JPS6469083A - Gas laser equipment - Google Patents

Gas laser equipment

Info

Publication number
JPS6469083A
JPS6469083A JP62225224A JP22522487A JPS6469083A JP S6469083 A JPS6469083 A JP S6469083A JP 62225224 A JP62225224 A JP 62225224A JP 22522487 A JP22522487 A JP 22522487A JP S6469083 A JPS6469083 A JP S6469083A
Authority
JP
Japan
Prior art keywords
microwave
laser
laser head
plasma
generated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62225224A
Other languages
Japanese (ja)
Other versions
JPH07105536B2 (en
Inventor
Junichi Nishimae
Kenji Yoshizawa
Masakazu Taki
Tadashi Yanagi
Yoshihiro Ueda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP22522487A priority Critical patent/JPH07105536B2/en
Priority to DE3856348T priority patent/DE3856348T2/en
Priority to DE3855896T priority patent/DE3855896T2/en
Priority to EP88101007A priority patent/EP0280044B1/en
Priority to EP95108095A priority patent/EP0674471B1/en
Priority to KR1019880000551A priority patent/KR910002239B1/en
Publication of JPS6469083A publication Critical patent/JPS6469083A/en
Publication of JPH07105536B2 publication Critical patent/JPH07105536B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32321—Discharge generated by other radiation
    • H01J37/32339—Discharge generated by other radiation using electromagnetic radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/0315—Waveguide lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0975—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser using inductive or capacitive excitation
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

Abstract

PURPOSE:To make microwave discharge plasma stable and spatially uniform, by sealing laser gas in a discharge space between a conductor wall formed in a part of a microwave circuit and dielectric facing said wall, forming a microwave mode having an electric component vertical to the boundary between the dielectric and plasma, and arranging the microwave circuit and a microwave transmission line in parallel along the direction of laser optical axis. CONSTITUTION:Microwave generated by a magnetron 3 travels a waveguide 4, and is coupled with a laser head 2 by a microwave coupling window 6. The laser head 2 and the waveguide 4 are arranged in parallel along the direction of the laser optical axis. Microwave is supplied via the microwave coupling window 6 of continuous length arranged in the longitudinal direction of the laser head part 2. As a result, intense microwave electromagnetic field can be uniformly generated on the whole part of the ridges 21, 22 of the laser head part 2. By this intense microwave electromagnetic field, laser gas sealed in a discharge space 26 is subjected to discharge breakdown. Thus, plasma is generated, and laser medium is excited.
JP22522487A 1987-01-26 1987-09-10 Gas laser device Expired - Lifetime JPH07105536B2 (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP22522487A JPH07105536B2 (en) 1987-09-10 1987-09-10 Gas laser device
DE3856348T DE3856348T2 (en) 1987-01-26 1988-01-23 Laser plasma device
DE3855896T DE3855896T2 (en) 1987-01-26 1988-01-23 Plasma device
EP88101007A EP0280044B1 (en) 1987-01-26 1988-01-23 Plasma apparatus
EP95108095A EP0674471B1 (en) 1987-01-26 1988-01-23 Laser Plasma apparatus
KR1019880000551A KR910002239B1 (en) 1987-01-26 1988-01-25 Laser system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22522487A JPH07105536B2 (en) 1987-09-10 1987-09-10 Gas laser device

Publications (2)

Publication Number Publication Date
JPS6469083A true JPS6469083A (en) 1989-03-15
JPH07105536B2 JPH07105536B2 (en) 1995-11-13

Family

ID=16825932

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22522487A Expired - Lifetime JPH07105536B2 (en) 1987-01-26 1987-09-10 Gas laser device

Country Status (1)

Country Link
JP (1) JPH07105536B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03209785A (en) * 1989-11-10 1991-09-12 Deutsche Forsch & Vers Luft Raumfahrt Ev Waveguide tube laser by microwave excitation
US5392309A (en) * 1992-10-21 1995-02-21 Mitsubishi Denki Kabushiki Kaisha Laser apparatus includes an unstable resonator and a shading means
US6940031B2 (en) 2003-03-24 2005-09-06 Matsushita Electric Industrial Co., Ltd. Switching device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03209785A (en) * 1989-11-10 1991-09-12 Deutsche Forsch & Vers Luft Raumfahrt Ev Waveguide tube laser by microwave excitation
US5392309A (en) * 1992-10-21 1995-02-21 Mitsubishi Denki Kabushiki Kaisha Laser apparatus includes an unstable resonator and a shading means
US6940031B2 (en) 2003-03-24 2005-09-06 Matsushita Electric Industrial Co., Ltd. Switching device

Also Published As

Publication number Publication date
JPH07105536B2 (en) 1995-11-13

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