JPWO2009034819A1 - Microchip manufacturing method, microchip, and vacuum bonding apparatus - Google Patents
Microchip manufacturing method, microchip, and vacuum bonding apparatus Download PDFInfo
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- JPWO2009034819A1 JPWO2009034819A1 JP2009532122A JP2009532122A JPWO2009034819A1 JP WO2009034819 A1 JPWO2009034819 A1 JP WO2009034819A1 JP 2009532122 A JP2009532122 A JP 2009532122A JP 2009532122 A JP2009532122 A JP 2009532122A JP WO2009034819 A1 JPWO2009034819 A1 JP WO2009034819A1
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Classifications
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Abstract
少なくとも2つの基板を積層したマイクロチップの製造方法において、下層の基板の基準穴を位置決めピンに挿入した後、粘着層を挟んで上層の基板の基準穴を位置決めピンに挿入する位置決め工程と、位置決め工程を行った基板を貼り合わせる貼り合わせ工程と、最上層の前記基板を加圧して圧着する圧着工程と、を有することを特徴とするマイクロチップの製造方法。In a microchip manufacturing method in which at least two substrates are laminated, a positioning step of inserting a reference hole of a lower substrate into a positioning pin and then inserting a reference hole of an upper substrate into the positioning pin with an adhesive layer interposed therebetween, and positioning A method for manufacturing a microchip, comprising: a bonding step of bonding substrates subjected to the steps; and a pressing step of pressing and pressing the uppermost substrate.
Description
本発明はマイクロチップの製造方法、マイクロチップ、真空貼付装置に関する。 The present invention relates to a microchip manufacturing method, a microchip, and a vacuum sticking apparatus.
近年、マイクロマシン技術および超微細加工技術を駆使することにより、化学分析、化学合成などを行うための装置、手段(例えばポンプ、バルブ、流路、センサなど)を微細化して1チップ上に集積化したシステムが開発されている(例えば特許文献1参照)。これはμ−TAS(Micro Total Analysis System:マイクロ総合分析システム)、バイオリアクタ、ラボ・オン・チップ(Lab−on−chips)、バイオチップとも呼ばれ、医療検査、診断分野、環境測定分野、農産製造分野でその応用が期待されている。現実には遺伝子検査に見られるように、煩雑な工程、熟練した手技、機器類の操作が必要とされる場合には、自動化、高速化および簡便化されたミクロ化分析システムは、コスト、必要試量、所要時間のみならず、時間および場所を選ばない分析を可能とすることによる恩恵は多大と言える。 In recent years, by making full use of micromachine technology and ultrafine processing technology, devices and means (for example, pumps, valves, flow paths, sensors, etc.) for performing chemical analysis, chemical synthesis, etc. are miniaturized and integrated on one chip. Such a system has been developed (see, for example, Patent Document 1). This is also called μ-TAS (Micro Total Analysis System), bioreactor, lab-on-chip, biochip, medical examination, diagnostic field, environmental measurement field, agricultural production Its application is expected in the manufacturing field. In reality, as seen in genetic testing, automated, faster, and simplified microanalysis systems are costly and necessary when complex processes, skilled techniques, and equipment operations are required. The benefits of enabling time-and-location analysis as well as sample size and time are enormous.
各種の分析、検査ではこれらの分析用チップ(以下、チップ内に微細流路が設けられ、微細流路内において各種の反応を行う上記のようなチップを「マイクロチップ」という。)が用いられる。例えば、少なくとも2枚の基板から構成されるマイクロチップ内に作動流体を供給し、予め収容された試薬と検体を合流させて、合流部の下流域に形成された検出部で光学的検出手段により自動的に検査対象を検査するマイクロ総合分析システムが開示されている(例えば、特許文献2)。 In various types of analysis and inspection, these analysis chips (hereinafter referred to as “microchips” in which a microchannel is provided in the chip and performs various reactions in the microchannel) are used. . For example, a working fluid is supplied into a microchip composed of at least two substrates, and a reagent and a sample that are stored in advance are merged, and the detection unit formed in the downstream area of the merging unit uses an optical detection unit. A micro integrated analysis system that automatically inspects an inspection object is disclosed (for example, Patent Document 2).
このようなマイクロチップは、流路を形成する溝を加工した流路基板と溝を覆う被覆基板を貼り合わせて形成した流路空間に試薬等を封入し、作動流体を注入するので、貼り合わせた基板間に隙間があると液漏れが発生し、検査が正しく行われない、という問題がある。 Since such a microchip encloses a reagent or the like in a flow channel space formed by bonding a flow channel substrate in which a groove forming a flow channel is processed and a coated substrate that covers the groove, and injects a working fluid. If there is a gap between the substrates, liquid leakage will occur and the inspection will not be performed correctly.
