JPS6471003A - Transparent conductive film - Google Patents
Transparent conductive filmInfo
- Publication number
- JPS6471003A JPS6471003A JP62227144A JP22714487A JPS6471003A JP S6471003 A JPS6471003 A JP S6471003A JP 62227144 A JP62227144 A JP 62227144A JP 22714487 A JP22714487 A JP 22714487A JP S6471003 A JPS6471003 A JP S6471003A
- Authority
- JP
- Japan
- Prior art keywords
- preferable
- semiconductor
- solvent
- conductive layer
- mesh structure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Laminated Bodies (AREA)
- Non-Insulated Conductors (AREA)
Abstract
PURPOSE:To improve transparence and the adhesion of a conductive layer by forming an undercoating layer of the three-dimensional mesh structure on a holding body, over which forming a conductive layer by spreading a solution including a semiconductor compound. CONSTITUTION:As a holding body, a body of a polyester or a polyolefine is used. The three-dimensional mesh structure which forms an undercoating layer on such a holding body is preferable to form the mesh structure after spreading. For this purpose, a bridging agent consisting of isocyanate radical is suitable as the bringing component. The degree of swelling of the undercoating to the used solvent T1/T0 (T0 is the film thickness before soaking and T1 is the film thickness after 5 minutes when the semiconductor compound is soaked in the solvent) is preferable to be in the range 1.05 to 2.5 when T0 is about 10mu. The semiconductor used for the conductive layer is preferable to be cuprous iodide and silver iodide, and a semiconductor including some other metal can be also used. As the solvent for cuprous iodide, acetonitrile is available because cuprous iodide and acetonitrile make a complex salt. The density of the semiconductor is preferable to be 0.1 to 50wt.%.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62227144A JPS6471003A (en) | 1987-09-10 | 1987-09-10 | Transparent conductive film |
US07/675,069 US5075171A (en) | 1987-09-10 | 1991-03-26 | Conductive film and method for preparing same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62227144A JPS6471003A (en) | 1987-09-10 | 1987-09-10 | Transparent conductive film |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6471003A true JPS6471003A (en) | 1989-03-16 |
Family
ID=16856178
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62227144A Pending JPS6471003A (en) | 1987-09-10 | 1987-09-10 | Transparent conductive film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6471003A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02309510A (en) * | 1989-05-23 | 1990-12-25 | Fuji Photo Film Co Ltd | Forming method for transparent conductive film laminate and transparent conductive pattern |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54113897A (en) * | 1978-02-24 | 1979-09-05 | Inoue Japax Res | Elastic conductor |
JPS59132507A (en) * | 1983-01-20 | 1984-07-30 | 旭化成株式会社 | Conductive highly molecular material and method of producingsame |
JPS60131238A (en) * | 1983-12-20 | 1985-07-12 | 東レ株式会社 | Transparent conductive film |
JPS60140605A (en) * | 1983-12-28 | 1985-07-25 | 松下電器産業株式会社 | Transparent conductive film |
JPS60203432A (en) * | 1984-03-29 | 1985-10-15 | 住友ベークライト株式会社 | Manufacture of transparent conductive film |
-
1987
- 1987-09-10 JP JP62227144A patent/JPS6471003A/en active Pending
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54113897A (en) * | 1978-02-24 | 1979-09-05 | Inoue Japax Res | Elastic conductor |
JPS59132507A (en) * | 1983-01-20 | 1984-07-30 | 旭化成株式会社 | Conductive highly molecular material and method of producingsame |
JPS60131238A (en) * | 1983-12-20 | 1985-07-12 | 東レ株式会社 | Transparent conductive film |
JPS60140605A (en) * | 1983-12-28 | 1985-07-25 | 松下電器産業株式会社 | Transparent conductive film |
JPS60203432A (en) * | 1984-03-29 | 1985-10-15 | 住友ベークライト株式会社 | Manufacture of transparent conductive film |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02309510A (en) * | 1989-05-23 | 1990-12-25 | Fuji Photo Film Co Ltd | Forming method for transparent conductive film laminate and transparent conductive pattern |
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