US3754940A - Electroless plating solutions containing sulfamic acid and salts thereof - Google Patents

Abstract

Sulfamic acid and its salts are used to stabilize alkaline electroless copper plating solutions against decomposition. When employed in the second bath of a two-bath electroless plating system, the presence of sulfamic acid and its salts permits rapid deposition, over a broad range of concentrations, of copper onto an initial copper or nickel plate, while preventing deposition of copper onto a noble metal catalyzed surface. The stabilizers also serve to supplement single-bath electroless copper plating systems.

Description

Elited States Patent [1 1 Kadison et al.

[ ELECTROLESS PLATING SOLUTIONS CONTAINING SULFAMIC ACID AND SALTS THEREOF [75] Inventors: Leon A. Kadison; Eileen Maguire,

both of Pasadena, Calif.

[73] Assignee: Crown City Plating Company, El

Monte, Calif.

[22] Filed: Sept. 6, 1972 [2]] Appl. No.: 286,837

Related US. Application Data [63] Continuation-impart of Ser. No. 118,480, Feb. 24,

1971, abandoned.

[52] US. Cl. 106/1, 117/47 A, 117/130 E [51] Int. Cl. C23c 3/02 [58] Field of Search 106/1; 117/47 A,

[111 3,754,940 [451 Aug. 28, 1973 Primary Examinerl.orenzo B. Hayes Attorney-Robert L. Parker, John P. Grinnell et a1.

[57] ABSTRACT Sulfamic acid and its salts are used to stabilize alkaline electroless copper plating solutions against decomposition. When employed in the second bath of a two-bath electroless plating system, the presence of sulfamic acid and its salts permits rapid deposition, over a broad range of concentrations, of copper onto an initial copper or nickel plate, while preventing deposition of copper onto a noble metal catalyzed surface. The stabilizers also serve to supplement single-bath electroless copper plating systems.

5 Claims, No Drawings ELECTROLESS PLATING SOLUTIONS CONTAINING SULFAMIC ACID AND SALTS THEREOF This is a continuation-in-part of our application Ser. No. 118,480, filed Feb. 24, 1971, now abandoned.

BACKGROUND OF THE INVENTION The present invention relates to the electroless plating of resin surfaces and, more particularly, to inhibiting an electroless copper plating bath against solution decomposition due to impurities.

Considerable demand has developed for metal plated non-conductive articles, particularly plastic articles. In the finished product, the desirable characteristics of both the plastic and the metal are combined to offer thereby the technical and aesthetic advantages of each.

Although most resins are electrically nonconductive, a metal bond to the surface of the resin can be established by an initial plating operation known as electroless plating. This is typically accomplished by conditioning the surface of the resin for plating by contact with a strong oxidizing acid, seeding the conditioned surface by contact with a noble metal salt, e.g., a palladium chloride solution, then immersing the seeded surface in an auto-catalytic electroless plating solution wherein an initial coating of a conductive metal is established by chemical deposition. The metal coating formed acts as a buss and allows a thicker metal coating to be built up electrolytically. For most resins, contact with the oxidizing acid is often preceded by a chemical etch to improve the bond strength of the plate.

A typical formulation for an electroless plating solution consists essentially of a soluble cupric salt, such as copper sulfate; a complexing agent for the cupric ion, such as Rochelle salt; an alkali hydroxide for adjusting pH; a carbonate radical as a buffer; and a reducing agent for the cupric ion such as formaldehyde.

The mechanism by which polymeric objects having surfaces catalyzed by palladium metal may be plated auto-catalytically has been well described in the literature, such as, for example, U.S. Pat. No. 2,874,052.

Electroless plating solutions as described above are, however, subject to decomposition. For copper plating solutions, for example, the cupric ion inherently tends to reduce to the insoluble cuprous form. This may be overcome, in part, by the use of stabilizers, or by air agitation which serves to oxidize cuprous ion back to the cupric state.

Secondary sources of contamination, however, also materially contribute to decomposition. When the catalyzed plastic article is withdrawn from the noble metal salt bath, it too often carries with it, as drag-out, substances including copper, nickel, iron, palladium, gold, silver and even dust particles, which are catalytic toward solution decomposition. Palladium ion (Pd is notorious in that if stainless steel tanks or equipment are in contact with electroless (copper) bath even a minute amount of palladium ion with initiate plating of the copper onto steel. In addition, concentrations as low as one part per million will cause spontaneous decomposition of the solution with attendant precipitation and loss of copper.

