JPS6447082A - Semiconductor light-emitting element - Google Patents

Semiconductor light-emitting element

Info

Publication number
JPS6447082A
JPS6447082A JP20459387A JP20459387A JPS6447082A JP S6447082 A JPS6447082 A JP S6447082A JP 20459387 A JP20459387 A JP 20459387A JP 20459387 A JP20459387 A JP 20459387A JP S6447082 A JPS6447082 A JP S6447082A
Authority
JP
Japan
Prior art keywords
lambda
layer
refractive index
exit surface
multilayered
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP20459387A
Other languages
Japanese (ja)
Inventor
Satoo Komatsubara
Shigeo Osaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP20459387A priority Critical patent/JPS6447082A/en
Publication of JPS6447082A publication Critical patent/JPS6447082A/en
Pending legal-status Critical Current

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  • Semiconductor Lasers (AREA)
  • Led Devices (AREA)

Abstract

PURPOSE:To improve the S/N ratio of an optical pulse signal without lowering a transfer speed by forming a multilayered film constituting a multilayered film interference filter on an exit surface, through which light emitted from a light emitting semiconductor element such as an LED or an LD is derived, by providing on the exit surface comprising a material of the refractive index of ns, an anti-reflection coating composed of a set of a first layer of the refractive index of nz and of the optical depth of lambda/2 and of a second layer of the refractive index of n1 and the optical depth of lambda/4. CONSTITUTION:A lambda/2 layer 5 and lambda/4 layer 3 are stacked repeatedly on an exit surface 2 of an edge emission type LD1. The lambda/2 layer 5 is made for example of titanium oxide (TiO2) of the refractive index n2=2.35, and the lambda/4 layer 3 of SiO2 of the refractive index n1=1.46. Multilayered films 2.5 formed on the exit surface 2 function as interference filters which can reduce the spectral width of output light of the LD1 transmitting those multilayered films to about several to several hundreds of Angstrom narrower than the half spectral width of about 1400Angstrom in the prior art end surface emission type LD1 only including the lambda/4 layer 3 formed therein. Additionally, the lambda/2 layer 5 does not affect the reflectance of the lambda/4 layer 3, thus substantially without changing the output light intensity of the LD1.
JP20459387A 1987-08-18 1987-08-18 Semiconductor light-emitting element Pending JPS6447082A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20459387A JPS6447082A (en) 1987-08-18 1987-08-18 Semiconductor light-emitting element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20459387A JPS6447082A (en) 1987-08-18 1987-08-18 Semiconductor light-emitting element

Publications (1)

Publication Number Publication Date
JPS6447082A true JPS6447082A (en) 1989-02-21

Family

ID=16493037

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20459387A Pending JPS6447082A (en) 1987-08-18 1987-08-18 Semiconductor light-emitting element

Country Status (1)

Country Link
JP (1) JPS6447082A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5530268A (en) * 1993-10-20 1996-06-25 Oki Electric Industry Co., Ltd. Light-emitting diode array with anti-reflection coating providing reduced internal reflection
US5918147A (en) * 1995-03-29 1999-06-29 Motorola, Inc. Process for forming a semiconductor device with an antireflective layer
WO2004054053A1 (en) * 2002-12-12 2004-06-24 Sumitomo Electric Industries, Ltd. Light-emitting device having diffractive optical film on light emission surface and method for manufacturing same
CN101814563A (en) * 2009-02-20 2010-08-25 Lg伊诺特有限公司 Light emitting device, light emitting device package and lighting system including the same

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5530268A (en) * 1993-10-20 1996-06-25 Oki Electric Industry Co., Ltd. Light-emitting diode array with anti-reflection coating providing reduced internal reflection
US5918147A (en) * 1995-03-29 1999-06-29 Motorola, Inc. Process for forming a semiconductor device with an antireflective layer
WO2004054053A1 (en) * 2002-12-12 2004-06-24 Sumitomo Electric Industries, Ltd. Light-emitting device having diffractive optical film on light emission surface and method for manufacturing same
CN101814563A (en) * 2009-02-20 2010-08-25 Lg伊诺特有限公司 Light emitting device, light emitting device package and lighting system including the same
EP2221887A1 (en) * 2009-02-20 2010-08-25 LG Innotek Co., Ltd. Light emitting device, light emitting device package and lighting system including the same
US8552443B2 (en) 2009-02-20 2013-10-08 Lg Innotek Co., Ltd. Light emitting device, light emitting device package and lighting system including the same

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