JPS6472988A - Liquid phase growing method - Google Patents

Liquid phase growing method

Info

Publication number
JPS6472988A
JPS6472988A JP62228272A JP22827287A JPS6472988A JP S6472988 A JPS6472988 A JP S6472988A JP 62228272 A JP62228272 A JP 62228272A JP 22827287 A JP22827287 A JP 22827287A JP S6472988 A JPS6472988 A JP S6472988A
Authority
JP
Japan
Prior art keywords
substrate
soln
held
substrates
single crystal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62228272A
Other languages
Japanese (ja)
Inventor
Yasuaki Masuko
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
New Japan Radio Co Ltd
Original Assignee
New Japan Radio Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by New Japan Radio Co Ltd filed Critical New Japan Radio Co Ltd
Priority to JP62228272A priority Critical patent/JPS6472988A/en
Publication of JPS6472988A publication Critical patent/JPS6472988A/en
Pending legal-status Critical Current

Links

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)

Abstract

PURPOSE:To obtain single crystal which is capable of mass production and excellent in uniformity of film thickness and deposition efficiency by growing single crystal of a semiconductor on one sheet of substrate which is rotated in the face of the substrate in a soln. or on a plurality of sheets of substrates which are similarly rotated and parallel held. CONSTITUTION:After a required soln. 3 is introduced into a graphite vessel 31, one sheet of substrate 5 held with a substrate holder 34a or a plurality of sheets of substrates 5 which are held with a substrate holder 34b and parallel held are immersed in the soln. 3. While rotating the substrate holders 34a, 34b by keeping a central supporting rod as an axis so that the substrate 5 is rotated in the face of the substrate 5, the soln. 3 is slowly cooled and single crystal of a semiconductor is grown on the substrates 5.
JP62228272A 1987-09-14 1987-09-14 Liquid phase growing method Pending JPS6472988A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62228272A JPS6472988A (en) 1987-09-14 1987-09-14 Liquid phase growing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62228272A JPS6472988A (en) 1987-09-14 1987-09-14 Liquid phase growing method

Publications (1)

Publication Number Publication Date
JPS6472988A true JPS6472988A (en) 1989-03-17

Family

ID=16873875

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62228272A Pending JPS6472988A (en) 1987-09-14 1987-09-14 Liquid phase growing method

Country Status (1)

Country Link
JP (1) JPS6472988A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6551908B2 (en) 2000-10-02 2003-04-22 Canon Kabushiki Kaisha Method for producing semiconductor thin films on moving substrates

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6551908B2 (en) 2000-10-02 2003-04-22 Canon Kabushiki Kaisha Method for producing semiconductor thin films on moving substrates
US6951584B2 (en) 2000-10-02 2005-10-04 Canon Kabushiki Kaisha Apparatus for producing semiconductor thin films on moving substrates

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