JPS6483101A - Diffracted beam separation optical system - Google Patents

Diffracted beam separation optical system

Info

Publication number
JPS6483101A
JPS6483101A JP62241233A JP24123387A JPS6483101A JP S6483101 A JPS6483101 A JP S6483101A JP 62241233 A JP62241233 A JP 62241233A JP 24123387 A JP24123387 A JP 24123387A JP S6483101 A JPS6483101 A JP S6483101A
Authority
JP
Japan
Prior art keywords
diffraction
diffracted
mask
diffracted beams
diffraction lattice
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62241233A
Other languages
Japanese (ja)
Inventor
Takeo Sato
Nobuhiro Araki
Shinichiro Aoki
Katsumasa Yamaguchi
Noboru Nomura
Keisuke Koga
Kazuhiro Yamashita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP62241233A priority Critical patent/JPS6483101A/en
Publication of JPS6483101A publication Critical patent/JPS6483101A/en
Pending legal-status Critical Current

Links

Landscapes

  • Length Measuring Devices By Optical Means (AREA)
  • Optical Transform (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To take out a beam intensity signal having a high S/N ratio using a high sensitivity detector having a large caliber, by once condensing diffracted beams approaching each other and subsequently changing the beam paths of the diffracted beams by a reflecting mirror having a sharp wedge shape. CONSTITUTION:When the first diffraction lattice 5 is formed on a mask 4 and the second diffraction lattice 7 is formed on a water 6 to perform the alignment of the mask and the wafer, the beam emitted from a laser 1 is split into two beam by a splitting prism 2 and incident to an illumination lens 3 to parallelly illuminate the diffraction lattices 5, 7. The diffraction lattices 5, 7 emit parallel diffracted beams approaching each other and these diffracted beams are once converged by a cylindrical lens 9 and subsequently reflected to photodectors separately by a reflecting prism 10 whose leading end is formed into a sharp wedge shape. By this method, the diffracted beam from the diffraction lattice 5 on the mask 4 and the diffracted beam from the diffraction lattice 7 on the wafer 7 can be separated and detected using the photodetectors 11, 12 each having a large diameter.
JP62241233A 1987-09-25 1987-09-25 Diffracted beam separation optical system Pending JPS6483101A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62241233A JPS6483101A (en) 1987-09-25 1987-09-25 Diffracted beam separation optical system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62241233A JPS6483101A (en) 1987-09-25 1987-09-25 Diffracted beam separation optical system

Publications (1)

Publication Number Publication Date
JPS6483101A true JPS6483101A (en) 1989-03-28

Family

ID=17071182

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62241233A Pending JPS6483101A (en) 1987-09-25 1987-09-25 Diffracted beam separation optical system

Country Status (1)

Country Link
JP (1) JPS6483101A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5191465A (en) * 1990-03-28 1993-03-02 Matsushita Electric Industrial Co., Ltd. Optical apparatus for alignment of reticle and wafer in exposure apparatus
JP2017041608A (en) * 2015-08-21 2017-02-23 キヤノン株式会社 Detection device, imprinting device, manufacturing method for article and illumination optical system
CN115684086A (en) * 2022-10-12 2023-02-03 江苏科技大学 Device and method for measuring solution refractive index based on double-wedge interference model

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5191465A (en) * 1990-03-28 1993-03-02 Matsushita Electric Industrial Co., Ltd. Optical apparatus for alignment of reticle and wafer in exposure apparatus
JP2017041608A (en) * 2015-08-21 2017-02-23 キヤノン株式会社 Detection device, imprinting device, manufacturing method for article and illumination optical system
WO2017033410A1 (en) * 2015-08-21 2017-03-02 Canon Kabushiki Kaisha Detection device, imprint apparatus, method of manufacturing article, illumination optical system, and detection method
CN107924817A (en) * 2015-08-21 2018-04-17 佳能株式会社 Detection device, imprinting apparatus, method, lamp optical system and the detection method for manufacturing article
KR20180041736A (en) * 2015-08-21 2018-04-24 캐논 가부시끼가이샤 Detection device, imprint device, article manufacturing method, illumination optical system and detection method
US10732523B2 (en) 2015-08-21 2020-08-04 Canon Kabushiki Kaisha Detection device, imprint apparatus, method of manufacturing article, illumination optical system, and detection method
CN115684086A (en) * 2022-10-12 2023-02-03 江苏科技大学 Device and method for measuring solution refractive index based on double-wedge interference model

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