JPS6489136A - Ion implanting apparatus and ion implanting method - Google Patents
Ion implanting apparatus and ion implanting methodInfo
- Publication number
- JPS6489136A JPS6489136A JP24405787A JP24405787A JPS6489136A JP S6489136 A JPS6489136 A JP S6489136A JP 24405787 A JP24405787 A JP 24405787A JP 24405787 A JP24405787 A JP 24405787A JP S6489136 A JPS6489136 A JP S6489136A
- Authority
- JP
- Japan
- Prior art keywords
- ion
- implanted
- ion implanting
- substrate
- magnetic fields
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE:To make it possible to implant impurities to the sides of grooves formed on the surface of a semiconductor substrate or the like by providing magnetic fields between an ion scanning member and the substrate to which the ion is implanted. CONSTITUTION:A substrate 8 to which ion beams are implanted is scanned with the ion beams from an ion source 1 through an ion drawing-out member 2, an ion mass analyzing member 3, an ion accelerating member 4, and an ion scanning member 6, and impurities are implanted. Between the scanning member 5 and the substrate 8, AC magnetic fields 6 and 7 are provided, and the direction of the ion beam is regulated readily by the force in the rectangular direction through the magnetic fields 6 and 7. In such a way, the impurities can be implanted accurately even to the sides of grooves formed on the surface of the semiconductor substrate or the like.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP24405787A JPS6489136A (en) | 1987-09-30 | 1987-09-30 | Ion implanting apparatus and ion implanting method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP24405787A JPS6489136A (en) | 1987-09-30 | 1987-09-30 | Ion implanting apparatus and ion implanting method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6489136A true JPS6489136A (en) | 1989-04-03 |
Family
ID=17113084
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP24405787A Pending JPS6489136A (en) | 1987-09-30 | 1987-09-30 | Ion implanting apparatus and ion implanting method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6489136A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008543027A (en) * | 2005-06-07 | 2008-11-27 | バリアン・セミコンダクター・エクイップメント・アソシエイツ・インコーポレイテッド | Ion beam angle processing control technology |
JP2008546163A (en) * | 2005-06-07 | 2008-12-18 | バリアン・セミコンダクター・エクイップメント・アソシエイツ・インコーポレイテッド | Ion beam angular spread control technology |
-
1987
- 1987-09-30 JP JP24405787A patent/JPS6489136A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008543027A (en) * | 2005-06-07 | 2008-11-27 | バリアン・セミコンダクター・エクイップメント・アソシエイツ・インコーポレイテッド | Ion beam angle processing control technology |
JP2008546163A (en) * | 2005-06-07 | 2008-12-18 | バリアン・セミコンダクター・エクイップメント・アソシエイツ・インコーポレイテッド | Ion beam angular spread control technology |
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