JPS6476660A - Electron beam exposure equipment - Google Patents

Electron beam exposure equipment

Info

Publication number
JPS6476660A
JPS6476660A JP23322387A JP23322387A JPS6476660A JP S6476660 A JPS6476660 A JP S6476660A JP 23322387 A JP23322387 A JP 23322387A JP 23322387 A JP23322387 A JP 23322387A JP S6476660 A JPS6476660 A JP S6476660A
Authority
JP
Japan
Prior art keywords
data
pattern
processing
electron beam
speed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP23322387A
Other languages
Japanese (ja)
Other versions
JP2553102B2 (en
Inventor
Junichi Kai
Hiroshi Yasuda
Mamoru Yoneda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Miyachi Systems Co Ltd
Original Assignee
Fujitsu Ltd
Miyachi Systems Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd, Miyachi Systems Co Ltd filed Critical Fujitsu Ltd
Priority to JP62233223A priority Critical patent/JP2553102B2/en
Publication of JPS6476660A publication Critical patent/JPS6476660A/en
Application granted granted Critical
Publication of JP2553102B2 publication Critical patent/JP2553102B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PURPOSE:To eliminate the wasteful time such as the processing time of a control system and allow the high-speed processing by dividing a pattern in sequence asynchronously with blanking data and transferring the positioning data of an electron beam synchronized with the clock signal to a pattern correcting unit. CONSTITUTION:The positioning data of an electron beam, rectangular shot data, and blanking data required to a rectangular shot pattern from one pattern data inputted to a pattern dividing unit 14 asynchronously with the blanking signal of a deflection deflector system and a deflection control system are independently processes in advance and temporarily stored in a shot data storage memory 18, i.e., high-speed FiFo memory. The data are then read out and processed as appropriate in response to the processing speed of the deflection system synchronously with the clock signal generated by a clock generating unit 19. The wasteful time such as the processing time of the control system generated between patterns is eliminated to allow the high-speed processing.
JP62233223A 1987-09-17 1987-09-17 Electron beam exposure system Expired - Fee Related JP2553102B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62233223A JP2553102B2 (en) 1987-09-17 1987-09-17 Electron beam exposure system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62233223A JP2553102B2 (en) 1987-09-17 1987-09-17 Electron beam exposure system

Publications (2)

Publication Number Publication Date
JPS6476660A true JPS6476660A (en) 1989-03-22
JP2553102B2 JP2553102B2 (en) 1996-11-13

Family

ID=16951686

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62233223A Expired - Fee Related JP2553102B2 (en) 1987-09-17 1987-09-17 Electron beam exposure system

Country Status (1)

Country Link
JP (1) JP2553102B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9564293B2 (en) 2013-02-18 2017-02-07 Nuflare Technology, Inc. Charged particle beam writing apparatus, and buffer memory data storage method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9564293B2 (en) 2013-02-18 2017-02-07 Nuflare Technology, Inc. Charged particle beam writing apparatus, and buffer memory data storage method

Also Published As

Publication number Publication date
JP2553102B2 (en) 1996-11-13

Similar Documents

Publication Publication Date Title
JPS57109337A (en) Charged beam exposing device
JPS57208132A (en) Electron-beam exposure apparatus
JPS6476660A (en) Electron beam exposure equipment
JPS5577144A (en) Electron beam exposure method
GB2158672B (en) Image inputting and editing system
JPS522231A (en) Information processing apparatus
EP0099644A2 (en) Display apparatus employing stroke generators
JPS5527689A (en) Electro beam exposing method
JPS5599724A (en) Method of exposing electron beam
JPS5690383A (en) Print control system
JPS5743424A (en) Electron beam exposure system
JPS54823A (en) Display control system for ruled line pattern
JPS57162332A (en) Exposing method for electron beam
JPS5455382A (en) Electron beam exposure system
JPS643689A (en) Generator for character signal or the like
JPS6435483A (en) Character pattern generation system
GB1208754A (en) Typesetting system and character generating apparatus for use therein
JPS5713583A (en) Character recognition system
JPS52113683A (en) Electron beam stabilizing time control circuit
JPS54143071A (en) Electron-beam exposure system
JPS6448175A (en) Address control method for picture memory
JPS5453834A (en) Character pattern generator
JPS522381A (en) Electronics beam deflection scanning method
JPS6432393A (en) Rendering processor
JPS55112686A (en) Overlapped pattern data generating system

Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees