JPS6483101A - Diffracted beam separation optical system - Google Patents
Diffracted beam separation optical systemInfo
- Publication number
- JPS6483101A JPS6483101A JP62241233A JP24123387A JPS6483101A JP S6483101 A JPS6483101 A JP S6483101A JP 62241233 A JP62241233 A JP 62241233A JP 24123387 A JP24123387 A JP 24123387A JP S6483101 A JPS6483101 A JP S6483101A
- Authority
- JP
- Japan
- Prior art keywords
- diffraction
- diffracted
- mask
- diffracted beams
- diffraction lattice
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Length Measuring Devices By Optical Means (AREA)
- Optical Transform (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE:To take out a beam intensity signal having a high S/N ratio using a high sensitivity detector having a large caliber, by once condensing diffracted beams approaching each other and subsequently changing the beam paths of the diffracted beams by a reflecting mirror having a sharp wedge shape. CONSTITUTION:When the first diffraction lattice 5 is formed on a mask 4 and the second diffraction lattice 7 is formed on a water 6 to perform the alignment of the mask and the wafer, the beam emitted from a laser 1 is split into two beam by a splitting prism 2 and incident to an illumination lens 3 to parallelly illuminate the diffraction lattices 5, 7. The diffraction lattices 5, 7 emit parallel diffracted beams approaching each other and these diffracted beams are once converged by a cylindrical lens 9 and subsequently reflected to photodectors separately by a reflecting prism 10 whose leading end is formed into a sharp wedge shape. By this method, the diffracted beam from the diffraction lattice 5 on the mask 4 and the diffracted beam from the diffraction lattice 7 on the wafer 7 can be separated and detected using the photodetectors 11, 12 each having a large diameter.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62241233A JPS6483101A (en) | 1987-09-25 | 1987-09-25 | Diffracted beam separation optical system |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62241233A JPS6483101A (en) | 1987-09-25 | 1987-09-25 | Diffracted beam separation optical system |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6483101A true JPS6483101A (en) | 1989-03-28 |
Family
ID=17071182
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62241233A Pending JPS6483101A (en) | 1987-09-25 | 1987-09-25 | Diffracted beam separation optical system |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6483101A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5191465A (en) * | 1990-03-28 | 1993-03-02 | Matsushita Electric Industrial Co., Ltd. | Optical apparatus for alignment of reticle and wafer in exposure apparatus |
JP2017041608A (en) * | 2015-08-21 | 2017-02-23 | キヤノン株式会社 | Detection device, imprinting device, manufacturing method for article and illumination optical system |
CN115684086A (en) * | 2022-10-12 | 2023-02-03 | 江苏科技大学 | Device and method for measuring solution refractive index based on double-wedge interference model |
-
1987
- 1987-09-25 JP JP62241233A patent/JPS6483101A/en active Pending
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5191465A (en) * | 1990-03-28 | 1993-03-02 | Matsushita Electric Industrial Co., Ltd. | Optical apparatus for alignment of reticle and wafer in exposure apparatus |
JP2017041608A (en) * | 2015-08-21 | 2017-02-23 | キヤノン株式会社 | Detection device, imprinting device, manufacturing method for article and illumination optical system |
WO2017033410A1 (en) * | 2015-08-21 | 2017-03-02 | Canon Kabushiki Kaisha | Detection device, imprint apparatus, method of manufacturing article, illumination optical system, and detection method |
CN107924817A (en) * | 2015-08-21 | 2018-04-17 | 佳能株式会社 | Detection device, imprinting apparatus, method, lamp optical system and the detection method for manufacturing article |
KR20180041736A (en) * | 2015-08-21 | 2018-04-24 | 캐논 가부시끼가이샤 | Detection device, imprint device, article manufacturing method, illumination optical system and detection method |
US10732523B2 (en) | 2015-08-21 | 2020-08-04 | Canon Kabushiki Kaisha | Detection device, imprint apparatus, method of manufacturing article, illumination optical system, and detection method |
CN115684086A (en) * | 2022-10-12 | 2023-02-03 | 江苏科技大学 | Device and method for measuring solution refractive index based on double-wedge interference model |
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