JPS6461702A - Antireflecting film - Google Patents

Antireflecting film

Info

Publication number
JPS6461702A
JPS6461702A JP62218949A JP21894987A JPS6461702A JP S6461702 A JPS6461702 A JP S6461702A JP 62218949 A JP62218949 A JP 62218949A JP 21894987 A JP21894987 A JP 21894987A JP S6461702 A JPS6461702 A JP S6461702A
Authority
JP
Japan
Prior art keywords
layers
refractive index
film
substrate
antireflecting film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62218949A
Other languages
English (en)
Other versions
JP2590924B2 (ja
Inventor
Takuji Hatano
Hirozo Tani
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Minolta Co Ltd
Original Assignee
Minolta Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minolta Co Ltd filed Critical Minolta Co Ltd
Priority to JP62218949A priority Critical patent/JP2590924B2/ja
Publication of JPS6461702A publication Critical patent/JPS6461702A/ja
Application granted granted Critical
Publication of JP2590924B2 publication Critical patent/JP2590924B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials

Landscapes

  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Surface Treatment Of Glass (AREA)
JP62218949A 1987-09-01 1987-09-01 反射防止膜 Expired - Lifetime JP2590924B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62218949A JP2590924B2 (ja) 1987-09-01 1987-09-01 反射防止膜

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62218949A JP2590924B2 (ja) 1987-09-01 1987-09-01 反射防止膜

Publications (2)

Publication Number Publication Date
JPS6461702A true JPS6461702A (en) 1989-03-08
JP2590924B2 JP2590924B2 (ja) 1997-03-19

Family

ID=16727859

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62218949A Expired - Lifetime JP2590924B2 (ja) 1987-09-01 1987-09-01 反射防止膜

Country Status (1)

Country Link
JP (1) JP2590924B2 (ja)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04333834A (ja) * 1991-05-09 1992-11-20 Sumitomo Metal Mining Co Ltd 誘電体多層反射防止膜
JPH11142606A (ja) * 1997-11-13 1999-05-28 Canon Inc 反射防止膜及びその製造方法
JP2006036560A (ja) * 2004-07-23 2006-02-09 Hoya Corp 光学多層膜付きガラス部材、及び該ガラス部材を用いた光学素子
CN106067652A (zh) * 2016-07-29 2016-11-02 杭州科汀光学技术有限公司 一种用于准分子激光的双波长增透膜以及光学膜厚监控系统

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58221811A (ja) * 1982-06-17 1983-12-23 Fuji Photo Optical Co Ltd 耐熱反射防止膜
JPS6177001A (ja) * 1984-09-25 1986-04-19 Canon Inc 光反射防止膜
JPS6177002A (ja) * 1984-09-25 1986-04-19 Canon Inc 光反射防止膜

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58221811A (ja) * 1982-06-17 1983-12-23 Fuji Photo Optical Co Ltd 耐熱反射防止膜
JPS6177001A (ja) * 1984-09-25 1986-04-19 Canon Inc 光反射防止膜
JPS6177002A (ja) * 1984-09-25 1986-04-19 Canon Inc 光反射防止膜

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04333834A (ja) * 1991-05-09 1992-11-20 Sumitomo Metal Mining Co Ltd 誘電体多層反射防止膜
JPH11142606A (ja) * 1997-11-13 1999-05-28 Canon Inc 反射防止膜及びその製造方法
JP2006036560A (ja) * 2004-07-23 2006-02-09 Hoya Corp 光学多層膜付きガラス部材、及び該ガラス部材を用いた光学素子
CN106067652A (zh) * 2016-07-29 2016-11-02 杭州科汀光学技术有限公司 一种用于准分子激光的双波长增透膜以及光学膜厚监控系统
CN106067652B (zh) * 2016-07-29 2022-03-08 杭州科汀光学技术有限公司 一种用于准分子激光的双波长增透膜以及光学膜厚监控系统

Also Published As

Publication number Publication date
JP2590924B2 (ja) 1997-03-19

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