JPS6476660A - Electron beam exposure equipment - Google Patents
Electron beam exposure equipmentInfo
- Publication number
- JPS6476660A JPS6476660A JP23322387A JP23322387A JPS6476660A JP S6476660 A JPS6476660 A JP S6476660A JP 23322387 A JP23322387 A JP 23322387A JP 23322387 A JP23322387 A JP 23322387A JP S6476660 A JPS6476660 A JP S6476660A
- Authority
- JP
- Japan
- Prior art keywords
- data
- pattern
- processing
- electron beam
- speed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE:To eliminate the wasteful time such as the processing time of a control system and allow the high-speed processing by dividing a pattern in sequence asynchronously with blanking data and transferring the positioning data of an electron beam synchronized with the clock signal to a pattern correcting unit. CONSTITUTION:The positioning data of an electron beam, rectangular shot data, and blanking data required to a rectangular shot pattern from one pattern data inputted to a pattern dividing unit 14 asynchronously with the blanking signal of a deflection deflector system and a deflection control system are independently processes in advance and temporarily stored in a shot data storage memory 18, i.e., high-speed FiFo memory. The data are then read out and processed as appropriate in response to the processing speed of the deflection system synchronously with the clock signal generated by a clock generating unit 19. The wasteful time such as the processing time of the control system generated between patterns is eliminated to allow the high-speed processing.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62233223A JP2553102B2 (en) | 1987-09-17 | 1987-09-17 | Electron beam exposure system |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62233223A JP2553102B2 (en) | 1987-09-17 | 1987-09-17 | Electron beam exposure system |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6476660A true JPS6476660A (en) | 1989-03-22 |
JP2553102B2 JP2553102B2 (en) | 1996-11-13 |
Family
ID=16951686
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62233223A Expired - Fee Related JP2553102B2 (en) | 1987-09-17 | 1987-09-17 | Electron beam exposure system |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2553102B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9564293B2 (en) | 2013-02-18 | 2017-02-07 | Nuflare Technology, Inc. | Charged particle beam writing apparatus, and buffer memory data storage method |
-
1987
- 1987-09-17 JP JP62233223A patent/JP2553102B2/en not_active Expired - Fee Related
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9564293B2 (en) | 2013-02-18 | 2017-02-07 | Nuflare Technology, Inc. | Charged particle beam writing apparatus, and buffer memory data storage method |
Also Published As
Publication number | Publication date |
---|---|
JP2553102B2 (en) | 1996-11-13 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |