JPS6464217A - Applicator for photo-resist - Google Patents
Applicator for photo-resistInfo
- Publication number
- JPS6464217A JPS6464217A JP22066187A JP22066187A JPS6464217A JP S6464217 A JPS6464217 A JP S6464217A JP 22066187 A JP22066187 A JP 22066187A JP 22066187 A JP22066187 A JP 22066187A JP S6464217 A JPS6464217 A JP S6464217A
- Authority
- JP
- Japan
- Prior art keywords
- partial pressure
- cup
- gas
- photo
- resist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Coating Apparatus (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE:To obtain the high reproducibility of the film thickness of a photo-resist by supplying the inside of a cup with an inert gas and the vapor of a photo-resist solvent, detecting the partial pressure of a photo-resist solvent gas in the cup and keeping said partial pressure at fixed gas partial pressure. CONSTITUTION:The gas partial pressure of a solvent in a photo-resist in a cup 2 vaporized from the photo-resist 5, etc., remaining on the bottom of the cup 2 immediately before the photo-resist 5 is dropped is detected by a gas detecting section 9 using a gas sensor material, and a partial pressure signal (a) is output to a gas partial pressure control section 10. The gas partial pressure control section 10 compares specified gas partial pressure and gas partial pressure in the cup 2, supplies the inside of the cup 2 with nitrogen gas when gas partial pressure in the cup 2 is higher than specified gas partial pressure, and outputs a solenoid-valve control signal (b) so as to open a solenoid valve 11 in order to lower gas partial pressure. When gas partial pressure in the cup 2 is lower than specified gas partial pressure, the inside of the cup 2 is fed with the vapor of a solvent for the photo-resist, and the solenoid-valve control signal (b) is output so as to open a solenoid valve 13 in order to elevate gas partial pressure. Accordingly, gas partial pressure in the cup 2 is kept at a fixed value at all times.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22066187A JPS6464217A (en) | 1987-09-02 | 1987-09-02 | Applicator for photo-resist |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22066187A JPS6464217A (en) | 1987-09-02 | 1987-09-02 | Applicator for photo-resist |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6464217A true JPS6464217A (en) | 1989-03-10 |
Family
ID=16754469
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP22066187A Pending JPS6464217A (en) | 1987-09-02 | 1987-09-02 | Applicator for photo-resist |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6464217A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02194873A (en) * | 1989-01-23 | 1990-08-01 | Tokyo Electron Ltd | Coating apparatus |
JPH036811A (en) * | 1989-06-05 | 1991-01-14 | Matsushita Electric Ind Co Ltd | Photoresist coating apparatus |
US5378511A (en) * | 1993-03-22 | 1995-01-03 | International Business Machines Corporation | Material-saving resist spinner and process |
US5449405A (en) * | 1991-10-29 | 1995-09-12 | International Business Machines Corporation | Material-saving resist spinner and process |
EP1847328A1 (en) * | 1997-12-08 | 2007-10-24 | ASML Holding N.V. | Photoresist coating process control with solvent vapor sensor |
CN100449698C (en) * | 2006-08-10 | 2009-01-07 | 中芯国际集成电路制造(上海)有限公司 | Exhaust control apparatus for gumming machine |
-
1987
- 1987-09-02 JP JP22066187A patent/JPS6464217A/en active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02194873A (en) * | 1989-01-23 | 1990-08-01 | Tokyo Electron Ltd | Coating apparatus |
JPH036811A (en) * | 1989-06-05 | 1991-01-14 | Matsushita Electric Ind Co Ltd | Photoresist coating apparatus |
US5449405A (en) * | 1991-10-29 | 1995-09-12 | International Business Machines Corporation | Material-saving resist spinner and process |
US5378511A (en) * | 1993-03-22 | 1995-01-03 | International Business Machines Corporation | Material-saving resist spinner and process |
EP1847328A1 (en) * | 1997-12-08 | 2007-10-24 | ASML Holding N.V. | Photoresist coating process control with solvent vapor sensor |
CN100449698C (en) * | 2006-08-10 | 2009-01-07 | 中芯国际集成电路制造(上海)有限公司 | Exhaust control apparatus for gumming machine |
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