JPS6479380A - Electroless copper plating solution - Google Patents
Electroless copper plating solutionInfo
- Publication number
- JPS6479380A JPS6479380A JP23653287A JP23653287A JPS6479380A JP S6479380 A JPS6479380 A JP S6479380A JP 23653287 A JP23653287 A JP 23653287A JP 23653287 A JP23653287 A JP 23653287A JP S6479380 A JPS6479380 A JP S6479380A
- Authority
- JP
- Japan
- Prior art keywords
- copper
- plating
- complexing agent
- soln
- added
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/38—Coating with copper
- C23C18/40—Coating with copper using reducing agents
- C23C18/405—Formaldehyde
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemically Coating (AREA)
Abstract
PURPOSE:To increase the rate of deposition of plating and to give fine luster to plated copper by simultaneously adding hydroxyethylethylenediaminetriacetic acid and a complexing agent for copper (I) to a copper plating soln. having a prescribed compsn. CONSTITUTION:Hydroxyethylethylenediaminetriacetic acid (HEDTA) and a complexing agent for copper (I) are simultaneously added to the conventional electroless copper plating soln. made of an aq. soln. contg. a copper salt, a complexing agent for the salt, alkali hydroxide and formaldehyde. Dipyridyl or a deriv. thereof and phenanthroline or a deriv. thereof are used as the complexing agent for copper (I) and added at about 0.001-1g/l concn. The HEDTA is added at about 0.01-0.35g/l concn. Plating copper having fine luster is obtd. by using the resulting plating soln.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23653287A JPS6479380A (en) | 1987-09-21 | 1987-09-21 | Electroless copper plating solution |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23653287A JPS6479380A (en) | 1987-09-21 | 1987-09-21 | Electroless copper plating solution |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6479380A true JPS6479380A (en) | 1989-03-24 |
Family
ID=17002075
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP23653287A Pending JPS6479380A (en) | 1987-09-21 | 1987-09-21 | Electroless copper plating solution |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6479380A (en) |
-
1987
- 1987-09-21 JP JP23653287A patent/JPS6479380A/en active Pending
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