JPS6464217A - Applicator for photo-resist - Google Patents

Applicator for photo-resist

Info

Publication number
JPS6464217A
JPS6464217A JP22066187A JP22066187A JPS6464217A JP S6464217 A JPS6464217 A JP S6464217A JP 22066187 A JP22066187 A JP 22066187A JP 22066187 A JP22066187 A JP 22066187A JP S6464217 A JPS6464217 A JP S6464217A
Authority
JP
Japan
Prior art keywords
partial pressure
cup
gas
photo
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP22066187A
Other languages
Japanese (ja)
Inventor
Yoshiaki Yamada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP22066187A priority Critical patent/JPS6464217A/en
Publication of JPS6464217A publication Critical patent/JPS6464217A/en
Pending legal-status Critical Current

Links

Landscapes

  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To obtain the high reproducibility of the film thickness of a photo-resist by supplying the inside of a cup with an inert gas and the vapor of a photo-resist solvent, detecting the partial pressure of a photo-resist solvent gas in the cup and keeping said partial pressure at fixed gas partial pressure. CONSTITUTION:The gas partial pressure of a solvent in a photo-resist in a cup 2 vaporized from the photo-resist 5, etc., remaining on the bottom of the cup 2 immediately before the photo-resist 5 is dropped is detected by a gas detecting section 9 using a gas sensor material, and a partial pressure signal (a) is output to a gas partial pressure control section 10. The gas partial pressure control section 10 compares specified gas partial pressure and gas partial pressure in the cup 2, supplies the inside of the cup 2 with nitrogen gas when gas partial pressure in the cup 2 is higher than specified gas partial pressure, and outputs a solenoid-valve control signal (b) so as to open a solenoid valve 11 in order to lower gas partial pressure. When gas partial pressure in the cup 2 is lower than specified gas partial pressure, the inside of the cup 2 is fed with the vapor of a solvent for the photo-resist, and the solenoid-valve control signal (b) is output so as to open a solenoid valve 13 in order to elevate gas partial pressure. Accordingly, gas partial pressure in the cup 2 is kept at a fixed value at all times.
JP22066187A 1987-09-02 1987-09-02 Applicator for photo-resist Pending JPS6464217A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22066187A JPS6464217A (en) 1987-09-02 1987-09-02 Applicator for photo-resist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22066187A JPS6464217A (en) 1987-09-02 1987-09-02 Applicator for photo-resist

Publications (1)

Publication Number Publication Date
JPS6464217A true JPS6464217A (en) 1989-03-10

Family

ID=16754469

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22066187A Pending JPS6464217A (en) 1987-09-02 1987-09-02 Applicator for photo-resist

Country Status (1)

Country Link
JP (1) JPS6464217A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02194873A (en) * 1989-01-23 1990-08-01 Tokyo Electron Ltd Coating apparatus
JPH036811A (en) * 1989-06-05 1991-01-14 Matsushita Electric Ind Co Ltd Photoresist coating apparatus
US5378511A (en) * 1993-03-22 1995-01-03 International Business Machines Corporation Material-saving resist spinner and process
US5449405A (en) * 1991-10-29 1995-09-12 International Business Machines Corporation Material-saving resist spinner and process
EP1847328A1 (en) * 1997-12-08 2007-10-24 ASML Holding N.V. Photoresist coating process control with solvent vapor sensor
CN100449698C (en) * 2006-08-10 2009-01-07 中芯国际集成电路制造(上海)有限公司 Exhaust control apparatus for gumming machine

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02194873A (en) * 1989-01-23 1990-08-01 Tokyo Electron Ltd Coating apparatus
JPH036811A (en) * 1989-06-05 1991-01-14 Matsushita Electric Ind Co Ltd Photoresist coating apparatus
US5449405A (en) * 1991-10-29 1995-09-12 International Business Machines Corporation Material-saving resist spinner and process
US5378511A (en) * 1993-03-22 1995-01-03 International Business Machines Corporation Material-saving resist spinner and process
EP1847328A1 (en) * 1997-12-08 2007-10-24 ASML Holding N.V. Photoresist coating process control with solvent vapor sensor
CN100449698C (en) * 2006-08-10 2009-01-07 中芯国际集成电路制造(上海)有限公司 Exhaust control apparatus for gumming machine

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