formed by laminating a color filter, a black matrix, and a transparent resin layer in this order, and a second transparent substrate, and at least light is provided on the second transparent substrate. A sensor, a plurality of active elements each including an oxide semiconductor as a channel layer, a metal wiring, and an array substrate on which a dummy pattern is disposed, and the counter substrate and the array substrate are arranged in a liquid crystal layer. The black matrix has a transmittance of 50% or more in a detection wavelength region of light wavelength of 680 nm to 800 nm and a wavelength at which the transmittance is 50% or more. In addition to having a transmission characteristic of higher transmittance on the longer wavelength side, it has an overlapping portion that overlaps any one of the red layer, the green layer, and the blue layer. The sensor has a sensitivity range including the detection wavelength range, is located closer to the liquid crystal layer than the active element, and is formed so as to overlap the black matrix when viewed from the counter substrate. At least the metal wiring and the surface layer of the dummy pattern are made of copper or a copper alloy, and the metal wiring and the dummy pattern are formed so as to fill a region overlapping with the optical sensor when viewed in plan from the counter substrate. Yes.
[0013]
A liquid crystal display device according to a third aspect of the present invention includes a first transparent substrate, a black matrix having at least a plurality of pixel openings on the first transparent substrate, and a red layer on the plurality of pixel openings. A counter substrate formed by laminating a color filter having green and blue colored pixels and a transparent resin layer in this order, and a second transparent substrate, on the second transparent substrate An array substrate comprising at least a photosensor, a plurality of active elements including an oxide semiconductor as a channel layer, a metal wiring, and a dummy pattern, and the counter substrate and the array substrate The black matrix has a transmittance of 50% or more in a detection wavelength region of light wavelength of 680 nm or more and 800 nm or less, and the liquid crystal cell is provided so as to face each other through a liquid crystal layer. And it has a transmission characteristic that excessive rate becomes higher transmittance than the wavelength of 50% or more longer wavelengths, the red layer, the green layer, having a superimposition unit that superimposes either of the blue layer. The sensor has a sensitivity range including the detection wavelength range, and the liquid crystal layer is moved from the active element.

[0005]
It is formed in a close position so as to overlap the black matrix when viewed from above the counter substrate. At least the metal wiring and the surface layer of the dummy pattern are made of copper or a copper alloy, and the metal wiring and the dummy pattern are formed so as to fill a region overlapping with the optical sensor when viewed in plan from the counter substrate. Yes.
[0014]
In the liquid crystal display device according to the aspect of the present invention, it is preferable that the black matrix includes a plurality of organic pigments as main coloring materials.
[0015]
In the liquid crystal display device of the above aspect of the present invention, the oxide semiconductor is preferably a composite metal oxide selected from two or more of gallium, indium, zinc, hafnium, tin, yttrium, titanium, germanium, and silicon. .
[0016]
In the liquid crystal display device according to the aspect of the present invention, the color filter includes a position where the red layer and the black matrix overlap, a position where the green layer and the black matrix overlap, and the blue layer and the black matrix. It is preferable to have the said superimposition part in each of the position where and overlap. Furthermore, it is preferable that the optical sensor is provided in a lower portion of each of the colored pixels of the red layer, the green layer, and the blue layer and in a lower portion of the overlapping portion in a plan view.
[0017]
The liquid crystal display device according to the aspect of the present invention preferably further includes a backlight unit that is provided on the opposite side of the liquid crystal cell from the counter substrate and emits light in a wavelength region longer than 680 nm.
[0018]
It is preferable that the liquid crystal display device according to the aspect of the present invention further includes an optical sensor that is formed so as to overlap the pixel opening when viewed in plan from the counter substrate and has a sensitivity range at least in the visible light range.
Effects of the Invention [0019]
According to the liquid crystal display device of the present invention, it is possible to provide a liquid crystal display device with excellent sensitivity while using optical sensing.
BRIEF DESCRIPTION OF THE DRAWINGS [0020]
FIG. 1 is a graph showing metal reflection characteristics according to wavelength.
FIG. 2 is an enlarged cross-sectional view showing a main part of the liquid crystal display device according to the first embodiment of the present invention.