It has been proposed to use plastic tanks for electroless plating baths to avoid the problem of plating on the stainless stell tanks. Even in plastic lined tanks, however, inevitable scratches in the lining result in initiation of decomposition because the scratches provide recesses within which hydrogen produced during the plating reaction is concentrated.

Attempts have also been made to stabilize electroless plating baths to minimize decomposition. However, most compounds which have been proposed as stabilizers retard the rate of electroless plating. While heating may be employed to increase the rate of deposition, it has not been generally used because heating also promotes decomposition.

We have employed an alternate route to minimize loss of valuable chemicals through decomposition of the plating solutions. This involves the use of two plating baths. One is a strike bath in which a noble metal catalyzed surface is initially plated in a bath essentially free of inhibitors or inhibited only to a minor extent. The other is a plating bath in which the article with a thin deposit of plating metal is further electrolessly plated and which is inhibited by a cyanide to the extent that if the article having the catalytic noble metal surface were passed directly into the bath without first passing through the strike bath, no plating metal would be deposited on the article. In this system, the plating bath remains stable for extended periods of time while the strike bath continuously decomposes. Since the volume of the strike bath is low relative to the volume in the plating bath, losses have been minimized. The cyanide inhibitor, however, retards deposition rate as its concentration increases.

' SUMMARY OF T HE INVENTION It has now been found that sulfamic acid and the salts thereof serve as unusually effective stabilizers for alkaline electroless copper plating solutions.

They are preferably employed in the second or plating bath of a two-bath electroless plating system. In that bath the presence of sulfamic acid and/or its salts may at molar concentrations as low as 0.02 mol per liter of solution inhibit the solution to prevent decomposition while preventing deposition of copper onto a noble metal catalyzed surface, but permitting rapid deposition of copper onto an article having an initially deposited coat of a plating metal.

In addition, sulfamic acid and/or its salts may be employed along or in conjunction with other inhibitors to stabilize the strike" bath of two-bath electroless plat ing systems, as well as conventional alkaline electroless copper or nickel solutions against spontaneous breakdown due to the presence of contaminants such as noble metal ions without materially reducing plating rate onto a noble metal catalyzed surface.

DESCRIPTION The present invention relates to the use of sulfamic acid and its salts as stabilizers for electroless plating solutions, particularly as stabilizers for the second or plating" bath of a two-bath electroless plating system. They may be employed alone or in conjunction with other known stabilizers.

Sulfamic acid is a white crystalline solid, having the formula HSO,NI-I,, which may be converted to its cor responding salt by reaction with a base, a metal salt, or an amine to form a compound having the formula X(SO,NI-I,)n wherein X is the cation contributed by the base, metal salt, or amine, and n is valence of the cation. The cation, of course, must not have a deleterious effect upon the formulated electroless plating solution.

In addition to the ammonium and amine cations, such as diethylenetriamine and diethanolamine, there may be employed as the metallic cations for the sulfamic acid salts, metals selected from Groups Ia, Ila, Ilb, IIIb, Va, Vla, and the third period of Group VIII of the periodic table as defined by Mendeleeff and published as the Periodic Chart of the Atoms, by W. N. Welch Manufacturing Company.

While no wise limiting, the preferred metals are lithium, sodium, potassium, barium, nickel, zinc, magnesium, calcium, strontium, vanadium, chromium in the trivalent state, molybdenum, tungsten, cadmium, mercury, aluminum, cobalt, and copper.

The metals to be specifically avoided are lead and the noble metals, as they are considered poisons in electroless plating solutions as well as other metals which may be considered contaminants in the solution.

The salts of sulfamic acid may be prepared by neutralization with a metal or ammonium hydroxide, as well as by direct reaction with an amine or a salt of the metal cation.

Although finding broad utility as a stabilizer for electroless plating solutions, sulfamic acid and its salts are of particular utility as stabilizers for alkaline electroless copper plating bath of a two-bath electroless plating system.

The two-bath system is most commonly based on a copper or nickel strike bath where an initial plate of metal is deposited, followed by immersion of the article in an alkaline electroless copper plating bath where a plate of copper is built up.

