JPS6456420A - Orientation treatment device for liquid crystal substrate - Google Patents

Orientation treatment device for liquid crystal substrate

Info

Publication number
JPS6456420A
JPS6456420A JP21346387A JP21346387A JPS6456420A JP S6456420 A JPS6456420 A JP S6456420A JP 21346387 A JP21346387 A JP 21346387A JP 21346387 A JP21346387 A JP 21346387A JP S6456420 A JPS6456420 A JP S6456420A
Authority
JP
Japan
Prior art keywords
rubbing cloth
orientation treatment
substrate
microswitch
vacuum chuck
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP21346387A
Other languages
Japanese (ja)
Inventor
Hiroshi Watabe
Kunihiko Ikuno
Yoshihiro Minamide
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP21346387A priority Critical patent/JPS6456420A/en
Publication of JPS6456420A publication Critical patent/JPS6456420A/en
Pending legal-status Critical Current

Links

Landscapes

  • Liquid Crystal (AREA)

Abstract

PURPOSE:To enable a stable orientation treatment by using a rubbing cloth which is attachable and detachable to and from a rotary drum, disposing the contact direction of a liquid crystal substrate and rubbing cloth to the directions where both face each other and providing a destaticizing means and suction means respectively to the rubbing cloth, thereby executing the orientation treatment. CONSTITUTION:The substrate 1 held to a vacuum chuck base 2 actuates a microswitch 21 when the substrate is inverted. The drum 7 is already held fixed with the rubbing cloth 8 at this time and is kept rotated by a motor 19 in an arrow 22 direction; the destaticizing device 19 and the suction in a suction port 20 are simultaneously operated. The dust and cloth dust on the rubbing cloth 8 are cleaned by the suction port 20. The vacuum chuck base 2 is held stopped after the operation of the microswitch 21. The vacuum chuck base 2 moves a shaft 3 in an arrow 4 direction by a motor when a cam 17 actuates the microswitch 18 by rotation of the drum 7. The contact of the sewed part of the rubbing cloth 8 with the substrate 1 is thereby obviated and the stable orientation treatment is executed by the rubbing cloth 8 except the sewed part thereof.
JP21346387A 1987-08-27 1987-08-27 Orientation treatment device for liquid crystal substrate Pending JPS6456420A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21346387A JPS6456420A (en) 1987-08-27 1987-08-27 Orientation treatment device for liquid crystal substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21346387A JPS6456420A (en) 1987-08-27 1987-08-27 Orientation treatment device for liquid crystal substrate

Publications (1)

Publication Number Publication Date
JPS6456420A true JPS6456420A (en) 1989-03-03

Family

ID=16639624

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21346387A Pending JPS6456420A (en) 1987-08-27 1987-08-27 Orientation treatment device for liquid crystal substrate

Country Status (1)

Country Link
JP (1) JPS6456420A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0915603A (en) * 1995-06-30 1997-01-17 Nec Corp Method and device for rubbing liquid crystal panel substrate
US8644170B2 (en) 2001-11-21 2014-02-04 Qualcomm Incorporated Rate selection for an OFDM system

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62280822A (en) * 1986-05-30 1987-12-05 Stanley Electric Co Ltd Rubbing method

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62280822A (en) * 1986-05-30 1987-12-05 Stanley Electric Co Ltd Rubbing method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0915603A (en) * 1995-06-30 1997-01-17 Nec Corp Method and device for rubbing liquid crystal panel substrate
US8644170B2 (en) 2001-11-21 2014-02-04 Qualcomm Incorporated Rate selection for an OFDM system

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