JPS6417361A - High energy large current particle source - Google Patents

High energy large current particle source

Info

Publication number
JPS6417361A
JPS6417361A JP62170957A JP17095787A JPS6417361A JP S6417361 A JPS6417361 A JP S6417361A JP 62170957 A JP62170957 A JP 62170957A JP 17095787 A JP17095787 A JP 17095787A JP S6417361 A JPS6417361 A JP S6417361A
Authority
JP
Japan
Prior art keywords
high energy
large current
electrode
less
hole
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62170957A
Other languages
Japanese (ja)
Inventor
Yoshio Watanabe
Isao Ochiai
Piitaa Sutoomuberugu Hansu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Koninklijke Philips NV
Original Assignee
Hitachi Ltd
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd, Philips Gloeilampenfabrieken NV filed Critical Hitachi Ltd
Priority to JP62170957A priority Critical patent/JPS6417361A/en
Priority to EP88201449A priority patent/EP0298577A3/en
Priority to US07/216,938 priority patent/US4987345A/en
Priority to KR1019880008562A priority patent/KR890002951A/en
Publication of JPS6417361A publication Critical patent/JPS6417361A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/022—Details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/52—Generating plasma using exploding wires or spark gaps

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Particle Accelerators (AREA)

Abstract

PURPOSE: To provide a particle source with high energy and a large current which has a high peak value, favorable for generating polyvalent ions by specifying gas to be enclosed between a first and second electrodes arranged symmetric coaxially but asymmetrically in the axial direction. CONSTITUTION: Discharge tube electrodes 1, 2 are formed symmetrically coaxially but asymmetrically in the axial direction. One electrode 1 either has no hole or if made a 10mm or less diameter hole, at the center, and the other electrode 2 has a 40mm or more diameter hole at the center. The polarity of the electrode 1 with no hole is negative, when an electron beam is obtained and positive, when an ion beam is obtained. Element with an atomic number larger than boron is used for gas to be enclosed at a pressure of 2Torr or less. A discharge current is 100kA or more, and a time required to reach 100kA is 1μS or less. An electric field lens 7 or a magnetic field lens is combined therewith to envelop shrinkage plasma as a whole. In this way, electron flux or multivalent ion flux with high energy and a large current is obtained highly efficiently for easier accelerating than the univalent ions.
JP62170957A 1987-07-10 1987-07-10 High energy large current particle source Pending JPS6417361A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP62170957A JPS6417361A (en) 1987-07-10 1987-07-10 High energy large current particle source
EP88201449A EP0298577A3 (en) 1987-07-10 1988-07-08 Charged particle source of large current with high energy
US07/216,938 US4987345A (en) 1987-07-10 1988-07-08 Charged particle source of large current with high energy
KR1019880008562A KR890002951A (en) 1987-07-10 1988-07-09 High current charged particle source with high energy

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62170957A JPS6417361A (en) 1987-07-10 1987-07-10 High energy large current particle source

Publications (1)

Publication Number Publication Date
JPS6417361A true JPS6417361A (en) 1989-01-20

Family

ID=15914514

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62170957A Pending JPS6417361A (en) 1987-07-10 1987-07-10 High energy large current particle source

Country Status (4)

Country Link
US (1) US4987345A (en)
EP (1) EP0298577A3 (en)
JP (1) JPS6417361A (en)
KR (1) KR890002951A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62161329A (en) * 1986-11-10 1987-07-17 株式会社東芝 Coffee maker
JPS62161330A (en) * 1986-11-10 1987-07-17 株式会社東芝 Coffee maker
KR100319001B1 (en) * 1999-03-15 2002-01-04 아킨스 로버트 피. Plasma focus high energy photon source
KR100358447B1 (en) * 1999-03-15 2002-10-25 사이머 인코포레이티드 Plasma focus high energy photon source with blast shield

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5059859A (en) * 1989-04-14 1991-10-22 Hitachi, Ltd. Charged particle beam generating apparatus of multi-stage acceleration type
JPH0817171B2 (en) * 1990-12-31 1996-02-21 株式会社半導体エネルギー研究所 Plasma generator and etching method using the same
JP2657850B2 (en) * 1990-10-23 1997-09-30 株式会社半導体エネルギー研究所 Plasma generator and etching method using the same
US5311016A (en) * 1992-08-21 1994-05-10 The United States Of America As Represented By The United State Department Of Energy Apparatus for preparing a sample for mass spectrometry
US8253057B1 (en) * 2004-09-03 2012-08-28 Jack Hunt System and method for plasma generation
JP4946256B2 (en) * 2006-08-11 2012-06-06 日新イオン機器株式会社 Electric field lens and ion implantation apparatus including the same

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3329865A (en) * 1966-01-19 1967-07-04 Vitro Corp Of America Radiant plasma source having a gas impervious conical anode
AT271654B (en) * 1967-03-03 1969-06-10 Gerb Boehler & Co Ag Method for facilitating the ignition of a high-performance plasma generator
US4447773A (en) * 1981-06-22 1984-05-08 California Institute Of Technology Ion beam accelerator system
JPS60243960A (en) * 1984-05-18 1985-12-03 Hitachi Ltd Ion microbeam device
US4800281A (en) * 1984-09-24 1989-01-24 Hughes Aircraft Company Compact penning-discharge plasma source
US4737688A (en) * 1986-07-22 1988-04-12 Applied Electron Corporation Wide area source of multiply ionized atomic or molecular species

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62161329A (en) * 1986-11-10 1987-07-17 株式会社東芝 Coffee maker
JPS62161330A (en) * 1986-11-10 1987-07-17 株式会社東芝 Coffee maker
KR100319001B1 (en) * 1999-03-15 2002-01-04 아킨스 로버트 피. Plasma focus high energy photon source
KR100358447B1 (en) * 1999-03-15 2002-10-25 사이머 인코포레이티드 Plasma focus high energy photon source with blast shield

Also Published As

Publication number Publication date
EP0298577A3 (en) 1990-01-24
EP0298577A2 (en) 1989-01-11
KR890002951A (en) 1989-04-12
US4987345A (en) 1991-01-22

Similar Documents

Publication Publication Date Title
AU605312B2 (en) Plasma focus apparatus with field distortion elements
CA2288412A1 (en) Plasma mass filter
JPS6417361A (en) High energy large current particle source
GB916854A (en) Ion gun
GB862900A (en) Continuous plasma generator
US3445722A (en) Plasma manipulation method and apparatus
US4349505A (en) Neutral beamline with ion energy recovery based on magnetic blocking of electrons
GB987371A (en) Charged particle generator
GB972083A (en) Improvements in or relating to linear electrostatic accelerators and to methods of producing high-energy ion beams
GB862835A (en) A device for producing energetic ions
US3633067A (en) Magneto-optically controlled ionization tube
JPH02276199A (en) Neutron tube having static ion source
Hamilton et al. Multimomentum 650 mA ion source
RU2076384C1 (en) Plasma source of negative atomic ions
SU814260A1 (en) Pulsed neutron generator
SU690983A1 (en) Neutron tube
Kruger et al. Ionization of a polarized deuterium beam in a penning discharge
JP2879342B2 (en) Electron beam excited ion source
GB976664A (en) Improvements in or relating to ion sources
JP2627420B2 (en) Fast atom beam source
SU1294189A1 (en) Ion source
Hopfgarten et al. Collective phenomena in a Penning discharge in a strongly inhomogeneous magnetic mirror field
Bennett Ion sources for multiply charged heavy ions
Bergström et al. Experiments on the energy balance and confinement of a magnetized plasma
SU784721A1 (en) Ion accelerator