[0012]
[0040]
The first photosensor S1 and the second photosensor S2 (not shown) are, in order, in a direction from a position close to the liquid crystal layer 6 to a position far from the liquid crystal layer 6, a P-type semiconductor amorphous silicon 35, and an intrinsic semiconductor (I-type) amorphous silicon 36. , N-type semiconductor amorphous silicon 37 is stacked. For example, a P-type semiconductor amorphous silicon 35 can be formed to a thickness of 5 nm to 50 nm, an I-type semiconductor amorphous silicon 36 can be formed to a thickness of 100 nm to 1000 nm, and an N-type semiconductor amorphous silicon 37 can be formed to a thickness of 20 nm to 200 nm. .
[0041]
An upper electrode 21 and a lower electrode 22 functioning as a light-transmitting conductive film (transparent conductive film) are disposed on the upper surface of the P-type semiconductor amorphous silicon 35 and the lower surface of the N-type semiconductor amorphous silicon 37, respectively. Yes. The transparent conductive film is made of, for example, a conductive metal oxide called ITO (Indium Tin Oxide). The upper electrode 21 can be, for example, a zigzag fine line pattern or a comb-like thin line pattern. By devising the pattern shape of the upper electrode 21, the current collection effect by the lower electrode 22 can be increased.
[0042]
In order to improve sensitivity on the first optical sensor S1 and the second optical sensor S2, for example, a columnar structure, a concavo-convex structure, a quantum dot, or the like may be laminated with a transparent resin or the like. It is also preferable to add particles or dyes having a wavelength conversion function to these structures. The formation positions of the P-type semiconductor and the N-type semiconductor may be interchanged, or may be formed side by side in the horizontal direction. Amorphous silicon can also be microcrystalline silicon.
[0043]
As shown in the drawing, the first optical sensor S1 and the second optical sensor S2 are formed on a substrate on which a transistor made of an oxide semiconductor is formed in advance using, for example, a known amorphous silicon semiconductor process.
[0044]
The first photosensor S 1 is electrically connected to the transistor electrode from the lower electrode 22 through the contact hole 23 and the metal wiring 24. The upper electrode 21 of the first photosensor S1 is connected to a common electrode wiring through a contact hole (not shown). Thus, when the reset signal is given, the first optical sensor is

[0014]
The configuration will be described. Note that illustration of a driving transistor, a polarizing plate, an alignment film, and the like of the liquid crystal layer is omitted.
The liquid crystal molecules of the liquid crystal layer 6 in FIG. 6 have an initial horizontal alignment on one surface of the array substrate 300, and rotate on the surface with a voltage applied between the pixel electrode 31 and the common electrode 32. Display is performed by controlling the transmittance of light emitted from the backlight unit. The dielectric anisotropy of the liquid crystal molecules may be positive or negative. A transparent electrode such as ITO is not formed on the transparent resin layer 12 (first transparent resin layer) of the counter substrate 100. The orientation film on the transparent resin layer 12 is not shown.
[0049]
Second Embodiment
In the second embodiment, as shown in FIGS. 7 and 8, the red layer R, the green layer G, and the blue layer B are located at positions corresponding to the pixel openings 20 formed in the black matrix 2 of the liquid crystal display device. It is the structure which comprises the arrange | positioned color filter (The green layer G part is expanded and shown in FIG. 7, 8). The first photosensor S1 and the second photosensor S2 are formed in each of the plurality of pixels, as in the first embodiment. The liquid crystal molecules in the liquid crystal layer 6 are liquid crystals having an initial alignment of vertical alignment, and are driven by a voltage applied between the counter electrode (common electrode) 52 and the pixel electrode 51, fall down in the horizontal direction when a voltage is applied, and transmit light. To do. The polarizing plate is crossed Nicol and normally off.
[0050]
FIG. 8 is a cross-sectional view taken along the line CC ′ of FIG. A light shielding layer 3 is arranged in a predetermined pattern with substantially the same shape as the black matrix 2, and a second transparent resin layer 4 is formed on the color filter. The formation of the second transparent resin layer can be omitted.
For example, the light-shielding layer 3 is formed using light-shielding carbon as a color material, and substantially does not transmit both visible light and infrared light. The black matrix 2 has a characteristic that it does not substantially transmit the visible region in which the same plurality of organic pigments as those in the first embodiment are mixed but transmits the infrared region.
[0051]
The black matrix 2 according to the embodiment of the present invention has a 50% transmittance as represented by the lines BLK1 and BLK2 showing the wavelength selective transmission characteristics of FIG.

