JPS6469078A - Gas laser equipment - Google Patents

Gas laser equipment

Info

Publication number
JPS6469078A
JPS6469078A JP62225219A JP22521987A JPS6469078A JP S6469078 A JPS6469078 A JP S6469078A JP 62225219 A JP62225219 A JP 62225219A JP 22521987 A JP22521987 A JP 22521987A JP S6469078 A JPS6469078 A JP S6469078A
Authority
JP
Japan
Prior art keywords
microwave
conductor wall
dielectric
discharge
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62225219A
Other languages
Japanese (ja)
Other versions
JP2566586B2 (en
Inventor
Junichi Nishimae
Kenji Yoshizawa
Masakazu Taki
Tadashi Yanagi
Yoshihiro Ueda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP22521987A priority Critical patent/JP2566586B2/en
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to EP95108095A priority patent/EP0674471B1/en
Priority to DE3856348T priority patent/DE3856348T2/en
Priority to EP88101007A priority patent/EP0280044B1/en
Priority to DE3855896T priority patent/DE3855896T2/en
Priority to US07/147,726 priority patent/US4890294A/en
Priority to KR1019880000551A priority patent/KR910002239B1/en
Publication of JPS6469078A publication Critical patent/JPS6469078A/en
Application granted granted Critical
Publication of JP2566586B2 publication Critical patent/JP2566586B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32321—Discharge generated by other radiation
    • H01J37/32339—Discharge generated by other radiation using electromagnetic radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/0315—Waveguide lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0975—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser using inductive or capacitive excitation
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Electromagnetism (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Lasers (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Spectroscopy & Molecular Physics (AREA)

Abstract

PURPOSE:To generate stable and spatially uniform plasma, and enable large output laser operation with high efficiency, by arranging a conductor wall with conductivity higher than plasma, which faces dielectric being a microwave incident window, and metal-sealing the dielectric and a part of microwave circuit wherein the conductor wall is formed, by soldering and the like. CONSTITUTION:By intense microwave electromagnetic field being generated so as to concentrate in the vicinity of ridges 21, 22, laser gas sealed in a dis charge space 25 is subjected to discharge breakdown, plasma is generated, and laser medium is excited. The discharge space 25 is formed between the conductor wall 23 and the dielectric 24 which is arranged so as to face the conductor wall 23 and serves as an incident window of microwave. In this discharge space 25, microwave discharge is generated, and microwave enters only from the one side surface of plasma, thereby, enabling the discharge by a desired microwave mode. A contacting part between the dielectric 24 and the upper surface of a ridge 21 where the conductor wall 23 is formed, is subjected to metallizing process, and this part and the contacting part are fusion- welded with solder material 26.
JP22521987A 1987-01-26 1987-09-10 Gas laser device Expired - Lifetime JP2566586B2 (en)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP22521987A JP2566586B2 (en) 1987-09-10 1987-09-10 Gas laser device
DE3856348T DE3856348T2 (en) 1987-01-26 1988-01-23 Laser plasma device
EP88101007A EP0280044B1 (en) 1987-01-26 1988-01-23 Plasma apparatus
DE3855896T DE3855896T2 (en) 1987-01-26 1988-01-23 Plasma device
EP95108095A EP0674471B1 (en) 1987-01-26 1988-01-23 Laser Plasma apparatus
US07/147,726 US4890294A (en) 1987-01-26 1988-01-25 Plasma apparatus
KR1019880000551A KR910002239B1 (en) 1987-01-26 1988-01-25 Laser system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22521987A JP2566586B2 (en) 1987-09-10 1987-09-10 Gas laser device

Publications (2)

Publication Number Publication Date
JPS6469078A true JPS6469078A (en) 1989-03-15
JP2566586B2 JP2566586B2 (en) 1996-12-25

Family

ID=16825853

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22521987A Expired - Lifetime JP2566586B2 (en) 1987-01-26 1987-09-10 Gas laser device

Country Status (1)

Country Link
JP (1) JP2566586B2 (en)

Also Published As

Publication number Publication date
JP2566586B2 (en) 1996-12-25

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