JPS6443961A - Charged beam device - Google Patents
Charged beam deviceInfo
- Publication number
- JPS6443961A JPS6443961A JP19803787A JP19803787A JPS6443961A JP S6443961 A JPS6443961 A JP S6443961A JP 19803787 A JP19803787 A JP 19803787A JP 19803787 A JP19803787 A JP 19803787A JP S6443961 A JPS6443961 A JP S6443961A
- Authority
- JP
- Japan
- Prior art keywords
- lenses
- lsi
- magnetic field
- electron beams
- beams
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE:To make it possible to carry out the ion etching, the membrane formation in the chemical vapor reaction, and the potential measurement in an LSI with electron beams, by providing object lenses of the electrostatic type and the magnetic field type to enable the deposition to and the drawing from the optical axis. CONSTITUTION:Object lenses including electrostatic lenses 14 to 16 and a magnetic field lens 35 are provided in the same vacuum, and a converting function to use the electrostatic lenses to focus ion beams and the magnetic field lens to focus electron beams is arranged. By rotating a table 41 up to stoppers 42 and 43 around a shaft 40 as the center, the magnetic lens 35 and the Einzel lenses 14 to 16 are made to exchange each other easily. As a result, the partial removal of PSG covering the surface of an LSI to be measured with ion beams, the formation of the metallic measuring pad in the chemical vapor reaction, and the voltage measurement in the LSI with electron beams can be carried out continuously in the same mirror body.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19803787A JPS6443961A (en) | 1987-08-10 | 1987-08-10 | Charged beam device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19803787A JPS6443961A (en) | 1987-08-10 | 1987-08-10 | Charged beam device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6443961A true JPS6443961A (en) | 1989-02-16 |
Family
ID=16384488
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19803787A Pending JPS6443961A (en) | 1987-08-10 | 1987-08-10 | Charged beam device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6443961A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002334663A (en) * | 2001-03-09 | 2002-11-22 | Vacuum Products Kk | Charged particle generating device and charged particle generating method |
| JP2017135046A (en) * | 2016-01-29 | 2017-08-03 | 株式会社荏原製作所 | Inspection apparatus |
| US9824849B2 (en) | 2013-01-18 | 2017-11-21 | Nuflare Technology, Inc. | Charged particle beam writing apparatus, method of adjusting beam incident angle to target object surface, and charged particle beam writing method |
| JP2019114567A (en) * | 2009-11-06 | 2019-07-11 | 株式会社日立ハイテクノロジーズ | Ion beam apparatus and method for analyzing sample |
-
1987
- 1987-08-10 JP JP19803787A patent/JPS6443961A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002334663A (en) * | 2001-03-09 | 2002-11-22 | Vacuum Products Kk | Charged particle generating device and charged particle generating method |
| JP2019114567A (en) * | 2009-11-06 | 2019-07-11 | 株式会社日立ハイテクノロジーズ | Ion beam apparatus and method for analyzing sample |
| US9824849B2 (en) | 2013-01-18 | 2017-11-21 | Nuflare Technology, Inc. | Charged particle beam writing apparatus, method of adjusting beam incident angle to target object surface, and charged particle beam writing method |
| JP2017135046A (en) * | 2016-01-29 | 2017-08-03 | 株式会社荏原製作所 | Inspection apparatus |
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