マイクロチップの2つの基板を密着する方法として、流路をパターニングした自己シール性有する弾性材料からなる流路基板とガラス基板を接合する方法(例えば、特許文献3)が開示されている。また、金属やシリコンなどの半導体からなる2つの薄板を接合する方法(例えば、特許文献4)が開示されている。
特許文献2に開示されているようなマイクロ総合システムでは、マイクロチップが一回毎に使い捨てられるので、マイクロチップを安価で製造の容易な樹脂で作製することが望ましい。流路基板の加工は、金型を用いて樹脂基板を射出成型し、流路を形成する溝を形成したり、流体を注入するための穴を加工するのが一般的である。 In the micro total system as disclosed in Patent Document 2, since the microchip is disposable every time, it is desirable to manufacture the microchip with a resin that is inexpensive and easy to manufacture. Generally, the flow path substrate is processed by injection molding a resin substrate using a mold to form a groove for forming a flow path or a hole for injecting a fluid.
しかしながら、一般に樹脂基板を射出成型すると溝や穴にヒケやバリが発生したり、基板に反りが発生することがある。このような樹脂基板を貼り合わせると隙間が発生し、残留した空気が流路内の送液を妨げる場合がある。特に反応を促進するためマイクロチップを加熱した場合に残留した空気の影響が大きい。樹脂基板を貼り合わせるときのこれらの課題を解決する方法は特許文献2、3、4には開示されていない。 However, generally, when a resin substrate is injection-molded, sink marks and burrs may occur in grooves and holes, and warpage may occur in the substrate. When such a resin substrate is bonded, a gap is generated, and the remaining air may interfere with liquid feeding in the flow path. In particular, when the microchip is heated to promote the reaction, the influence of the remaining air is great. Patent Documents 2, 3, and 4 do not disclose a method for solving these problems when bonding resin substrates.
本発明は、上記課題に鑑みてなされたものであって、歩留まりが高く生産が容易なマイクロチップの製造方法、マイクロチップ、真空貼付装置を提供することを課題とする。 This invention is made | formed in view of the said subject, Comprising: It aims at providing the manufacturing method of a microchip, a microchip, and a vacuum sticking apparatus with a high yield and easy production.
本発明の目的は、下記構成により達成することができる。 The object of the present invention can be achieved by the following constitution.
1.
少なくとも2つの基板を積層したマイクロチップの製造方法において、
下層の前記基板の基準穴を位置決めピンに挿入した後、上層の前記基板の基準穴を該位置決めピンに挿入する位置決め工程と、
前記位置決め工程を行った前記基板を粘着層を挟んで真空下で貼り合わせる貼り合わせ工程と、
最上層の前記基板を加圧して圧着する圧着工程と、
を有することを特徴とするマイクロチップの製造方法。1.
In a method of manufacturing a microchip in which at least two substrates are laminated,
A positioning step of inserting the reference hole of the upper substrate into the positioning pin after inserting the reference hole of the lower substrate into the positioning pin;
A bonding step in which the substrate subjected to the positioning step is bonded under vacuum with an adhesive layer interposed therebetween;
A pressure-bonding step of pressing and pressing the uppermost substrate;
A method for producing a microchip, comprising:
2.
少なくとも一つの前記基板は、樹脂材料を射出成形したものであることを特徴とする1に記載のマイクロチップの製造方法。2.
2. The method of manufacturing a microchip according to 1, wherein at least one of the substrates is formed by injection molding a resin material.
3.
前記貼り合わせ工程は、少なくとも2つの前記基板を載置した気密室の内部を真空にすることにより、前記気密室の上面に上層の前記基板と平行に配設された弾性シートを気密室の内部に引き込み上層の前記基板と下層の前記基板とを密着させることを特徴とする1または2に記載のマイクロチップの製造方法。3.
In the laminating step, the inside of the hermetic chamber on which at least two substrates are placed is evacuated, and an elastic sheet disposed in parallel with the upper substrate on the upper surface of the hermetic chamber is placed inside the hermetic chamber. 3. The method for producing a microchip according to 1 or 2, wherein the upper substrate and the lower substrate are brought into close contact with each other.
4.
前記圧着工程は、真空下で行うことを特徴とする1乃至3の何れか1項に記載のマイクロチップの製造方法。4).
4. The method of manufacturing a microchip according to any one of claims 1 to 3, wherein the crimping step is performed under vacuum.
5.
前記圧着工程は、前記基板に密着した前記弾性シートの上にローラを移動させて加圧することを特徴とする1乃至4の何れか1項に記載のマイクロチップの製造方法。5).
5. The method of manufacturing a microchip according to any one of claims 1 to 4, wherein in the pressing step, a roller is moved and pressed onto the elastic sheet in close contact with the substrate.
6.
少なくとも2つの基板を積層して形成されたマイクロチップにおいて、
前記基板に積層する基準となる基準穴を設けたことを特徴とするマイクロチップ。6).
In a microchip formed by laminating at least two substrates,
A microchip comprising a reference hole serving as a reference for stacking on the substrate.
7.
少なくとも2つの基板を積層する真空貼付装置において、
前記基板を載置する気密室と、
前記気密室に設けられ前記基板の基準穴を挿入する位置決めピンと、
前記気密室の上面に前記基板と平行に配設された弾性シートと、
前記気密室の内部を真空にする真空ポンプと、
を有し、積層する順に前記基板を前記位置決めピンに挿入した後、前記真空ポンプにより前記気密室の内部を真空にすることにより前記弾性シートを前記気密室の内部に引き込み少なくとも2つの前記基板を密着させて前記基板を貼り合わせることを特徴とする真空貼付装置。7).
In a vacuum applicator for laminating at least two substrates,
An airtight chamber for placing the substrate;
A positioning pin provided in the hermetic chamber for inserting a reference hole of the substrate;
An elastic sheet disposed in parallel with the substrate on the upper surface of the hermetic chamber;
A vacuum pump for evacuating the inside of the hermetic chamber;
And inserting the substrates into the positioning pins in the stacking order, and then evacuating the inside of the hermetic chamber by the vacuum pump to draw the elastic sheet into the hermetic chamber so that at least two of the substrates are A vacuum bonding apparatus, wherein the substrates are bonded together.
本発明によれば、溝状の流路を片面に形成した流路基板の基準穴と、被覆基板の基準穴を位置合わせした後、真空下で圧着して貼り合わせるので、積層型のマイクロチップを容易に生産できる。 According to the present invention, after aligning the reference hole of the flow path substrate in which the groove-shaped flow path is formed on one side and the reference hole of the coated substrate, the laminated microchip is bonded by pressure bonding under vacuum. Can be easily produced.
1 マイクロチップ
2 流路基板
4 被覆基板
6 流路
8 廃液貯留部
11 連通孔
13 試薬収容部
17 試料受容部
18 反応部
19 検出部
53 弾性シート
55、56 位置決めピン
57 中蓋
59 下台
61 真空ポンプ
63、64、65 バルブ
80 反応検出装置
90 貼付装置
82 収納体
83 挿入口
84 表示部
85 メモリカードスロット
86 プリント出力口
87 操作パネル
88 入出力端子
200、201 基準穴
400、401 基準穴DESCRIPTION OF SYMBOLS 1 Microchip 2 Flow path board | substrate 4 Coated board | substrate 6 Flow path 8 Waste liquid storage part 11 Communication hole 13 Reagent storage part 17 Sample receiving part 18 Reaction part 19 Detection part 53 Elastic sheet 55, 56 Positioning pin 57 Inner lid 59 Lower stand 61 Vacuum pump 63, 64, 65 Valve 80 Reaction detection device 90 Pasting device 82 Storage body 83 Insertion port 84 Display unit 85 Memory card slot 86 Print output port 87 Operation panel 88 Input / output terminal 200, 201 Reference hole 400, 401 Reference hole
以下、本発明について詳細に説明する。本発明のマイクロチップは、板状のチップ内に設けられた微細流路または構造部において、各種の検査、化学分析、化学合成、試料の処理・分離などの目的で試料と試薬との反応を行うものである。 Hereinafter, the present invention will be described in detail. The microchip of the present invention performs a reaction between a sample and a reagent for various inspections, chemical analysis, chemical synthesis, sample processing / separation, etc., in a fine channel or structure provided in a plate-shaped chip. Is what you do.
本発明のマイクロチップの用途には、例えば、遺伝子増幅反応、抗原抗体反応などによる生体物質の検査・分析、その他の化学物質の検査・分析、有機合成などによる目的化合物の化学合成、薬効スクリーニング、薬品抽出、金属錯体の形成・分離などが含まれる。 Examples of the use of the microchip of the present invention include biological substance inspection / analysis by gene amplification reaction, antigen-antibody reaction, etc., inspection / analysis of other chemical substances, chemical synthesis of target compounds by organic synthesis, drug efficacy screening, Includes chemical extraction and metal complex formation / separation.
以下、図面に基づき本発明の実施形態を説明する。 Hereinafter, embodiments of the present invention will be described with reference to the drawings.
図1は、本発明の実施形態におけるマイクロチップ1の断面図である。 FIG. 1 is a cross-sectional view of a microchip 1 in an embodiment of the present invention.
マイクロチップ1のチップ全体の縦横サイズは、用途等にもよるが、典型的には数十mm、その高さは典型的には数mm程度である。 The vertical and horizontal sizes of the entire chip of the microchip 1 are typically several tens of mm, and the height is typically several millimeters although it depends on the application.
マイクロチップ1は、流路6を内側の面に形成した流路基板2と流路6を覆う被覆基板4から構成される2層構造である。流路基板2に設けられた流路6は、流路幅が200μm以下の微細流路と200μmを超える流路幅の粗流路から構成される。 The microchip 1 has a two-layer structure including a flow path substrate 2 in which a flow path 6 is formed on the inner surface and a covering substrate 4 that covers the flow path 6. The flow path 6 provided on the flow path substrate 2 includes a fine flow path having a flow width of 200 μm or less and a coarse flow path having a flow width exceeding 200 μm.
ここで、「流路幅」とは、流れ方向と垂直な断面が矩形である場合にはその横幅を表し、当該断面が矩形に類似した他の形状である場合にはその横幅の平均値を表す。流路の高さは、上記の細い流路と、それよりも広幅の流路とに関わらず目的に応じて適宜に設定されるが、例えば10μm〜1000μmである。 Here, the “flow path width” represents the horizontal width when the cross section perpendicular to the flow direction is a rectangle, and the average value of the horizontal width when the cross section is another shape similar to a rectangle. To express. The height of the channel is appropriately set according to the purpose regardless of the narrow channel and the wider channel, and is, for example, 10 μm to 1000 μm.
78は駆動液注入口であり、駆動液注入口78から注入した駆動液は連通する流路6を通って流路6の一部に収容された試薬などを送る。一方、検体注入口79から注入された検体は流路6に流入し、図示せぬ試薬注入孔から注入された試薬などと所定の反応を行い、反応後の廃液は廃液貯留部8に貯留される。 Reference numeral 78 denotes a driving liquid injection port. The driving liquid injected from the driving liquid injection port 78 sends a reagent or the like accommodated in a part of the flow path 6 through the communicating flow path 6. On the other hand, the sample injected from the sample injection port 79 flows into the flow path 6 and performs a predetermined reaction with a reagent or the like injected from a reagent injection hole (not shown), and the waste liquid after the reaction is stored in the waste liquid storage unit 8. The
空気連通孔11は駆動液など液体を注入した際に流路6内の空気を逃がすために設けられている。 The air communication hole 11 is provided to allow air in the flow path 6 to escape when liquid such as driving liquid is injected.
本発明のマイクロチップ1では、流路基板2、被覆基板4を射出成形により作製し、流路基板2と被覆基板4を重ね合わせて流路を形成する。流路溝が形成される流路基板2の樹脂材料としては、目的に応じて各種のものが使用できるが、例えば、ポリスチレン、ポリエチレン、ポリプロピレン、ポリエチレンテレフタレート、ポリメチルメタクリレート、ポリカーボネートなどが挙げられる。被覆基板4は、例えば透明または半透明なシリコンゴムなどの弾性材料からなり、予めシリコン系粘着材などを塗布した被覆基板4を流路基板2に重ねて接着する。被覆基板4の厚みは100μm程度である。 In the microchip 1 of the present invention, the flow path substrate 2 and the coated substrate 4 are produced by injection molding, and the flow path substrate 2 and the coated substrate 4 are overlapped to form a flow path. Various resin materials can be used as the resin material of the flow path substrate 2 in which the flow path grooves are formed, and examples thereof include polystyrene, polyethylene, polypropylene, polyethylene terephthalate, polymethyl methacrylate, and polycarbonate. The coated substrate 4 is made of an elastic material such as transparent or translucent silicon rubber, for example, and the coated substrate 4 previously coated with a silicon-based adhesive material or the like is overlapped and bonded to the flow path substrate 2. The thickness of the coated substrate 4 is about 100 μm.
図2は、本発明におけるマイクロチップ1の流路基板2と被覆基板4の一例を説明するための平面図である。図2(a)は被覆基板4の基板パターン、図2(b)は流路基板2の基板パターンを示している。 FIG. 2 is a plan view for explaining an example of the flow path substrate 2 and the covering substrate 4 of the microchip 1 according to the present invention. 2A shows the substrate pattern of the coated substrate 4, and FIG. 2B shows the substrate pattern of the flow path substrate 2.
被覆基板4は、図2(a)に示すように連通孔11と基準穴400、401だけを形成したシート状の基板であり、金型を用いて基準穴400、401と連通孔11を形成する。 As shown in FIG. 2A, the coated substrate 4 is a sheet-like substrate in which only the communication holes 11 and the reference holes 400 and 401 are formed, and the reference holes 400 and 401 and the communication holes 11 are formed using a mold. To do.
流路基板2は、図2(b)に示す溝のパターンと基準穴200、201を形成した樹脂材料からなる基板であり、金型を用いて射出成形により作製する。樹脂材料としては、ポリプロピレンなどが用いられる。 The flow path substrate 2 is a substrate made of a resin material in which the groove pattern and the reference holes 200 and 201 shown in FIG. 2B are formed, and is manufactured by injection molding using a mold. Polypropylene or the like is used as the resin material.
基準穴400、401と基準穴200、201は、後に説明する被覆基板4と流路基板2を貼り合わせる工程で位置決めのために用いる。基準穴400、401の穴径は基準穴200、201の穴径より小さくなっている。また、基準穴401、基準穴201は基板製作時の誤差を吸収するため長穴になっている。 The reference holes 400 and 401 and the reference holes 200 and 201 are used for positioning in the process of bonding the coated substrate 4 and the flow path substrate 2 described later. The hole diameters of the reference holes 400 and 401 are smaller than the hole diameters of the reference holes 200 and 201. Further, the reference hole 401 and the reference hole 201 are long holes in order to absorb errors at the time of manufacturing the substrate.
本実施形態のマイクロチップ1は、例えば遺伝子増幅反応に用いられるものであり、図2(b)に示すように、流路基板2の一方の面には、2種類の試薬を収容する流路状の3つの試薬収容部13が設けられている。 The microchip 1 of the present embodiment is used for, for example, a gene amplification reaction. As shown in FIG. 2B, a flow path containing two types of reagents is provided on one surface of the flow path substrate 2. Three reagent storage portions 13 are provided.
