JPS6452072A - Production of oxide superconductive sintered body - Google Patents

Production of oxide superconductive sintered body

Info

Publication number
JPS6452072A
JPS6452072A JP62208202A JP20820287A JPS6452072A JP S6452072 A JPS6452072 A JP S6452072A JP 62208202 A JP62208202 A JP 62208202A JP 20820287 A JP20820287 A JP 20820287A JP S6452072 A JPS6452072 A JP S6452072A
Authority
JP
Japan
Prior art keywords
substrate
materials
solns
sintered body
raw material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62208202A
Other languages
Japanese (ja)
Inventor
Makoto Shimizu
Takeshi Kitagawa
Fumiaki Hanawa
Shuichi Shibata
Yoshinori Hibino
Hiroyuki Suda
Masaharu Horiguchi
Takao Edahiro
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP62208202A priority Critical patent/JPS6452072A/en
Publication of JPS6452072A publication Critical patent/JPS6452072A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
    • C23C18/1208—Oxides, e.g. ceramics
    • C23C18/1216—Metal oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/125—Process of deposition of the inorganic material
    • C23C18/1279—Process of deposition of the inorganic material performed under reactive atmosphere, e.g. oxidising or reducing atmospheres

Abstract

PURPOSE:To obtain a large-area oxide superconductive sintered body film without being restricted by the hydrolysis rate by separately dissolving specified metal alkoxide materials in solvents, hydrolyzing the materials, depositing the atomized solns. on a substrate to form oxide powder, and then heating the deposit. CONSTITUTION:The metal alkoxide materials respectively selected from Cu, Ba, Y, and rare-earth elements are separately dissolved in solvents, and water is added to hydrolyze the materials. The obtained colloidal solns. are respectively charged in raw material vessels 1, and the solns. are sent under pressure to raw material transport pipes 3A and then sent to a raw material switching device 2 to adjust the composition. The mixed colloidal soln. is supplied to an atomizer 4, and sprayed on a substrate 5. In this case, the solvent is volatilized, and only the metal oxide fine particles are deposited on the substrate 5. The particles together with the substrate 5 are heat-treated in an oxygen atmosphere, and then annealed. As a result, an oxide superconductive sintered body can be easily produced by a wet method.
JP62208202A 1987-08-24 1987-08-24 Production of oxide superconductive sintered body Pending JPS6452072A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62208202A JPS6452072A (en) 1987-08-24 1987-08-24 Production of oxide superconductive sintered body

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62208202A JPS6452072A (en) 1987-08-24 1987-08-24 Production of oxide superconductive sintered body

Publications (1)

Publication Number Publication Date
JPS6452072A true JPS6452072A (en) 1989-02-28

Family

ID=16552353

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62208202A Pending JPS6452072A (en) 1987-08-24 1987-08-24 Production of oxide superconductive sintered body

Country Status (1)

Country Link
JP (1) JPS6452072A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03140472A (en) * 1989-10-27 1991-06-14 Agency Of Ind Science & Technol Production of built-up film of oxide fine particle
JPH07503888A (en) * 1991-12-23 1995-04-27 カミル　アクチボラゲット Isolation structures and methods for preventing foam formation

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03140472A (en) * 1989-10-27 1991-06-14 Agency Of Ind Science & Technol Production of built-up film of oxide fine particle
JPH07503888A (en) * 1991-12-23 1995-04-27 カミル　アクチボラゲット Isolation structures and methods for preventing foam formation

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