JPS6484767A - Tunable laser device - Google Patents
Tunable laser deviceInfo
- Publication number
- JPS6484767A JPS6484767A JP62243359A JP24335987A JPS6484767A JP S6484767 A JPS6484767 A JP S6484767A JP 62243359 A JP62243359 A JP 62243359A JP 24335987 A JP24335987 A JP 24335987A JP S6484767 A JPS6484767 A JP S6484767A
- Authority
- JP
- Japan
- Prior art keywords
- wavelength
- signal
- pressure
- airtight chamber
- central
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
- H01S3/1062—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using a controlled passive interferometer, e.g. a Fabry-Perot etalon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
- H01S3/136—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling devices placed within the cavity
- H01S3/137—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling devices placed within the cavity for stabilising of frequency
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Lasers (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
PURPOSE:To set a central wavelength at an arbitrary definite value by a method wherein at least one wavelength-selecting element is installed in an airtight chamber and a pressure control means used to control a pressure of a gas inside the airtight chamber and a central-wavelength detection means used to detect the central wavelength of a laser beam are installed. CONSTITUTION:An air space etalon 4 as a wavelength-selecting element and a reflection-type grating 5 are arranged on an optical axis of an optical resonator; both are installed inside an airtight chamber 6. A high-pressure air source 7 and a low-pressure air source 8 are connected to the airtight chamber 6 via respective valves 9, 10, and change the air pressure between gaps of the air space etalon 4 and around the grating 5. A wavelength detector 12 inputs a signal corresponding to a central wavelength of a sample beam to a comparator 13. The comparator 13 compares a signal with the reference signal which is sent from the wavelength detector 12, and outputs a signal to be used to open or shut the valve 9 or 10 in accordance with a deviation amount. The comparator 13 controls a selection wavelength of the wavelength signal wavelength- selecting element and fixes the central wavelength of a laser beam at a definite value.
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62243359A JPS6484767A (en) | 1987-09-28 | 1987-09-28 | Tunable laser device |
CA000578540A CA1302548C (en) | 1987-09-28 | 1988-09-27 | Laser apparatus |
EP88115902A EP0310000B1 (en) | 1987-09-28 | 1988-09-27 | Laser apparatus |
DE3889831T DE3889831T2 (en) | 1987-09-28 | 1988-09-27 | Laser apparatus. |
US07/499,206 US4991178A (en) | 1987-09-28 | 1990-03-19 | Laser apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62243359A JPS6484767A (en) | 1987-09-28 | 1987-09-28 | Tunable laser device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6484767A true JPS6484767A (en) | 1989-03-30 |
Family
ID=17102665
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62243359A Pending JPS6484767A (en) | 1987-09-28 | 1987-09-28 | Tunable laser device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6484767A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02307281A (en) * | 1989-05-23 | 1990-12-20 | Komatsu Ltd | Wavelength detector |
JPH036011A (en) * | 1989-06-02 | 1991-01-11 | Nec Yamagata Ltd | Wafer aligner for semiconductor-device manufacture |
JPH0476976A (en) * | 1990-07-19 | 1992-03-11 | Komatsu Ltd | Narrow-band oscillation laser device |
JP2002329911A (en) * | 2001-04-27 | 2002-11-15 | Komatsu Ltd | Laser device, amplifier and ultraviolet laser device |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6216589A (en) * | 1985-07-16 | 1987-01-24 | Toshiba Corp | Laser device for separating isotope |
JPS6422087A (en) * | 1987-07-17 | 1989-01-25 | Komatsu Mfg Co Ltd | Control equipment for laser wavelength |
JPS6484681A (en) * | 1987-09-26 | 1989-03-29 | Mitsubishi Electric Corp | Laser apparatus |
-
1987
- 1987-09-28 JP JP62243359A patent/JPS6484767A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6216589A (en) * | 1985-07-16 | 1987-01-24 | Toshiba Corp | Laser device for separating isotope |
JPS6422087A (en) * | 1987-07-17 | 1989-01-25 | Komatsu Mfg Co Ltd | Control equipment for laser wavelength |
JPS6484681A (en) * | 1987-09-26 | 1989-03-29 | Mitsubishi Electric Corp | Laser apparatus |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02307281A (en) * | 1989-05-23 | 1990-12-20 | Komatsu Ltd | Wavelength detector |
JPH036011A (en) * | 1989-06-02 | 1991-01-11 | Nec Yamagata Ltd | Wafer aligner for semiconductor-device manufacture |
JPH0476976A (en) * | 1990-07-19 | 1992-03-11 | Komatsu Ltd | Narrow-band oscillation laser device |
JP2002329911A (en) * | 2001-04-27 | 2002-11-15 | Komatsu Ltd | Laser device, amplifier and ultraviolet laser device |
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