[0024]
For this purpose, a small amount of other kinds of pigments, for example, the above organic pigments may be added in a small amount of 30% by mass or less. For example, halogenated zinc phthalocyanine pigment, halogenated copper phthalocyanine pigment, halogenated aluminum phthalocyanine pigment, or C.I. I Pigment Blue 15: 3 can be used in an amount of 30% by mass or less in order to adjust the rising of spectral characteristics in the vicinity of a light wavelength of 700 nm (adjustment of spectral curve shape).
[0086]
The black matrix 2 desirably has a transmittance in the visible range of 5% or less. The visible region is usually approximately the light wavelength 400 nm to 700 nm. In order to set the half-value wavelength of the black matrix 2 in the light wavelength range of 670 nm to 750 nm, it is necessary that the infrared transmittance characteristic rises from around the light wavelength of 660 nm and the transmittance characteristic becomes higher on the long wavelength side. The wavelength range of the low transmittance of the black matrix 2 may be a light wavelength range of approximately 400 nm to 650 nm. Note that setting the transmittance of the black matrix 2 to a low value of 5% or less in the light wavelength range of 400 nm to 650 nm increases the amount of pigment contained in the organic pigment light-shielding layer, or the film thickness of the black matrix 2. It can be realized very easily by increasing the thickness.
[0087]
Similarly, the wavelength position of the half-value wavelength can be easily adjusted based on the amount of pigment, the composition ratio of purple pigment, green pigment, yellow pigment, red pigment, blue pigment, the thickness of the black matrix 2, and the like described later. Can do. As the green pigment applied to the black matrix 2, various green pigments described later can be applied. In order to set the half-value wavelength of the black matrix 2 to the light wavelength range of 680 nm to 800 nm, as the green pigment or the blue pigment, the rising of the infrared transmittance (for example, the half-value wavelength) is in the range of the light wavelength 680 nm to 800 nm. Pigments are preferred. The adjustment for setting the half-value wavelength to the light wavelength range of 680 nm to 800 nm is realized mainly based on the violet pigment and the green pigment. In order to adjust the spectral characteristics of the black matrix 2, a blue pigment may be added. If the blue pigment is used instead of the purple pigment of the organic pigment mixture example, the half-value wavelength can be adjusted to about 800 nm.

[0025]
[0088]
The mass ratio (%) of R254 may belong to a range of 15 to 40%, for example.
[0089]
The mass ratio (%) of Y185 may belong to a range of 10 to 30%, for example.
[0090]
The mass ratio (%) of V23 may belong to a range of 75 to 30%, for example.
By further adding the above-described green pigment or blue pigment, the mass ratio of the entire pigment of V23 can be lowered.
[0091]
When the thickness of the black matrix 2 is, for example, about 1 μm, the purple pigment of V23 is added to the black matrix 2 at any value in the range of 75 to 30%. Thereby, the black matrix 2 has a half-value wavelength on the longer wavelength side than the light wavelength 670 nm. The addition amount of the yellow organic pigment is set to any one of 10 to 30%, and further, the red organic pigment is added to 15 to 40%, and mixing is performed, so that the transmittance of the light wavelength 400 nm to 660 nm of the black matrix 2 is sufficiently obtained. Can be lowered. Prevents the transmittance of the organic pigment light-shielding layer from slightly increasing in the light wavelength range of 400 nm to 660 nm (prevents the transmittance of the black matrix BM from increasing slightly from the baseline of 0% transmittance in the spectral characteristics) Thus, accurate color separation can be performed by subtracting the light reception data of the second light sensor S2 from the light reception data of the first light sensor S1. Further, the half-value wavelength and the transmittance of the black matrix 2 can be adjusted by the film thickness of the black matrix 2.
[0092]
Usually, before a color resist (coloring composition) is produced based on these pigments, the pigment is dispersed in a resin or a solution to produce a pigment paste (dispersion). For example, in order to disperse the pigment Y185 alone in a resin or solution, the following materials are mixed with 7 parts (mass part) of the pigment Y185.
[0093]
Acrylic resin solution (solid content 20%) 40 parts Dispersant 0.5 parts Cyclohexanone 23.0 parts

[0026]
Note that other pigments such as V23, R254, etc. may also be dispersed in the same resin or solution to produce a black pigment dispersion paste.
[0094]
Below, the composition ratio for producing | generating a black resist based on said pigment dispersion paste is illustrated.
[0095]
Y139 paste 14.70 parts V23 paste 20.60 parts Acrylic resin solution 14.00 parts Acrylic monomer 4.15 parts Initiator 0.7 parts Sensitizer 0.4 parts Cyclohexanone 27.00 parts PGMAC 10.89 parts A black resist used for the black matrix 2 is formed depending on the composition ratio.
[0096]
The black resist which is the main colorant of the pigment used for forming the black matrix 2 is a purple pigment V23 occupying about 58% with respect to the total mass ratio. Many organic pigments have a high transmittance in a wavelength region longer than the light wavelength of about 800 nm. The yellow pigment Y139 is also an organic pigment having a high transmittance in the wavelength region longer than the light wavelength of 800 nm.
[0097]
For example, the main color material of the black resist may be 100% organic pigment. Or in the black resist which uses an organic pigment as a main color material, in order to adjust light-shielding property, you may add carbon 40% or less of the total mass as a standard.
The colored resist including the black resist described above can be applied on a transparent substrate and patterned by a well-known photolithography process. Alternatively, for example, a pattern can be formed by a dry etching method using a novolac photosensitive resist.
[0098]
For black resists with carbon as the main pigment, an alignment mark is formed in addition to the frame, and a black resist is formed using this alignment mark.

[0027]
Alignment after coating is possible. As shown in FIG. 5, the alignment mark can be recognized using an infrared camera or the like using a difference in transmittance at a light wavelength of 850 nm, for example.
[0099]
The liquid crystal display device according to the embodiment of the present invention can be applied in various ways. Examples of electronic devices that can be targeted by the liquid crystal display device of the present invention include a mobile phone, a portable game device, a portable information terminal, a personal computer, an electronic book, a video camera, a digital still camera, a head mounted display, a navigation system, and sound reproduction. Examples thereof include apparatuses (car audio, digital audio player, etc.), copying machines, facsimiles, printers, printer multifunction devices, vending machines, automatic teller machines (ATMs), personal authentication devices, optical communication devices, and the like.
Explanation of symbols [0100]
2 ... black matrix, 3 ... light shielding layer, 4, 11 ... second transparent resin layer, 6 ... liquid crystal layer, 10 ... first transparent substrate, 12 ... first transparent resin layer (transparent resin layer), 13 ... backlight unit , 14 ... light source, 15 ... polarizing plate, 16 ... pointer, 20 ... opening (pixel opening), 21 ... upper electrode, 22 ... lower electrode, 24 ... metal wiring, 25 ... dummy pattern (metal layer), 30 ... Second transparent substrate 33 ... Insulating layer 34 ... Processing unit 35, 36, 37 ... Amorphous silicon 31, 51 ... Pixel electrode, 32 ... Common electrode, 52 ... Counter electrode (common electrode), 100 ... For display device Substrate (opposite substrate), 200 ... liquid crystal cell, 300 ... array substrate, 400 ... liquid crystal display, R ... red layer, G ... green layer, B ... blue layer, S1 ... first optical sensor, S2 ... second optical sensor

Claims (8)