図2(b)に示す流路基板2の試薬収容部13の上流側には、凹部211が設けられている。流路基板2と被覆基板4を貼り合わせると、凹部211は図2(a)に示す連通孔基板4に設けられた連通孔11aと連通する。連通孔11aは試薬注入口であり流路基板2と被覆基板4を貼り合わせた後、連通孔11aから試薬を注入し、連通孔11aを塞ぐ。 A recess 211 is provided on the upstream side of the reagent storage unit 13 of the flow path substrate 2 shown in FIG. When the flow path substrate 2 and the covering substrate 4 are bonded together, the recess 211 communicates with the communication hole 11a provided in the communication hole substrate 4 shown in FIG. The communication hole 11a is a reagent injection port. After the flow path substrate 2 and the covering substrate 4 are bonded together, the reagent is injected from the communication hole 11a to close the communication hole 11a.
また、連通孔11bも試薬注入口であり同様に連通孔11bから試料受容部17に試薬を注入した後、連通孔11bを塞ぐ。図2(a)に示すその他の連通孔11は、マイクロチップ1に駆動液を注入したときに流路内の空気を逃がすための空気抜きの穴として設けられている。 The communication hole 11b is also a reagent injection port. Similarly, after injecting a reagent from the communication hole 11b into the sample receiving portion 17, the communication hole 11b is closed. The other communication holes 11 shown in FIG. 2A are provided as air vent holes for releasing the air in the flow path when the driving liquid is injected into the microchip 1.
流路基板2の試薬収容部13に収容された試薬は、駆動液注入口78に連通されるそれぞれ別途の図示せぬマイクロポンプによって駆動液を注入され、試薬収容部13から押し出されて合流部15で合流し、その下流側の混合試薬収容部16に混合試薬が収容される。 The reagent stored in the reagent storage unit 13 of the flow path substrate 2 is injected with a driving liquid by a separate micropump (not shown) communicated with the driving liquid injection port 78, and is pushed out of the reagent storage unit 13 to be merged. 15, the mixed reagent is stored in the mixed reagent storage unit 16 on the downstream side.
この混合試薬は、流路状の試料受容部17に注入された試料と下流で合流する。混合試薬と試料は、それぞれ別途の駆動液注入口78に連通したマイクロポンプによって駆動液で下流へ押し出され混合される。混合試薬と試料との混合液は、反応部18へ収容され加熱によって増幅反応が開始される。 This mixed reagent merges downstream with the sample injected into the channel-shaped sample receiving portion 17. The mixed reagent and the sample are extruded and mixed downstream with the driving liquid by a micropump connected to a separate driving liquid inlet 78. The mixed solution of the mixed reagent and the sample is accommodated in the reaction unit 18 and the amplification reaction is started by heating.
反応後の液は、検出部19へ送出され、例えば光学的な検出方法などによって標的物質が検出される。 The liquid after the reaction is sent to the detection unit 19, and the target substance is detected by, for example, an optical detection method.
図2(b)の流路の最下流側には、廃液貯留部8が設けられ、上流の流路からの廃液は廃液貯留部8へ送出される。 A waste liquid reservoir 8 is provided on the most downstream side of the flow path in FIG. 2B, and waste liquid from the upstream flow path is sent to the waste liquid reservoir 8.
図1の一部断面図に示したように、本実施形態のマイクロチップ1は、流路溝が形成された流路基板2に被覆基板4を貼り合わせることにより流路が形成されている。次に、流路基板2に被覆基板4を貼り合わせる工程について図3、図4を用いて説明する。 As shown in the partial cross-sectional view of FIG. 1, in the microchip 1 of this embodiment, the flow path is formed by bonding the covering substrate 4 to the flow path substrate 2 in which the flow path grooves are formed. Next, the process of bonding the covering substrate 4 to the flow path substrate 2 will be described with reference to FIGS.
図3、図5、図6は、本発明の実施形態における流路基板2に被覆基板4を貼り合わせる際に用いる貼付装置90の断面図、図4は流路基板2と被覆基板4の位置決めを説明するための平面図である。 3, 5, and 6 are cross-sectional views of a bonding device 90 used when the coated substrate 4 is bonded to the flow path substrate 2 in the embodiment of the present invention, and FIG. 4 is a positioning of the flow path substrate 2 and the coated substrate 4. It is a top view for demonstrating.
本発明では、真空下で流路基板2と被覆基板4を貼り合わせることにより、空気が流路基板2と被覆基板4の隙間に残らないようにしている。図3は、位置決め工程を行うときの貼付装置90の断面図である。図5は、貼り合わせ工程を行うときの貼付装置90の断面図、図6は圧着工程を行うときの貼付装置90の断面図である。なお、これまでに説明した機能要素と同じ機能要素には同番号を付し、説明を省略する。 In the present invention, the flow path substrate 2 and the cover substrate 4 are bonded together under vacuum so that air does not remain in the gap between the flow path substrate 2 and the cover substrate 4. FIG. 3 is a cross-sectional view of the sticking device 90 when performing the positioning step. FIG. 5 is a cross-sectional view of the sticking device 90 when performing the bonding step, and FIG. 6 is a cross-sectional view of the sticking device 90 when performing the crimping step. In addition, the same number is attached | subjected to the same functional element as the functional element demonstrated so far, and description is abbreviate | omitted.
