JPS6473716A - Plasma device - Google Patents
Plasma deviceInfo
- Publication number
- JPS6473716A JPS6473716A JP62231343A JP23134387A JPS6473716A JP S6473716 A JPS6473716 A JP S6473716A JP 62231343 A JP62231343 A JP 62231343A JP 23134387 A JP23134387 A JP 23134387A JP S6473716 A JPS6473716 A JP S6473716A
- Authority
- JP
- Japan
- Prior art keywords
- specimen
- producer
- plasma
- chamber
- magnetism
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Drying Of Semiconductors (AREA)
Abstract
PURPOSE:To simplify the composition of a plasma producer by eliminating a power supply in a magnetism producer by a method wherein the magnetism producer comprising a permanent magnet and a normally magnetic body is arranged on the side of a plasma leading-out window opposite to a specimen loaded on a specimen base controlling the distribution of plasma led out into a specimen chamber. CONSTITUTION:A microwave leading-in port 1c closed with a quartz glass sheet is provided on the central part of the upper wall in a plasma producing chamber 1 of a plasma producer and then a plasma leading-out window 1d is provided on the position of lower wall corresponding to the central leading-in port 1c while a specimen chamber 3 is arranged facing on the window 1d. Besides, an existing coil 4 is arranged extending over the producing chamber 1 and an end part of a waveguide 2 connected to the chamber 1. Furthermore, a specimen base 5 is arranged on the position corresponding to the window 1d in the specimen chamber 3 while a magnetism producer 6 is arranged on the side opposite to the side of the specimen base 5 loaded with a specimen S. This magnetism producer 6 is composed of a central bar yoke 6a, a circular yoke 6b made of normally magnetic body arranged concentrically around the bar yoke 6a and a bar permanent magnet 6c to eliminate a power supply.
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62231343A JPH06101443B2 (en) | 1987-09-16 | 1987-09-16 | Plasma equipment |
EP87311451A EP0273741B1 (en) | 1986-12-29 | 1987-12-24 | Plasma apparatus |
DE8787311451T DE3774098D1 (en) | 1986-12-29 | 1987-12-24 | PLASMA UNIT. |
KR1019870015216A KR920004912B1 (en) | 1986-12-29 | 1987-12-29 | Plasma apparatus |
US07/364,585 US5019117A (en) | 1986-12-29 | 1989-06-12 | Plasma apparatus |
US07/414,511 US5016564A (en) | 1986-12-29 | 1989-09-29 | Plasma apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62231343A JPH06101443B2 (en) | 1987-09-16 | 1987-09-16 | Plasma equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6473716A true JPS6473716A (en) | 1989-03-20 |
JPH06101443B2 JPH06101443B2 (en) | 1994-12-12 |
Family
ID=16922145
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62231343A Expired - Fee Related JPH06101443B2 (en) | 1986-12-29 | 1987-09-16 | Plasma equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH06101443B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013541817A (en) * | 2010-10-07 | 2013-11-14 | ザ・サイエンス・アンド・テクノロジー・ファシリティーズ・カウンシル | Improved multipole magnet |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5947733A (en) * | 1982-09-13 | 1984-03-17 | Hitachi Ltd | Plasma processing apparatus |
JPS61267324A (en) * | 1985-05-21 | 1986-11-26 | Fuji Electric Co Ltd | Dry thin film processing device |
-
1987
- 1987-09-16 JP JP62231343A patent/JPH06101443B2/en not_active Expired - Fee Related
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5947733A (en) * | 1982-09-13 | 1984-03-17 | Hitachi Ltd | Plasma processing apparatus |
JPS61267324A (en) * | 1985-05-21 | 1986-11-26 | Fuji Electric Co Ltd | Dry thin film processing device |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013541817A (en) * | 2010-10-07 | 2013-11-14 | ザ・サイエンス・アンド・テクノロジー・ファシリティーズ・カウンシル | Improved multipole magnet |
Also Published As
Publication number | Publication date |
---|---|
JPH06101443B2 (en) | 1994-12-12 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |