JPS6469075A - Gas laser equipment - Google Patents
Gas laser equipmentInfo
- Publication number
- JPS6469075A JPS6469075A JP22521687A JP22521687A JPS6469075A JP S6469075 A JPS6469075 A JP S6469075A JP 22521687 A JP22521687 A JP 22521687A JP 22521687 A JP22521687 A JP 22521687A JP S6469075 A JPS6469075 A JP S6469075A
- Authority
- JP
- Japan
- Prior art keywords
- microwave
- laser
- discharge
- plasma
- turning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
- H01S3/0975—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser using inductive or capacitive excitation
Abstract
PURPOSE:To generate spatially uniform plasma, and enable large output laser oscillation with small-sized equipment, by arranging a conductor wall with conductivity higher than plasma, which wall faces dielectric being a microwave incident window, and turning back a laser optical path with a turning-back mirror arranged at an end-portion of a space. CONSTITUTION:By intense microwave electromagnetic field being generated so as to concentrate in the vicinity of ridges 21, 22, laser gas such as carbon dioxide gas laser gas sealed in a discharge space 26 is subjected to discharge breakdown, plasma is generated, and laser medium is excited. Between a totally reflecting mirror 27 and a partially transmitting mirror 28, an optical path is turned back by a turning-back mirror 29, and thereby obtaining laser oscillating light. The discharge space 26 is formed between the conductor wall 24 and the dielectric 25 which is arranged so as to face the conductor wall 24 and serves as an incidence window of microwave. In this discharge space 26, microwave discharge is generated, and the microwave enters only from the one side surface of plasma 31, thereby, enabling the discharge by a desired microwave mode.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22521687A JPS6469075A (en) | 1987-09-10 | 1987-09-10 | Gas laser equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22521687A JPS6469075A (en) | 1987-09-10 | 1987-09-10 | Gas laser equipment |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6469075A true JPS6469075A (en) | 1989-03-15 |
Family
ID=16825805
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP22521687A Pending JPS6469075A (en) | 1987-09-10 | 1987-09-10 | Gas laser equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6469075A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8622427B2 (en) | 2010-11-12 | 2014-01-07 | Nsk Ltd. | Steering column support apparatus |
-
1987
- 1987-09-10 JP JP22521687A patent/JPS6469075A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8622427B2 (en) | 2010-11-12 | 2014-01-07 | Nsk Ltd. | Steering column support apparatus |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US5216689A (en) | Slab laser with enhanced lifetime | |
Christensen et al. | High efficiency microwave discharge XeCl laser | |
US3363196A (en) | Gaseous laser device | |
Yasui et al. | Silent-discharge excited TEM/sub 00/2.5 kW CO/sub 2/laser | |
US4651325A (en) | RF-pumped infrared laser using transverse gas flow | |
US4177435A (en) | Optically pumped laser | |
JPS6469075A (en) | Gas laser equipment | |
JPS6469071A (en) | Gas laser equipment | |
US4050034A (en) | In cavity pumping for infrared laser | |
US3860884A (en) | Optically pumped laser using N{HD 2{B O or similar gas mixed with energy-transferring CO{HD 2{B | |
JPH033380A (en) | Gas laser device | |
US3537030A (en) | Gas laser device with means for indicating optimum discharge conditions | |
CA1038070A (en) | Pulsed multiline co2 laser oscillator apparatus and method | |
JPS56131986A (en) | Gas laser device | |
JPS6469069A (en) | Gas laser equipment | |
JPS6469077A (en) | Gas laser equipment | |
Pozwolski | Compression of the wave power density by means of a time-varying medium | |
JPS6469070A (en) | Optical waveguide type gas laser equipment | |
JPS6469067A (en) | Carbon dioxide gas laser equipment | |
JPS6469076A (en) | Gas laser equipment | |
JPS6469073A (en) | Gas laser equipment | |
JPH07105537B2 (en) | Plasma equipment | |
US3562663A (en) | Mode and "q" switch mechanism for gaseous lasers | |
JPS6469083A (en) | Gas laser equipment | |
JPH07105539B2 (en) | Gas laser device |