図3を用いて貼付装置90の構造について説明する。 The structure of the sticking device 90 will be described with reference to FIG.
貼付装置90の気密室Bは、下台59を弾性シート53が取り付けられた中蓋57で密閉することにより構成される。中蓋57は開閉可能であり、中蓋57を閉じると下台59の凹部と密閉した空間を形成する。弾性シート53はゴムなどの弾性体からなるシートであり中蓋57により四辺を支持されている。 The hermetic chamber B of the sticking device 90 is configured by sealing the lower base 59 with an inner lid 57 to which an elastic sheet 53 is attached. The inner lid 57 can be opened and closed. When the inner lid 57 is closed, a closed space is formed with the recess of the lower base 59. The elastic sheet 53 is a sheet made of an elastic body such as rubber, and is supported on four sides by an inner lid 57.
また、中蓋57を覆う開閉可能な外蓋58が設けられている。外蓋58を閉じると、外蓋58と中蓋57により形成される空間は密閉された空間になる。外蓋58と中蓋57によって密閉された空間を外蓋空間Aと呼ぶ。 In addition, an openable / closable outer lid 58 that covers the inner lid 57 is provided. When the outer lid 58 is closed, the space formed by the outer lid 58 and the inner lid 57 becomes a sealed space. A space sealed by the outer lid 58 and the inner lid 57 is referred to as an outer lid space A.
中蓋57と下台59の凹部により形成される外蓋空間Aと、外蓋58と中蓋57により形成される気密室Bは、それぞれパイプ66から連通する真空ポンプ61によって吸引し真空状態にすることができる。パイプ66は外蓋空間A、気密室Bおよび真空ポンプ61と連通し、バルブ63、64により経路を開閉することができる。外蓋58に設けられた穴に取り付けられたバルブ65は、外蓋空間Aに空気を導入するためのバルブである。 The outer lid space A formed by the recesses of the inner lid 57 and the lower base 59 and the airtight chamber B formed by the outer lid 58 and the inner lid 57 are each sucked by the vacuum pump 61 communicating from the pipe 66 to be in a vacuum state. be able to. The pipe 66 communicates with the outer lid space A, the airtight chamber B, and the vacuum pump 61, and the path can be opened and closed by valves 63 and 64. A valve 65 attached to a hole provided in the outer lid 58 is a valve for introducing air into the outer lid space A.
[位置決め工程]
56は位置決めピンであり、基準穴400と基準穴200を位置決めピン56に貫通することにより流路基板2と被覆基板4の位置決めをする。また、貼付装置90には基準穴401と基準穴201を位置決めする位置決めピン55も設けられている。位置決めピン56の先端部は図3に図示するように基準穴400に嵌合するよう直径が小さくなっている。また、図3に図示するように位置決めピン56の先端部に次ぐ少なくとも流路基板2の厚みより長い部分は、基準穴200に嵌合する直径であり、さらに下部は基準穴200が入らない直径になっている。また、位置決めピン56はバネ67により図面上方向に付勢されている。位置決めピン55も位置決めピン56と同じ形状であり、基準穴401と基準穴201に嵌合し図示せぬバネにより付勢させている。[Positioning process]
Reference numeral 56 denotes a positioning pin, which positions the flow path substrate 2 and the covering substrate 4 by passing the reference hole 400 and the reference hole 200 through the positioning pin 56. The sticking device 90 is also provided with a positioning hole 55 for positioning the reference hole 401 and the reference hole 201. The tip of the positioning pin 56 has a small diameter so as to fit in the reference hole 400 as shown in FIG. Further, as shown in FIG. 3, at least a portion longer than the thickness of the flow path substrate 2 after the tip of the positioning pin 56 has a diameter that fits into the reference hole 200, and a lower portion has a diameter that the reference hole 200 does not enter. It has become. The positioning pin 56 is biased upward by a spring 67 in the drawing. The positioning pin 55 has the same shape as the positioning pin 56, and is fitted into the reference hole 401 and the reference hole 201 and is urged by a spring (not shown).
図4では流路基板2に被覆基板4を重ねようとする状態を示している。貼付装置90を用いて貼付を行うときは最初に流路基板2の基準穴200を位置決めピン56に、基準穴201を位置決めピン55に挿入し、下台59の中に載置する。次に、被覆基板4の基準穴400、401を位置決めピン56、55に挿入することにより2枚の基板が透明な場合でも容易に位置合わせをすることができる。また、例えば図4に図示する流路基板2の凹部211と被覆基板4の連通孔11aの位置合わせを精度良く行うことができる。そのほかの連通穴や凹部についても同様であり流路基板2と被覆基板4に基準穴を設けることにより精度良く位置合わせができる。 FIG. 4 shows a state where the coated substrate 4 is intended to overlap the flow path substrate 2. When sticking is performed using the sticking device 90, first, the reference hole 200 of the flow path substrate 2 is inserted into the positioning pin 56 and the reference hole 201 is inserted into the positioning pin 55 and placed in the lower base 59. Next, the reference holes 400 and 401 of the coated substrate 4 are inserted into the positioning pins 56 and 55 so that the alignment can be easily performed even when the two substrates are transparent. Further, for example, the alignment of the recess 211 of the flow path substrate 2 illustrated in FIG. 4 and the communication hole 11a of the covering substrate 4 can be performed with high accuracy. The same applies to other communication holes and recesses, and by providing a reference hole in the flow path substrate 2 and the covering substrate 4, alignment can be performed with high accuracy.
