JPS6336923Y2 - - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an improvement of an eight-pole electrostatic deflector for electron beams.

In electron beam exposure apparatuses and the like, an octupole electrostatic deflector is often used as an electron beam deflector. The 8-pole electrostatic deflector is “Aberration in
Electronstatic Optics For Charged Probe
Forming System”H.Ohiwa Proc.Electron
and Ion Beam Science and Tech.9th Conf.24
-32 (1980), and as shown in the schematic diagram in Figure 1, eight electrodes 1 to 8 of equal size are arranged symmetrically about the axis, and a voltage of X, Voltage -X on electrode 5, voltage Y on electrode 3, voltage -Y on electrode 7, voltage (X+Y)/√ on electrode 2
2. Voltage (-X+Y)/√2 on electrode 4, Voltage (-X-Y)/√2 on electrode 6, Voltage (X-
Y)/√2 is applied to simultaneously deflect the electron beam in the X direction and the Y direction.

An example of the electrode structure of an octupole electrostatic deflector that has been put into practical use in an electron beam exposure apparatus is shown in the plan view of FIG. 2a and the sectional view taken along line A-A' in FIG. 2b. Figure 2a
In the electrode structure shown in (b), for example, even if the position and orientation of each electrode is measured and adjusted during assembly after disassembly and cleaning, the assembly accuracy required for electron beam exposure of semiconductor device masks or wafers cannot be maintained. This is extremely difficult to achieve.

The present invention aims to improve the electrode configuration of an eight-pole electrostatic deflector for electron beams, and to reliably and easily obtain sufficient assembly accuracy.

The object of the present invention is to configure an electrode group by arranging eight electrodes each having a cutout whose surface is a cylindrical surface in a part of a rectangular parallelepiped, and wherein the cutout surface of each electrode is the same cylindrical surface. and the outer circumferential surface of the electrode group is on a rectangular parallelepiped surface having four planes parallel to the central axis of the cylindrical surface, and at least a part of the surface plane of each electrode This is achieved by creating a structure in which the positions of the electrodes are regulated.

Hereinafter, the present invention will be explained in detail by way of examples with reference to the drawings.

FIG. 3 is a sectional view taken perpendicular to the axis of symmetry of an electrode structure showing an embodiment of the present invention. In FIG. 3, 11 to 18 are eight electrodes, 19 is an insulator inserted between adjacent electrodes, 20 is a terminal of each electrode, and 21 is a holding plate.

The electrodes 11 to 18 of this embodiment are made of a material such as phosphor bronze, and are assembled by combining rectangular parallelepipeds that have been previously machined into the required shape and dimensions with the required accuracy via an insulator 19, and are connected to a holding plate 21, an electrode terminal 20, etc. It is obtained by fixing it, cutting it into a cylindrical shape to the required diameter, finishing it, and then plating and finishing it with NIP or the like.

The insulator 19 is made of ceramic having a thickness of about 100 μm, for example. In this embodiment, the electrode terminal 20 has the effect of fixing the electrode as described above, but a means for fixing the electrode may be added, or the effects of the electrode fixing and the electrode terminal can be combined. May be separated. Further, the holding plate 21 is for holding and fixing the electrode group, and needs to have shape and size accuracy sufficient to exhibit the effects of the shape and size accuracy given to the electrodes 11 to 18.

In the electrode structure of the above embodiment, the electrode 11
to 18, the presser plate 21 and other parts are given the required precision, and the facing surfaces of adjacent parts are stably in close contact, and even after disassembly for purposes such as cleaning, sufficient precision is maintained. It is possible to restore and reassemble it using the following.

As explained above, the present invention forms an electrode by integrally processing a rectangular parallelepiped block with the required precision,
By bringing the surface surfaces of each component into close contact, its position is regulated and it is possible to perform restoration assembly with sufficient accuracy, which is highly effective in improving the deflection accuracy of electron beam exposure equipment, etc. has.

[Brief explanation of the drawing]

Figure 1 is a schematic diagram of the electrode arrangement of an 8-pole electrostatic deflector.
FIGS. 2a and 2b are a plan view and a sectional view of an example of an electrode structure according to the prior art, and FIG. 3 is a sectional view of an electrode structure according to an embodiment of the present invention. In the figure, 1 to 8 are electrodes, 11 to 18 are electrodes, 19 is an insulator, 20 is an electrode terminal, and 21 is a holding plate.

Claims (1)

[Scope of utility model registration request] Eight electrodes 11, 12, 13, 14 in the shape of a rectangular parallelepiped with a cutout whose surface has a cylindrical surface,
15, 16, 17, 18 are arranged to constitute an electrode group, and each electrode 11, 12, 13, 14, 15, 1
6, 17, 18 are on the same cylindrical surface, and the electrodes 11, 12, 13, 14, 1
The outer peripheral surfaces of the electrodes 11, 12, 13, 14, 15, 1 are on a rectangular parallelepiped surface having four planes parallel to the central axis of the cylindrical surface.
The positions of electrodes 6, 17, and 18 are adjacent to each other with an insulator 19 in between.
5, 16, 17, 18 and the electrodes 11, 12, 1
An eight-pole electrostatic deflector for electron beams, characterized in that it is regulated by a pressing member 21 that presses the outer peripheral surfaces of the electron beams 3, 14, 15, 16, 17, and 18.