JPS6476766A - Superconducting field-effect transistor - Google Patents
Superconducting field-effect transistorInfo
- Publication number
- JPS6476766A JPS6476766A JP62234332A JP23433287A JPS6476766A JP S6476766 A JPS6476766 A JP S6476766A JP 62234332 A JP62234332 A JP 62234332A JP 23433287 A JP23433287 A JP 23433287A JP S6476766 A JPS6476766 A JP S6476766A
- Authority
- JP
- Japan
- Prior art keywords
- superconductor
- semiconductor
- film
- electrode
- temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
- H10N60/10—Junction-based devices
- H10N60/12—Josephson-effect devices
- H10N60/124—Josephson-effect devices comprising high-Tc ceramic materials
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Superconductor Devices And Manufacturing Methods Thereof (AREA)
Abstract
PURPOSE:To control the distance between superconductors, and realize high temperature operation, as the result of application of oxide superconductor of high critical temperature, even in the case where the environmental temperature rises and the exuding distance of the order parameter from the superconductor to a semiconductor becomes small, by applying two superconductor layers of a three-layer film to a source electrode and a drain electrode, and applying a electrode to a gate electrode. CONSTITUTION:A three-Iayer film composed of a superconductor 1, a semiconductor 2 and a superconductor 3 is formed on a superconductor wiring layer 7, and an insulating film 8 covering the three-layer film is formed by plasma CVD method or the like. A gate electrode 4 is formed on the side surface of the three-layer film, via the insulating film 8. A contact hole is made at a necessary part of the insulating film 8, and a drain electrode 5 and a source electrode 6 are formed. For superconducting material, oxide superconductor of LnBaCuO having critical temperature higher than or equal to liquid nitrogen temperature, or the like is selected, and for the semiconductor, Si is selected. The oxide superconductor can be formed by sputtering method or evaporation method. The semiconductor 2 is formed by sputtering method or evaporation method, and the film thickness (t) can be easily controlled to be several nm. As a result, operation under an environment at a temperature higher than or equal to the liquid nitrogen temperature is enabled.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62234332A JPS6476766A (en) | 1987-09-17 | 1987-09-17 | Superconducting field-effect transistor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62234332A JPS6476766A (en) | 1987-09-17 | 1987-09-17 | Superconducting field-effect transistor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6476766A true JPS6476766A (en) | 1989-03-22 |
Family
ID=16969343
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62234332A Pending JPS6476766A (en) | 1987-09-17 | 1987-09-17 | Superconducting field-effect transistor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6476766A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6479863B2 (en) * | 1999-03-24 | 2002-11-12 | John M. Caywood | Method and apparatus for injecting charge onto the floating gate of a nonvolatile memory cell |
-
1987
- 1987-09-17 JP JP62234332A patent/JPS6476766A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6479863B2 (en) * | 1999-03-24 | 2002-11-12 | John M. Caywood | Method and apparatus for injecting charge onto the floating gate of a nonvolatile memory cell |
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