JPS6488447A - Photosensitive composition - Google Patents
Photosensitive compositionInfo
- Publication number
- JPS6488447A JPS6488447A JP62245497A JP24549787A JPS6488447A JP S6488447 A JPS6488447 A JP S6488447A JP 62245497 A JP62245497 A JP 62245497A JP 24549787 A JP24549787 A JP 24549787A JP S6488447 A JPS6488447 A JP S6488447A
- Authority
- JP
- Japan
- Prior art keywords
- compd
- composition
- photosensitive agent
- phenolic
- titled composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
- C08G8/28—Chemically modified polycondensates
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
- C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
- C08G8/06—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of furfural
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D161/00—Coating compositions based on condensation polymers of aldehydes or ketones; Coating compositions based on derivatives of such polymers
- C09D161/04—Condensation polymers of aldehydes or ketones with phenols only
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
- G03F7/0758—Macromolecular compounds containing Si-O, Si-C or Si-N bonds with silicon- containing groups in the side chains
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
PURPOSE:To improve the RIE of the titled composition against oxygen, and to enable the alkaline development of said composition by incorporating a condensate of a phenolic compd. and a specified carbonyl compd., and a photosensitive agent in the titled composition. CONSTITUTION:The titled composition contains the condensate of the phenolic compd., the carbonyl compd. shown by formula I and the photosensitive agent. In formula I, R1 and R2 are each 1-15C alkyl group contg. silicon atom., hydrogen atom. or allyl group, and at least one of said groups is alkyl group, And, the phenolic compd. is exemplified by phenol or cresol, etc., and the photosensitive agent is exemplified by a naphthoquinone azide compd. or an azide compd. Thus, the excellent durability against the oxygen plasma (the RIE against oxygen) and the high sensitivity against the radiation of the titled composition are obtd., and the alkaline development of said composition is possible.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62245497A JPS6488447A (en) | 1987-09-29 | 1987-09-29 | Photosensitive composition |
DE3810247A DE3810247A1 (en) | 1987-03-26 | 1988-03-25 | LIGHT SENSITIVE COATING |
KR1019880003301A KR910004725B1 (en) | 1987-03-26 | 1988-03-26 | Photosensitive composition |
US07/455,783 US5063134A (en) | 1987-03-26 | 1990-01-02 | Photosensitive composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62245497A JPS6488447A (en) | 1987-09-29 | 1987-09-29 | Photosensitive composition |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6488447A true JPS6488447A (en) | 1989-04-03 |
Family
ID=17134547
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62245497A Pending JPS6488447A (en) | 1987-03-26 | 1987-09-29 | Photosensitive composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6488447A (en) |
-
1987
- 1987-09-29 JP JP62245497A patent/JPS6488447A/en active Pending
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