JPS6488447A - Photosensitive composition - Google Patents

Photosensitive composition

Info

Publication number
JPS6488447A
JPS6488447A JP62245497A JP24549787A JPS6488447A JP S6488447 A JPS6488447 A JP S6488447A JP 62245497 A JP62245497 A JP 62245497A JP 24549787 A JP24549787 A JP 24549787A JP S6488447 A JPS6488447 A JP S6488447A
Authority
JP
Japan
Prior art keywords
compd
composition
photosensitive agent
phenolic
titled composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62245497A
Other languages
Japanese (ja)
Inventor
Shuji Hayase
Kiyonobu Onishi
Rumiko Horiguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP62245497A priority Critical patent/JPS6488447A/en
Priority to DE3810247A priority patent/DE3810247A1/en
Priority to KR1019880003301A priority patent/KR910004725B1/en
Publication of JPS6488447A publication Critical patent/JPS6488447A/en
Priority to US07/455,783 priority patent/US5063134A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/28—Chemically modified polycondensates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
    • C08G8/06—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of furfural
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D161/00—Coating compositions based on condensation polymers of aldehydes or ketones; Coating compositions based on derivatives of such polymers
    • C09D161/04—Condensation polymers of aldehydes or ketones with phenols only
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G03F7/0758—Macromolecular compounds containing Si-O, Si-C or Si-N bonds with silicon- containing groups in the side chains

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To improve the RIE of the titled composition against oxygen, and to enable the alkaline development of said composition by incorporating a condensate of a phenolic compd. and a specified carbonyl compd., and a photosensitive agent in the titled composition. CONSTITUTION:The titled composition contains the condensate of the phenolic compd., the carbonyl compd. shown by formula I and the photosensitive agent. In formula I, R1 and R2 are each 1-15C alkyl group contg. silicon atom., hydrogen atom. or allyl group, and at least one of said groups is alkyl group, And, the phenolic compd. is exemplified by phenol or cresol, etc., and the photosensitive agent is exemplified by a naphthoquinone azide compd. or an azide compd. Thus, the excellent durability against the oxygen plasma (the RIE against oxygen) and the high sensitivity against the radiation of the titled composition are obtd., and the alkaline development of said composition is possible.
JP62245497A 1987-03-26 1987-09-29 Photosensitive composition Pending JPS6488447A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP62245497A JPS6488447A (en) 1987-09-29 1987-09-29 Photosensitive composition
DE3810247A DE3810247A1 (en) 1987-03-26 1988-03-25 LIGHT SENSITIVE COATING
KR1019880003301A KR910004725B1 (en) 1987-03-26 1988-03-26 Photosensitive composition
US07/455,783 US5063134A (en) 1987-03-26 1990-01-02 Photosensitive composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62245497A JPS6488447A (en) 1987-09-29 1987-09-29 Photosensitive composition

Publications (1)

Publication Number Publication Date
JPS6488447A true JPS6488447A (en) 1989-04-03

Family

ID=17134547

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62245497A Pending JPS6488447A (en) 1987-03-26 1987-09-29 Photosensitive composition

Country Status (1)

Country Link
JP (1) JPS6488447A (en)

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