A counter substrate comprising a first transparent substrate, and a black matrix having a plurality of pixel openings and a transparent resin layer laminated in this order on the first transparent substrate;
An array substrate comprising: a second transparent substrate; and at least a photosensor, a plurality of active elements including an oxide semiconductor as a channel layer, and metal wiring on the second transparent substrate;
A liquid crystal cell formed by bonding the counter substrate and the array substrate so as to face each other through a liquid crystal layer,
The black matrix has a transmission characteristic such that the transmittance is 50% or more in the detection wavelength region of light wavelength 680 nm or more and 800 nm or less, and the transmittance is higher on the longer wavelength side than the wavelength where the transmittance is 50% or more. And
The sensor is
Having a sensitivity range including the detection wavelength range,
It is located closer to the liquid crystal layer than the active element, and is formed so as to overlap the black matrix when viewed from the counter substrate.
The metal wiring is
At least the surface layer is composed of copper or copper alloy,
A liquid crystal display device formed so as to fill a region overlapping with the photosensor when viewed in plan from the counter substrate. A first transparent substrate; at least a plurality of pixel openings on the first transparent substrate; a light-blocking layer that blocks light in a visible light region and an infrared region; and red in the plurality of pixel openings. A counter substrate formed by laminating a color filter having a colored pixel of each of a layer, a green layer, and a blue layer, a black matrix, and a transparent resin layer in this order;
An array substrate comprising: a second transparent substrate; and at least a photosensor, a plurality of active elements including an oxide semiconductor as a channel layer, and metal wiring on the second transparent substrate;
A liquid crystal cell formed by bonding the counter substrate and the array substrate so as to face each other through a liquid crystal layer,
The black matrix has a transmission characteristic in which the transmittance is 50% or more in the detection wavelength region of light wavelength 680 nm or more and 800 nm or less, and the transmittance is higher on the longer wavelength side than the wavelength at which the transmittance is 50% or more. And having an overlapping portion that overlaps any one of the red layer, the green layer, and the blue layer,
The sensor is
Having a sensitivity range including the detection wavelength range,
It is located closer to the liquid crystal layer than the active element, and is formed so as to overlap the black matrix when viewed from the counter substrate.
The metal wiring is
At least the surface layer is composed of copper or copper alloy,
A liquid crystal display device formed so as to fill a region overlapping with the photosensor when viewed in plan from the counter substrate. A first transparent substrate, and a black matrix having at least a plurality of pixel openings on the first transparent substrate, and colored pixels of a red layer, a green layer, and a blue layer at the plurality of pixel openings, respectively. A counter substrate formed by laminating a color filter and a transparent resin layer in this order;
An array substrate comprising: a second transparent substrate; and at least a photosensor, a plurality of active elements including an oxide semiconductor as a channel layer, and metal wiring on the second transparent substrate;
A liquid crystal cell formed by bonding the counter substrate and the array substrate so as to face each other through a liquid crystal layer,
The black matrix has a transmission characteristic in which the transmittance is 50% or more in the detection wavelength region of light wavelength 680 nm or more and 800 nm or less, and the transmittance is higher on the longer wavelength side than the wavelength at which the transmittance is 50% or more. And having an overlapping portion that overlaps any one of the red layer, the green layer, and the blue layer,
The sensor is
Having a sensitivity range including the detection wavelength range,
It is located closer to the liquid crystal layer than the active element, and is formed so as to overlap the black matrix when viewed from the counter substrate.
The metal wiring is
At least the surface layer is composed of copper or copper alloy,
A liquid crystal display device formed so as to fill a region overlapping with the photosensor when viewed in plan from the counter substrate.   The liquid crystal display device according to any one of claims 1 to 3, wherein the black matrix includes a plurality of organic pigments as a main coloring material.   5. The oxide semiconductor according to claim 1, wherein the oxide semiconductor is a composite metal oxide selected from two or more of gallium, indium, zinc, hafnium, tin, yttrium, titanium, germanium, and silicon. Liquid crystal display device. The color filter includes the overlapping unit at each of a position where the red layer and the black matrix overlap, a position where the green layer and the black matrix overlap, and a position where the blue layer and the black matrix overlap. Have
4. The liquid crystal display according to claim 2, wherein the optical sensor is provided in a lower portion of each colored pixel of the red layer, the green layer, and the blue layer and in a lower portion of the overlapping portion in a plan view. apparatus.   The liquid crystal display according to any one of claims 1 to 6, further comprising a backlight unit that is provided on a side opposite to the counter substrate of the liquid crystal cell and emits light having a wavelength range longer than at least 680 nm. apparatus.   8. The optical sensor according to claim 1, further comprising an optical sensor formed so as to overlap with the pixel opening when viewed in plan from the counter substrate, and having a sensitivity range at least in a visible light range. The liquid crystal display device described.

Images