Formulations which are particularly useful as an alkaline copper based plating bath of a two-stage electroless plating system lie within the following ranges:

Alkali Hydroxide l1 14 Water to pH of Suffioient to make 1 liter The preferred concentration of sulfamic acid and/or its salts in the plating solution is from about 0.3 to 4.5 mols per liter.

' As the water soluble cupric salt there may be employed copper sulfate, cupric halides, cupric nitrates, cupric acetates, and other inorganic and organic cupric salts. Copper sulfate and cupric chloride are preferred.

As complexing agents for the cupric ion there may be employed Rochelle salts, the mono-, di-, tri-, and tetrasodium salts of ethylenediaminetetracetic acid; the ethanolamines, such as triethanolamine; nitrilotriacetic acid and its alkali metal salts; gluconic acid; gluconates; glucono- -y -lactone; N-hydroxyethylene ethylenediaminetriacetate; hydroxyalkyl substituted dialkylene triamines, such as pentahydroxypropyl diethylenetriamine; the salicilates; citrates; lactones, and other complexing agents well known in the art.

As reducing agents there may be employed formaldehyde and its precursors or derivatives such as paraformaldehyde; glyoxyl; borohydrides, such as alkali metal borohydrides and substituted alkali metal borohydrides and the like. Formaldehyde is particularly preferred.

There may also be employed buffering agents such as sodium bicarbonate.

It will be appreciated from the above formulations that, if sulfamic acid is added directly, it will, in substance, be converted to an ionized alkali metal salt as a consequence of the presence of the alkali hydroxide for pH control.

Plating solutions corresponding to the above formulations will inhibit against the plating of copper on a surface catalyzed with a noble metal, but will perm-it deposition onto a previously plated surface as produced in the strike bath hereinafter described.

The above plating solutions are capable of building an initial metal plate to a level sufficient to act as a buss for electroplating within 5 to 10 minutes at temperatures of about 105F. The solutions are, moreover, useful over a temperature range from about F to about 150F, preferably from about F to about F.

As indicated, when the sulfamic acid solutions of this invention are used as the plating bath of a two-stage operation, the resin articles to be plated are provided with an initial plate in a strike bath which is either free of inhibitors or only inhibited to an extent such that plating onto a surface catalyzed with a noble metal will not be precluded. The strike baths employed are generally those capable of depositing an initial coat of metal onto the surface of a noble metal catalyzed article within three minutes are room temperature.

The compositions used in the strikebath may be any of those conventionally employed for electroless deposition of plating metal on a nonconductive article. Any conventional electroless copper plating solution may, for instance, be used as a room temperature strike bath. Formulations for an electroless copper strike bath include, for example, the following compounds in aqueous solution within the ranges set forth below:

Ingredient Molar Concentration Soluble Cupric Salt 0.02 0.15 Complexing Agent 0.03 0.75 Reducing Agent 0.05 1.50 pH Adjustor sufficient to give pH (alkali hydroxide) from 12 to 14 The nature of the soluble cupric salts, complexing agents, and reducing agents which may be used are the same as those employed in the plating bath as set forth above.

Since only a thin film of copper is deposited in the strike bath, its volume can be small, as that the solution can be economically replenished or discarded as decomposition occurs. For this reason, the strike bath can be operated without any inhibitor or a small amount of inhibitor for which sulfamic acid and its salts may serve as all or part of the inhibitor system.

Similar solutions are employed when it is desired to deposit an initial nickel plate except that there is employed a soluble nickel salt.

For convenience, the detail of the use of the sulfamic stabilized plating solution of the present invention will be made with reference to electroless copper plating of acrylonitrile-butadiene-styrene, referred to below as ABS plastic with copper. The conditioning and activation of the plastic are described in general, as these steps are not, as such, a part of the invention.

A molded ABS plastic part is cleaned, pre-etched with an organic chemical solvent, if required, and then etched in an etching chemical bath such as a mixture of chromic and sulfuric acids. After cleaning of the etched article, including rinsing in an alkaline cleaner, the article is sensitized in a stannous chloridehydrochloric acid bath and then activated in a bath of a noble salt, such as palladium chloride, to provide a catalytic noble metal on the surface of the plastic. Following rinsing to remove excess palladium from the surface of the article, it is passed into the strike bath.