図3では、位置決めピン56に流路基板2の基準穴200が嵌合し、位置決めピン55も流路基板2の図示せぬ基準穴201に挿入されている。また、被覆基板4の基準穴400を位置決めピン56に挿入し、図示せぬ基準穴401も位置決めピン55に挿入した状態である。位置決めピン56はバネ67により、位置決めピン55は図示せぬバネにより紙面上側に付勢され、位置決めピン56、55ともに紙面上下方向に移動可能である。 In FIG. 3, the reference hole 200 of the flow path substrate 2 is fitted to the positioning pin 56, and the positioning pin 55 is also inserted into the reference hole 201 (not shown) of the flow path substrate 2. Further, the reference hole 400 of the coated substrate 4 is inserted into the positioning pin 56, and the reference hole 401 (not shown) is also inserted into the positioning pin 55. The positioning pin 56 is urged upward by a spring 67 and the positioning pin 55 by a spring (not shown), and both the positioning pins 56 and 55 are movable in the vertical direction of the paper.
図3の状態では位置決めピン56、55によって被覆基板4が支持され、被覆基板4と流路基板2の間には隙間が空いている。また、被覆基板4の流路基板2と対向する面には予め接着剤を塗布した粘着層5が形成されている。 In the state of FIG. 3, the coated substrate 4 is supported by the positioning pins 56 and 55, and a gap is left between the coated substrate 4 and the flow path substrate 2. An adhesive layer 5 to which an adhesive is applied in advance is formed on the surface of the coated substrate 4 that faces the flow path substrate 2.
[貼り合わせ工程]
最初にバルブ63、64を空け、バルブ65を閉じて真空ポンプ61によって外蓋空間A、気密室B内の空気を吸気し真空状態にする。[Lamination process]
First, the valves 63 and 64 are opened, the valve 65 is closed, and the air in the outer lid space A and the hermetic chamber B is sucked into the vacuum state by the vacuum pump 61.
次に、バルブ63を閉じた後、バルブ65を空け外蓋空間Aに空気を導入する。すると、図5のように弾性シート53は真空状態の気密室B側に引き込まれ、位置決めピン56、55に支持されている被覆基板4を押し込んで、粘着層5を挟んで被覆基板4を流路基板2に密着する。このようにすると、弾性シート53を短時間で気密室B側に引き込み被覆基板4を貼り合わせることができる。 Next, after the valve 63 is closed, the valve 65 is opened and air is introduced into the outer lid space A. Then, as shown in FIG. 5, the elastic sheet 53 is drawn into the airtight chamber B in a vacuum state, and the coated substrate 4 supported by the positioning pins 56 and 55 is pushed in so that the coated substrate 4 flows through the adhesive layer 5. Adheres closely to the road substrate 2. If it does in this way, the elastic sheet 53 can be drawn in to the airtight chamber B side in a short time, and the coating substrate 4 can be bonded together.
なお、外蓋空間Aは必ずしも真空にする必要はなく、最初からバルブ63を閉じ、バルブ65を開放にして真空ポンプ61によって気密室Bだけを吸気し真空状態にしても被覆基板4を貼り合わせることができる。 The outer lid space A does not necessarily need to be evacuated. The valve 63 is closed from the beginning, the valve 65 is opened, and only the airtight chamber B is sucked by the vacuum pump 61 so that the coated substrate 4 is bonded. be able to.
[圧着工程]
圧着工程では図6のように外蓋58を空けて、弾性シート53の上部を開放する。気密室Bは真空状態のままである。駆動機構69により加圧ローラ62を紙面下方向に下降させ弾性シート53に圧接する。駆動機構69は紙面左右方向に加圧ローラ62を移動させ、弾性シート53の上から被覆基板4と流路基板2を加圧し、被覆基板4と流路基板2の間に浮きが発生しないようにする。[Crimping process]
In the crimping step, the outer lid 58 is opened as shown in FIG. 6, and the upper portion of the elastic sheet 53 is opened. The hermetic chamber B remains in a vacuum state. The pressure roller 62 is lowered by the driving mechanism 69 in the downward direction on the paper surface and is brought into pressure contact with the elastic sheet 53. The drive mechanism 69 moves the pressure roller 62 in the left-right direction on the paper surface to press the coated substrate 4 and the flow path substrate 2 from above the elastic sheet 53 so that no floating occurs between the coated substrate 4 and the flow path substrate 2. To.
このように真空下で貼り合わせを行うと、流路基板2の溝や穴にヒケやバリが発生したり、基板に反りが発生していても、被覆基板4と流路基板2の間に空気を残存させることなく被覆基板4と流路基板2を接着することができる。また、作製したマイクロチップ1にも反りが発生することがない。 When bonding is performed under vacuum in this way, even if sink marks or burrs are generated in the grooves or holes of the flow path substrate 2 or the substrate is warped, the gap is between the coated substrate 4 and the flow path substrate 2. The coated substrate 4 and the flow path substrate 2 can be bonded without leaving air. Further, the produced microchip 1 is not warped.
