JPS6467854A - Ion beam generator - Google Patents

Ion beam generator

Info

Publication number
JPS6467854A
JPS6467854A JP22387687A JP22387687A JPS6467854A JP S6467854 A JPS6467854 A JP S6467854A JP 22387687 A JP22387687 A JP 22387687A JP 22387687 A JP22387687 A JP 22387687A JP S6467854 A JPS6467854 A JP S6467854A
Authority
JP
Japan
Prior art keywords
plasma
ion beam
diverged
neutralized
proceed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP22387687A
Other languages
Japanese (ja)
Inventor
Kiyoshi Hashimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP22387687A priority Critical patent/JPS6467854A/en
Publication of JPS6467854A publication Critical patent/JPS6467854A/en
Pending legal-status Critical Current

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  • Electron Sources, Ion Sources (AREA)

Abstract

PURPOSE:To allow a beam to proceed without being diverged by its own space charges by providing a plasma generator and guiding the plasma near the ion beam travel path with a magnetic field device. CONSTITUTION:Plasma of oxygen, for example, is generated in an ion generating chamber 1 by a high-frequency discharge, 0<-> is extracted by the electric field and neutralized and fed into a target chamber 11. The plasma to be fed to a beam is generated in a high-frequency discharge container 14 and guided near a beam travel path by the magnetic field formed by a guiding coil. The ion beam is enveloped by plasma, and charges of negative ions are neutralized by positive ions or plasma. The beam can thereby proceed without being diverged by its own space charges.
JP22387687A 1987-09-09 1987-09-09 Ion beam generator Pending JPS6467854A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22387687A JPS6467854A (en) 1987-09-09 1987-09-09 Ion beam generator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22387687A JPS6467854A (en) 1987-09-09 1987-09-09 Ion beam generator

Publications (1)

Publication Number Publication Date
JPS6467854A true JPS6467854A (en) 1989-03-14

Family

ID=16805094

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22387687A Pending JPS6467854A (en) 1987-09-09 1987-09-09 Ion beam generator

Country Status (1)

Country Link
JP (1) JPS6467854A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021533572A (en) * 2018-08-06 2021-12-02 マトソン テクノロジー インコーポレイテッドMattson Technology, Inc. Systems and methods for processing workpieces using a neutral atom beam

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021533572A (en) * 2018-08-06 2021-12-02 マトソン テクノロジー インコーポレイテッドMattson Technology, Inc. Systems and methods for processing workpieces using a neutral atom beam
JP2022166171A (en) * 2018-08-06 2022-11-01 マトソン テクノロジー インコーポレイテッド System and method for workpiece processing using neutral atomic beam

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