The strike bath can be any conventional electroless plating solution. For copper plating the preferred solutions have the following formulation:

ingredient Concentration Rochelle Salt 34 grams/liter Caustic Soda l2 grams/liter Copper Sulfate 7 grams/liter Sodium Carbonate 6 grams/liter Formaldehyde ccs./liter Water Sufficient to make 1 liter The strike" bath is typically maintained at room temperature. The plastic article with palladium metal on its surface is immersed in the strike bath for from about seconds to about 3 minutes and then re moved. This is a sufficient period of immersion to enable deposition of a thin copper film over the entire surface of the article. The strike bath, in addition to preparing the article for deposition in the electroless plating" bath, also serves as a collector for the bulk of the contaminants which otherwise would pass directly into the plating bath.

Upon removal from the strike bath, the plastic article having a thin copper deposit is passed directly into the sulfamic acid stabilized alkaline electroless copper plating bath.

The plastic article is retained in the alkaline electroless plating bath for a period of from 5 to 10, preferably 3 to 6 minutes. During this period of time, additional thicknesses of copper sufi'icient to permit subsequent electrolytic metallic plating are deposited. After removal from the electroless plating bath, the article is rinsed and soaked and, if electrolytic plating is required, is passed to the electroplating process.

While sulfamic acid and its salts are particularly useful as stabilizers for the above described two-step electroless plating processes, they are also useful as stabilizers for one-step electroless nickel plating processes and as the sole or as supplemental stabilizers for single-bath electroless copper plating processes.

When used as a stabilizer or inhibitor for single-bath electroless copper plating solutions, sulfamic acid and- /or its salts may be employed, depending on the plating potential of the bath, in an amount up to about 0.5 mol per liter. Plating potential of a bath is dependent, in general, on the concentration of reducing agent and alkali metal hydroxide. At a higher end of the concentrations set forth above, sulfamic acid may be added as a stabilizer without causing the bath to become a plating bath, that is, one incapable of depositing copper onto a noble metal catalyzed surface.

As plating potential goes down, however, at a constant concentration of sulfamic acid and/or its salts, the bath will, at some concentration of reducing agent and alkali metal hydroxide, become a plating bath.

The test to determine this is, however, simple, requiring only immersion of a noble metal catalyzed article into a formulated solution to determine if plating will occur onto its surface. If so, then the solution is functional as a strike bath or single-bath alkaline copper plating solution. If a deposit of copper does not occur, then the solution is functional as a plating bath for a two-bath plating system.

EXAMPLES l to 5 Several plating solutions were formulated containing varying amounts of copper sulfate and sulfamic acid as the stabilizer. As a control, there was formulated a solution without a stabilizer. The solutions are shown in Table I.

TABLE I Component (mols/liter) 1 2 3 4 5 Control Copper sulfate 0.036 0.036 O. 036 0. 036 0.036 0.036 Rochelle Salt. 0. 14 0. 14 0. 14 0. 14 0. 14 0. l4 Formaldehyde H 0 11 0. 027 0. 027 O. 1. 30 0. 11 Sodium bicarbonate 0. 11 0. 11 0. 11 0. 11 0. 11 Sulfamic acid 0. 51 0. 022 0. 037 2. 2 4. 35 Sodium hydroxide, total 0. 88 0.392 0. 407 2. 96 5. 39 0. 37 Free sodium hydroxide 0. 125 0. 125 0.125 0.51 0. 79 0. 125

In each instance, the balance of the solution was an amount of water sufficient to make one liter.

With respect to solutions 1 to 5 after immersing ABS resin articles having a noble metal catalyzed surfaces in the baths maintained at 105F for 15 minutes, no perceptible copper deposit was visible upon removal.

When articles which had been provided with an initial plate of copper in a strike bath were immersed, a film of copper sumcient to act as a buss for electrolytic plating was deposited within 5 to 10 minutes.

Samples of the solutions were then used as plating baths for 5 minutes and then allowed to stand for 12 hours. No perceptible decomposition was observed.

For the control, the solution was used as a plating bath for a catalyzed resin surface for 5 minutes at 105F and then allowed to stand. It decomposed with attendant precipitation of copper within 30 minutes.

Example 6 There was employed as a plating bath a solution of the following composition.

