JPS6453491A - Light emitting device of semiconductor and manufacture thereof - Google Patents

Light emitting device of semiconductor and manufacture thereof

Info

Publication number
JPS6453491A
JPS6453491A JP17745788A JP17745788A JPS6453491A JP S6453491 A JPS6453491 A JP S6453491A JP 17745788 A JP17745788 A JP 17745788A JP 17745788 A JP17745788 A JP 17745788A JP S6453491 A JPS6453491 A JP S6453491A
Authority
JP
Japan
Prior art keywords
layer
becomes
type
region
junction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17745788A
Other languages
Japanese (ja)
Inventor
Shigenobu Yamagoshi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP57140301A external-priority patent/JPS5929484A/en
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP17745788A priority Critical patent/JPS6453491A/en
Publication of JPS6453491A publication Critical patent/JPS6453491A/en
Pending legal-status Critical Current

Links

Landscapes

  • Semiconductor Lasers (AREA)

Abstract

PURPOSE:To improve transverse optical confinement effect by forming both sides of luminous stripe in an active region of hetero junction. CONSTITUTION:An n-type AlGa1-XAs layer 2 which becomes a first clad layer and a quantum well construction 3 which becomes an active layer is formed on a GaAs substrate 1. Then, an n-type Al2Ga1-ZAs layer 4 which becomes a second clad layer and an n-type GaAs layer 5 which becomes a cap layer are formed. And then, a silicon nitride film 20 is formed only on an area which becomes a luminous stripe, zinc is dissipated at approximately 600 to 900 degrees by the closed pipe method, and a p-type region 16 is formed on both sides of a region which becomes the luminous stripe. Then, the junction between the GaAs layer and the p-type region 16 constituting the quantum well structure 3 is in pn junction and constitutes a hetero-junction. The p-type AlGaAs region 16 has a smaller reflection index than the GaAs layer of quantum well layer so that optical confinement is effectively performed in the quantum well construction 3.
JP17745788A 1982-08-12 1988-07-15 Light emitting device of semiconductor and manufacture thereof Pending JPS6453491A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17745788A JPS6453491A (en) 1982-08-12 1988-07-15 Light emitting device of semiconductor and manufacture thereof

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP57140301A JPS5929484A (en) 1982-08-12 1982-08-12 Semiconductor light emitting device
JP17745788A JPS6453491A (en) 1982-08-12 1988-07-15 Light emitting device of semiconductor and manufacture thereof

Publications (1)

Publication Number Publication Date
JPS6453491A true JPS6453491A (en) 1989-03-01

Family

ID=26472868

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17745788A Pending JPS6453491A (en) 1982-08-12 1988-07-15 Light emitting device of semiconductor and manufacture thereof

Country Status (1)

Country Link
JP (1) JPS6453491A (en)

Similar Documents

Publication Publication Date Title
US20050035355A1 (en) Semiconductor light emitting diode and semiconductor light emitting device
GB1385818A (en) Semiconductor double heterostructure diode laser
GB1521726A (en) Beam collimation using multiple coupled elements
GB1114768A (en) Improvements in and relating to semiconductor lamps
JPS568890A (en) Semiconductor laser and manufacture thereof
JPH0327577A (en) Light emitting diode array
JPS6453491A (en) Light emitting device of semiconductor and manufacture thereof
JPS54107689A (en) Semiconductor laser element
JPS5618484A (en) Manufacture of semiconductor laser
JPS5543883A (en) High-output photodiode
JPS5723291A (en) Semiconductor laser device
JPS60123083A (en) Semiconductor device
JPS5563887A (en) Light-emitting diode
KR950013436B1 (en) Semiconductor device and the manufacturing method
SHIGENOBU Light emitting device of semiconductor and manufacture thereof
JPS57139984A (en) Buried photo emitting and receiving semiconductor integrated device
JPS55127015A (en) Photo semiconductor device
JPS62166587A (en) Semiconductor laser
JPS559480A (en) Large light output, lateral mode of semiconductor laser element
JPS5574196A (en) Semiconductor laser
JPS59119884A (en) Semiconductor light-emitting device
JPS58170056A (en) Photointegrated semiconductor device
JPH0325990A (en) Optical semiconductor element
JPS54107283A (en) Formation method of reflection face of semiconductor laser crystal
JPH01205478A (en) Photodetector