JPS6486539A - Filler for semiconductor sealing medium - Google Patents

Filler for semiconductor sealing medium

Info

Publication number
JPS6486539A
JPS6486539A JP16627587A JP16627587A JPS6486539A JP S6486539 A JPS6486539 A JP S6486539A JP 16627587 A JP16627587 A JP 16627587A JP 16627587 A JP16627587 A JP 16627587A JP S6486539 A JPS6486539 A JP S6486539A
Authority
JP
Japan
Prior art keywords
silica
thermal expansion
glass
inorganic powder
expansion coefficient
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16627587A
Other languages
Japanese (ja)
Inventor
Yasuto Fukui
Kenji Otaguro
Takashi Chiba
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Denka Co Ltd
Original Assignee
Denki Kagaku Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Denki Kagaku Kogyo KK filed Critical Denki Kagaku Kogyo KK
Priority to JP16627587A priority Critical patent/JPS6486539A/en
Publication of JPS6486539A publication Critical patent/JPS6486539A/en
Pending legal-status Critical Current

Links

Landscapes

  • Glass Compositions (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Abstract

PURPOSE:To reduce thermal stress, and to improve insulating properties and moisture resistance by using inorganic powder, which has a thermal expansion coefficient smaller than that of an silica based material and the quantity of eluted alkali metallic ions of which is made to have a specific value, as fillers. CONSTITUTION:A silica-AO2 group glass (A=Ti, Zr, Hf), such as silica-titania glass, aluminosilicate, beta-quartz stable at normal temperature or below, and an Li2O-Al2O3-SiO2 group (lithium aluminosilicate) as one having the phase of a keytite type crystal structure are known as inorganic powder, which has a thermal expansion coefficient smaller than silica glass and the quantity of eluted alkali metallic ions of which extends over 0.1wt.% or smaller. These substances are known as materials having negative thermal expansion coefficients, and the range of the compositions are shown by slashed sections in the diagram.
JP16627587A 1987-05-08 1987-07-04 Filler for semiconductor sealing medium Pending JPS6486539A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16627587A JPS6486539A (en) 1987-05-08 1987-07-04 Filler for semiconductor sealing medium

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP11049087 1987-05-08
JP16627587A JPS6486539A (en) 1987-05-08 1987-07-04 Filler for semiconductor sealing medium

Publications (1)

Publication Number Publication Date
JPS6486539A true JPS6486539A (en) 1989-03-31

Family

ID=26450113

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16627587A Pending JPS6486539A (en) 1987-05-08 1987-07-04 Filler for semiconductor sealing medium

Country Status (1)

Country Link
JP (1) JPS6486539A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0543270A (en) * 1991-06-03 1993-02-23 Office Natl Etud Rech Aerospat <Onera> Glass-ceramic li-al-si-o composition and its preparation
US6365269B1 (en) 1997-11-20 2002-04-02 Infineon Technologies Ag Plastic compositions for sheathing a metal or semiconductor body
WO2019044323A1 (en) * 2017-08-29 2019-03-07 日本電気硝子株式会社 Filler powder and method for producing same
WO2022202347A1 (en) * 2021-03-24 2022-09-29 パナソニックIpマネジメント株式会社 Resin composition, prepreg, resin-coated film, resin-coated metal foil, metal-clad laminate, and wiring board
WO2022202346A1 (en) * 2021-03-24 2022-09-29 パナソニックIpマネジメント株式会社 Resin composition, prepreg, resin-coated film, resin-coated metal foil, metal-clad laminate, and wiring board

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0543270A (en) * 1991-06-03 1993-02-23 Office Natl Etud Rech Aerospat <Onera> Glass-ceramic li-al-si-o composition and its preparation
US6365269B1 (en) 1997-11-20 2002-04-02 Infineon Technologies Ag Plastic compositions for sheathing a metal or semiconductor body
WO2019044323A1 (en) * 2017-08-29 2019-03-07 日本電気硝子株式会社 Filler powder and method for producing same
JP2019038733A (en) * 2017-08-29 2019-03-14 日本電気硝子株式会社 Filler powder and method for producing the same
WO2022202347A1 (en) * 2021-03-24 2022-09-29 パナソニックIpマネジメント株式会社 Resin composition, prepreg, resin-coated film, resin-coated metal foil, metal-clad laminate, and wiring board
WO2022202346A1 (en) * 2021-03-24 2022-09-29 パナソニックIpマネジメント株式会社 Resin composition, prepreg, resin-coated film, resin-coated metal foil, metal-clad laminate, and wiring board

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