Component Amount Versene" 100' 40.0 cc. CuSO -5H,O 9.5 gr. Sodium Sulfamate 65.0 gr. Sodium Hydroxide 9.0 gr. Sodium Bicarbonate 9.3 gr. Formalin 9.0 cc. Free Sodium Hydroxide 5.0 gr. Water Sufficient to make 1 liter 1. An about 40% aqueous solution of the tetrasodium salt of ethylenediaminetetracetic acid manufactured by the Dow Chemical Corporation.

2. A salt prepared by neutralizing sulfamic acid with sodium hydroxide. 3. A 38% solution of formaldehyde in water.

While maintaining the bath at l05F, a molded ABS plaque suitably etched, sensitized by immersion in a stannous chloride-hydrochloric acid bath and activated in a palladium chloride bath, was immersed for 5 minutes. No deposition of copper onto the plaque occurred.

However, when a plaque an initial strike" coat of copper was immersed in the bath, there was continued an electroless deposit of copper onto the plaque.

EXAMPLE 7 In this example the electroless plating bath had the following composition:

Triethanolamine 10 cc. CuSO -5H O 9.5 gr. Sodium sulfamate 24.5 gr. Formalin 10.0 cc. Sodium Bicarbonate 6.0 gr. 50% Aqueous Caustic Soda l 1.0 cc. Water 1 Sufficient to make 1 liter With the bath maintained at a temperature of 1 F the plating procedure of Example 6 was repeated. Identical results were obtained.

EXAMPLE 8 In this example the stabilizer for the electroless plating bath was made by forming an aqueous solution of 5 grams of sulfamic acid and 3.5 cc. diethylenetriamine. The resultant aqueous solution of the diethylenetriamine-sulfamic acid salt had a pH of 7.5. The balance of the plating bath was as follows:

50% aqueous solution of NaOH 19.4 cc. Sodium bicarbonate 9.3 gr. Rochelle salt 40.0 gr. CuSO,-5H,O 9.5 gr. Formalin 10.0 cc. Water Sufficient to make 1 liter In preparing the bath the sodium hydroxide, sodium bicarbonate and Rochelle salt were dissolved in water and added to the solution of diethylenetriamine and sulfamic acid prior to the addition of the cupric sulfate, which was also dissolved in water, and Formalin to the resulting mixture. While maintaining the bath at a temperature of 100F the plating procedure described in Example 6 was repeated. The results were identical in that no plating occurred on the noble metal catalysed surface but plating occurred on plaque having an initial deposit of copper as provided by a strike bath.

EXAMPLE 9 The plating solution employed was identical to that described in Example 8 except that the stabilizer was a diethanolamine salt of sulfamic acid. The stabilizer was prepared by dissolving 10 grams of sulfamic acid and 1 1.5 cc. of diethanolamine in water. The resultant aqueous mixture of the salt has a pH of 7.5.

While maintaining the bath at ambient temperature the plating operation of Example 6 was repeated. Identical results were obtained.

EXAMPLE 10 A stabilizer for a plating solution was prepared by dissolving grams of sulfamic acid and 20.34 grams of barium carbonate in water and agiting the mixture until all signs of reaction ceased. To the barium sulfanate solution there was added the following ingredients.

Versene' 100 85 cc 50% aqueous solution of NaOH [0 cc Rochelle salt 40 gr. CuCl,-2H,O 6.48 gr. Formalin 10.0 cc Water sufficient to make 1 liter The resultant plating bath had a free sodium hydroxide content of 6.6 gr./l. While maintaining the bath at 105F, the plating procedure described in Example 6 was repeated. Identical results were obtained.

EXAMPLE 1 l Nickel sulfamate was prepared by dissolving 15.27 grams nickel carbonate and 25 grams sulfamic acid in water. The mixture was agitated until all signs of reaction ceased. The solution of nickel sulfamate was the stabilizer for a plating bath, the balance of which was formulated from the following components:

Versene" 100 115 cc 50% aqueous solution of NaOH 6.75 cc CuSOrSl-bO 9.5 gr. Formalin 10 cc water Sufficient to make 1 liter When the solution was employed at room temperature and plating procedure of Example 6 was repeated, identical results were obtained.