図7は、本発明のマイクロチップ1を用いた反応検出装置80の外観図である。 FIG. 7 is an external view of a reaction detection device 80 using the microchip 1 of the present invention.
反応検出装置80はマイクロチップ1に予め注入された検体と、試薬との反応を自動的に検出し、表示部84に結果を表示する装置である。 The reaction detection device 80 is a device that automatically detects a reaction between a specimen previously injected into the microchip 1 and a reagent and displays the result on the display unit 84.
反応検出装置80の筐体82には挿入口83があり、マイクロチップ1を挿入口83に差し込んで筐体82の内部にセットするようになっている。なお、挿入口83はマイクロチップ1を挿入時に挿入口83に接触しないように、マイクロチップ1の厚みより十分高さがある。85はメモリカードスロット、86はプリント出力口、87は操作パネル、88は入出力端子である。 The housing 82 of the reaction detection device 80 has an insertion port 83, and the microchip 1 is inserted into the insertion port 83 and set inside the housing 82. The insertion port 83 is sufficiently higher than the thickness of the microchip 1 so as not to contact the insertion port 83 when the microchip 1 is inserted. Reference numeral 85 denotes a memory card slot, 86 denotes a print output port, 87 denotes an operation panel, and 88 denotes an input / output terminal.
検査担当者は図7の矢印方向にマイクロチップ1を挿入し、操作パネル87を操作して検査を開始させる。反応検出装置80の内部では、マイクロチップ1内の反応の検査が自動的に行われ、検査が終了すると液晶パネルなどで構成される表示部84に結果が表示される。検査結果は操作パネル87の操作により、プリント出力口86よりプリントを出力したり、メモリカードスロット85に挿入されたメモリカードに記憶することができる。また、外部入出力端子88から例えばLANケーブルを使って、パソコンなどにデータを保存することができる。 The person in charge of inspection inserts the microchip 1 in the direction of the arrow in FIG. 7 and operates the operation panel 87 to start the inspection. Inside the reaction detector 80, the reaction in the microchip 1 is automatically inspected, and when the inspection is completed, the result is displayed on the display unit 84 constituted by a liquid crystal panel or the like. The inspection result can be output from the print output port 86 or stored in a memory card inserted into the memory card slot 85 by operating the operation panel 87. Further, data can be stored in the personal computer or the like from the external input / output terminal 88 using, for example, a LAN cable.
以上このように、本発明によれば、歩留まりが高く生産が容易なマイクロチップの製造方法、マイクロチップ、真空貼付装置を提供することができる。 As described above, according to the present invention, it is possible to provide a microchip manufacturing method, a microchip, and a vacuum sticking apparatus that are easy to produce with a high yield.
Claims (7)
下層の前記基板の基準穴を位置決めピンに挿入した後、上層の前記基板の基準穴を該位置決めピンに挿入する位置決め工程と、
前記位置決め工程を行った前記基板を粘着層を挟んで真空下で貼り合わせる貼り合わせ工程と、
最上層の前記基板を加圧して圧着する圧着工程と、
を有することを特徴とするマイクロチップの製造方法。In a method of manufacturing a microchip in which at least two substrates are laminated,
A positioning step of inserting the reference hole of the upper substrate into the positioning pin after inserting the reference hole of the lower substrate into the positioning pin;
A bonding step in which the substrate subjected to the positioning step is bonded under vacuum with an adhesive layer interposed therebetween;
A pressure-bonding step of pressing and pressing the uppermost substrate;
A method for producing a microchip, comprising:
前記基板に積層する基準となる基準穴を設けたことを特徴とするマイクロチップ。In a microchip formed by laminating at least two substrates,
A microchip comprising a reference hole serving as a reference for stacking on the substrate.
前記基板を載置する気密室と、
前記気密室に設けられ前記基板の基準穴を挿入する位置決めピンと、
前記気密室の上面に前記基板と平行に配設された弾性シートと、
前記気密室の内部を真空にする真空ポンプと、
を有し、積層する順に前記基板を前記位置決めピンに挿入した後、前記真空ポンプにより前記気密室の内部を真空にすることにより前記弾性シートを前記気密室の内部に引き込み少なくとも2つの前記基板を密着させて前記基板を貼り合わせることを特徴とする真空貼付装置。In a vacuum applicator for laminating at least two substrates,
An airtight chamber for placing the substrate;
A positioning pin provided in the hermetic chamber for inserting a reference hole of the substrate;
An elastic sheet disposed in parallel with the substrate on the upper surface of the hermetic chamber;
A vacuum pump for evacuating the inside of the hermetic chamber;
And inserting the substrates into the positioning pins in the stacking order, and then evacuating the inside of the hermetic chamber by the vacuum pump to draw the elastic sheet into the hermetic chamber so that at least two of the substrates are A vacuum bonding apparatus, wherein the substrates are bonded together.
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