JPS6462500A - Etching method - Google Patents

Etching method

Info

Publication number
JPS6462500A
JPS6462500A JP21832887A JP21832887A JPS6462500A JP S6462500 A JPS6462500 A JP S6462500A JP 21832887 A JP21832887 A JP 21832887A JP 21832887 A JP21832887 A JP 21832887A JP S6462500 A JPS6462500 A JP S6462500A
Authority
JP
Japan
Prior art keywords
etching
etchable
etching liquid
hardly
impressed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP21832887A
Other languages
Japanese (ja)
Inventor
Tetsuya Ogawa
Tsutae Shinoda
Toichi Takahashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP21832887A priority Critical patent/JPS6462500A/en
Publication of JPS6462500A publication Critical patent/JPS6462500A/en
Pending legal-status Critical Current

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  • ing And Chemical Polishing (AREA)

Abstract

PURPOSE:To complete uniform etching of a metallic layer, etc., having a hardly etchable passive film in a short period of time by subjecting an object to be etched in contact with an etching liquid to the etching in the state of impressing a negative potential to said object. CONSTITUTION:The negative potential is impressed to the object 1 to be etched which is deposited by evaporation with a metal such as Cr to constitute the hardly etchable body by formation of the passive film insoluble in the etching liquid 4 on a glass substrate 10 and a positive potential is impressed to an electrode 2 consisting of other noble metals by a battery 5. The etching liquid 4 such as hydrochloric acid soln. is thereby separated to Cl<-> and H<+>. H<+> forms foam-like active H on the object 1 consisting of Cr, etc. at a negative electrode, and this H acts with chromium oxide to dissolve the hardly etchable surface layer in an extremely short initial stagnation period of time. The etching progresses rapidly after the base of the easily etchable metal Cr is exposed. This method is applicable to metallic layers consisting of Co, Ti, Fe, and stainless steel, etc., in addition to Cr.
JP21832887A 1987-08-31 1987-08-31 Etching method Pending JPS6462500A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21832887A JPS6462500A (en) 1987-08-31 1987-08-31 Etching method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21832887A JPS6462500A (en) 1987-08-31 1987-08-31 Etching method

Publications (1)

Publication Number Publication Date
JPS6462500A true JPS6462500A (en) 1989-03-08

Family

ID=16718130

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21832887A Pending JPS6462500A (en) 1987-08-31 1987-08-31 Etching method

Country Status (1)

Country Link
JP (1) JPS6462500A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04268084A (en) * 1991-02-22 1992-09-24 Dainippon Screen Mfg Co Ltd Facing method at etching of metallic sheet

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5531200A (en) * 1979-09-03 1980-03-05 Jgc Corp Hydrogen storing metallic material
JPS61227200A (en) * 1985-03-29 1986-10-09 Pioneer Electronic Corp Surface working method of capstan

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5531200A (en) * 1979-09-03 1980-03-05 Jgc Corp Hydrogen storing metallic material
JPS61227200A (en) * 1985-03-29 1986-10-09 Pioneer Electronic Corp Surface working method of capstan

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04268084A (en) * 1991-02-22 1992-09-24 Dainippon Screen Mfg Co Ltd Facing method at etching of metallic sheet

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