Example 12 To 20 grams of sulfamic acid dissolved in 100 cc water there was added 27.4 grams lead carbonate. The resulting mixture was stirred until all reaction ceased. 29.64 grams of zinc sulfate was then added to the mixture. After permitting the mixture to stand for 1 hour there was formed a precipitable of lead sulfate which was filtered from the solution. The filtrate consisting of an aqueous solution of zinc sulfamate and having a theoretical zinc sulfamate content of 26.75 grams was used as the stabilizer in a plating solution of the following additional constituents:

Versene I00 cc 50% aqueous solution of NaOH 19.4 cc Sodium bicarbonate 9.3

Rochelle salt 97.0 gr CuSO -5H,O 9.5 gr Fonnalin 10 cc Water Sufficent to make 1 liter The resultant bath had a free caustic content of 5 grams per liter. While maintaining the bath at F the plating procedure described in Example 6 was repeated. Identical results were obtained.

EXAMPLE 13 An aqueous alkaline copper solution containing 7.5 grams per liter CuSO '5l-1 O, 28 grams per liter Rochelle salt, 9.5 grams per liter sodium carbonate 12 grams per liter free sodium hydroxide, 10 grams per liter of the sodium salt of sulfamic acid and 26 cc per liter Formalin was prepared.

Two plaques molded from Cycoloc" EP-35l0,-a plating grade of ABS resin manufactured and sold by the Marbon Division of Borg-Warner Corporation were subjected to an etch in a chromic acid solution and then immersed in a catalyst solution containing colloidal palladium, known as Cuposit' 9-F and then into Cuposit'" Accelerator 19, both manufactured by the Shipley Company and disclosed in U.S. Pat. No. 3,011,290 to form an ABS substrate which would accept an electroless copper deposit.

Following activation the plaques were rinsed in deionized water to remove any residue of catalyst and accelerator solutions from the surface.

The plaques were immersed into the aqueous alkaline copper solution for 10 minutes. A uniform plate of copper was deposited. After plating both plaques, the bath was allowed to remain overnight with continual agitation. After that period of time no solution decomposition was observed.

EXAMPLE 14 There was prepared an electroless copper bath of the following composition:

CuSO -SI-I,O 9.5 gr. 50% aqueous solution of NaOI-I 26.0 cc Sodium bicarbonate 9.3 gr. Rochelle salt 39.0 gr. Sodium Sulfamate 36.8 gr. Formalin 20.0 cc Water Sufficient to make 1 liter EXAMPLE 15 There was prepared an aqueous electroless nickel strike solution of the following composition: NiCl -6H O 12 gr./l; citric acid 16 gr./l; ammonium hydroxide 15 cell; ammonium carbonate 25 gr/l; diethanolamine l cc./l; hydrated sodium hypophosphite 20 gr./l, the balance being water. Solution pH was 8.5.

A plaque catalyzed in the manner described in Example 13 was immersed in the bath which was maintained at a temperature of 105F for 1.5 minutes. There was deposited an initial electroless nickel plate. The plaque was removed from the bath, rinsed and immersed in a plating solution having the following composition: CuSO '5H,O 9.5 gr./l; sodium bicarbonate 9.4 gr./l; Rochelle Salt 39.0 gr./l; free sodium hydroxide 5.0 gr./1; formaldehyde (Formalin) 8 cc./ 1 and the sodium salt of sulfamic acid to provide sulfamic acid in an amount equivalent to 50 gr./l, the balance of the solution being water.

Immersion in the plating solution" was for minutes at a solution temperature of l05F.

A plate of copper deposited on the initial nickel plate.

EXAMPLE 16,

The procedure of Example 15 was repeated except there was used as the strike solution the solution described in' Example 13. Immersion was 2 minutes at ambient temperature. In addition the plaque was not rinsed after removal from the strike"bath. Following removal from the strike bath, the plaquewas immersed in the plating" solution described in Example l5. After 10 minutes a plate of copper sufficient to act as a bus for electrolytic plating was deposited.

What is claimed is: e

1. In an aqueous alkaline electroless copper plating solution capable of depositing a plate of copper onto a noble metal catalyzed surface and containing at least one water soluble cupric salt, at least one complexing agent for cupric ions, at least one reducing agent for cupric ions and a pH adjuster tomaintain the solution alkaline, the improvement comprising an inhibitor system to prevent spontaneous decomposition of said solution in the presence of at least catalytic noble metal ions said inhibitor system containing up to about 0.5 mole per liter of solution of a sulfamic acid compound selected from the group consisting of sulfamic acid, salts of sulfamic acid and mixtures thereof.

2. In an aqueous alkaline electroless copper plating solution comprising at least one water soluble cupric salt, at least one complexing agent for cupric ions, at least one reducing agent for cupric ions and a pH adjustor to maintain the solution at a pH of about 1 l to 14, the improvement comprising a sulfamic acid compound selected from the group consisting of sulfamic acid, salts of sulfamic acid and mixtures thereof said sulfamic acid compound being present in an amount from about 0.02 to about 4.5 moles per liter of solution and sufficient to prevent deposition of copper on an article having a catalytic noble metal surface but in sufficient to prevent deposition of copper onto an article having a thin coating of a deposited metal receptive to thedeposition of copper from said solution.

3. An aqueous alkaline electroless copper plating solution as claimed in claim 2 in which the sulfamic acid compound concentration is from about 0.3 to about 4.5 mols per liter of solution. 1

4. An aqueous alkaline electroless copper plating solution which will prevent copper deposition onto a noble metal catalyzed surface but will not prevent copper deposition onto a metal plate receptive to the deposition of copper from said solution, the solution comprising from about 0.2 to about 0.15 mols per liter of a water soluble ionic cupric salt; from a 0.03 to about 0.75 mols per liter of a complexing agent for cupric ions; from about 0.025 to 0.5 mols per liter of a reducing agent for cupric ions; an amount of an alkali metal hydroxide to maintain the solution at a pH of from about II to about 14.0 and from about 0.02 to about 4.5 mols per. liter of a sulfamic acid compound selected from the group consisting of sulfamic acid, salts of sulfamic acid and mixtures thereof.

5. An aqueous alkaline electroless plating solution as claimed in claim 4 in which the sulfamic acid commols per liter of solution.

UNITED STATES PATENT OFFICE CERTIFICATE OF CORRECTION Patent N0. 3.754.940 Dated Angst 28, 1973 Invent (s) LEON A. KADISON and EILEEN MAGUIRE It is certified that error appears in the above-identified patent and that said Letters Patent are hereby corrected as shown below:

Column Column Column Column Column Column Column Column Column (SEAL Attes EDWARD M. FLETCHER, JR Atte sting Officer line line , line line , line line 9, line line 28 "are" should read at 49, "as" should read so Q 51, "Formalin should read. Formalin l6 "tge" should read the l7, "suface" should read surface 10, line 27, "in suffi-" should read insuffi- Signed and sealed this 19th day of February 19714..

C. MARSHALL DANN Commissioner of Patents

Claims (4)

1. 2. In an aqueous alkaline electroless copper plating solution comprising at least one water soluble cupric salt, at least one complexing agent for cupric ions, at least one reducing agent for cupric ions and a pH adjustor to maintain the solution at a pH of about 11 to 14, the improvement comprising a sulfamic acid compound selected from the group consisting of sulfamic acid, salts of sulfamic acid and mixtures thereof said sulfamic acid compound being present in an amount from about 0.02 to about 4.5 moles per liter of solution and sufficient to prevent deposition of copper on an article having a catalytic noble metal surface but in sufficient to prevent deposition of copper onto an article having a thin coating of a deposited metal receptive to the deposition of copper from said solution.
2. 3. An aqueous alkaline electroless copper plating solution as claimed in claim 2 in which the sulfamic acid compound concentration is from about 0.3 to about 4.5 mols per liter of solution.
3. 4. An aqueous alkaline electroless copper plating solution which will prevent copper deposition onto a noble metal catalyzed surface but will not prevent copper deposition onto a metal plate receptive to the deposition of copper from said solution, the solution comprising from about 0.2 to about 0.15 mols per liter of a water soluble ionic cupric salt; from a 0.03 to about 0.75 mols per liter of a complexing agent for cupric ions; from about 0.025 to 0.5 mols per liter of a reducing agent for cupric ions; an amount of an alkali metal hydroxide to maintain the solution at a pH of from about 11 to about 14.0 and from about 0.02 to about 4.5 mols per liter of a sulfamic acid compound selected from the group consisting of sulfamic acid, salts of sulfamic acid and mixtures thereof.
4. 5. An aqueous alkaline electroless plating solution as claimed in claim 4 in which the sulfamic acid compound concentration is from about 0.3 to about 4.5 mols per liter of solution.