JPH0342611Y2 - - Google Patents

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Publication number
JPH0342611Y2
JPH0342611Y2 JP1984027871U JP2787184U JPH0342611Y2 JP H0342611 Y2 JPH0342611 Y2 JP H0342611Y2 JP 1984027871 U JP1984027871 U JP 1984027871U JP 2787184 U JP2787184 U JP 2787184U JP H0342611 Y2 JPH0342611 Y2 JP H0342611Y2
Authority
JP
Japan
Prior art keywords
aperture
ions
section
aperture plates
mass spectrometer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1984027871U
Other languages
Japanese (ja)
Other versions
JPS60140356U (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP2787184U priority Critical patent/JPS60140356U/en
Publication of JPS60140356U publication Critical patent/JPS60140356U/en
Application granted granted Critical
Publication of JPH0342611Y2 publication Critical patent/JPH0342611Y2/ja
Granted legal-status Critical Current

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Description

【考案の詳細な説明】 本考案は大気圧イオン化(API)イオン源等、
圧力の高い領域でイオン化を行うイオン源を備え
た質量分析装置に関する。
[Detailed description of the invention] This invention is an atmospheric pressure ionization (API) ion source, etc.
The present invention relates to a mass spectrometer equipped with an ion source that performs ionization in a high pressure region.

APIイオン源を備えた質量分析装置において
は、大気圧のイオン源で出来たイオンを高真空の
質量分析装置内部に導入する必要があり、従来例
えば第1図aに示すように両者の間にアパーチヤ
板を配置する構成が知られている。図において1
はAPIイオン源、2は該APIイオン源で生成され
たイオンを質量分析する四重極質量分析装置、
3,4はAPIイオン源1と四重極質量分析装置2
との間に配置されたアパーチヤ板で、特にアパー
チヤ板4は大気側から流入するガスや不要な溶媒
を減少させるためのスキマーとして用いられてい
る。又、上記四重極質量分析装置2内は真空ポン
プ5により、又アパーチヤ板3,4で挟まれた領
域は真空ポンプ6によつて夫々排気されている。
In a mass spectrometer equipped with an API ion source, it is necessary to introduce ions produced by the ion source at atmospheric pressure into the mass spectrometer in a high vacuum. A configuration in which an aperture plate is arranged is known. In the figure 1
2 is an API ion source; 2 is a quadrupole mass spectrometer that performs mass spectrometry on ions generated by the API ion source;
3 and 4 are API ion source 1 and quadrupole mass spectrometer 2
In particular, the aperture plate 4 is used as a skimmer to reduce gases and unnecessary solvents flowing in from the atmosphere side. The interior of the quadrupole mass spectrometer 2 is evacuated by a vacuum pump 5, and the area sandwiched between the aperture plates 3 and 4 is evacuated by a vacuum pump 6.

このような質量分析装置において、APIイオン
源で生成されたイオンを効率良く質量分析装置内
へ導入して感度を向上させるためには、アパーチ
ヤ板に開けるアパーチヤの径は出来る限り大きく
しなければならない。しかしながら、アパーチヤ
板の径を大きくすることには圧力差に応じた限界
がある。そこで、第1図bに示すようにアパーチ
ヤ板7を追加して3枚とし、アパーチヤ板7と4
で挾まれた領域を真空ポンプ8で排気することに
より、アパーチヤ板1枚あたり維持しなけらばな
らない圧力差を少なくしてアパーチヤの径を大き
くすることが検討されている。ところが、アパー
チヤ板の枚数が3枚に増えた場合、3つのアパー
チヤの位置がずれていると、その分イオンのロス
が大きくなり、アパーチヤの径を大きくした意味
がなくなつてしまう。そのため、3つのアパーチ
ヤを軸を合わせて配列し、しかも四重極質量分析
装置の軸とも合わせなければならないが、その作
業は各アパーチヤ板を独立に動かして調整しなけ
ればならず、アパーチヤ板の枚数が増すに従つて
格段にむずかしくなる。尚、工作精度が極めて高
ければこのような軸合わせを省略することも可能
であるが、アパーチヤの径は100μmオーダであ
るので、工作精度の上限が50μm程度の現状で
は、発生するずれを無視することはできない。
In such a mass spectrometer, in order to efficiently introduce ions generated by the API ion source into the mass spectrometer and improve sensitivity, the diameter of the aperture formed in the aperture plate must be made as large as possible. . However, there is a limit to increasing the diameter of the aperture plate depending on the pressure difference. Therefore, as shown in FIG.
It is being considered to reduce the pressure difference that must be maintained per aperture plate and increase the diameter of the aperture by evacuating the area sandwiched by the aperture with a vacuum pump 8. However, when the number of aperture plates is increased to three, if the three apertures are misaligned, the ion loss increases accordingly, and there is no point in increasing the aperture diameter. Therefore, it is necessary to align the three apertures with their axes and also align them with the axis of the quadrupole mass spectrometer, but this requires adjusting each aperture plate by moving each aperture plate independently. As the number of sheets increases, it becomes much more difficult. Note that if the machining accuracy is extremely high, it is possible to omit such alignment, but since the diameter of the aperture is on the order of 100 μm, at present, where the upper limit of machining accuracy is about 50 μm, the misalignment that occurs can be ignored. It is not possible.

本考案はこの点に鑑みてなされたもので、アパ
ーチヤ板とアパーチヤ板で挟まれた領域の少なく
とも1つにイオンを偏向する偏向電極を設けるこ
とにより、容易に軸合わせを行うことのできる質
量分析装置を提供することを目的としている。
The present invention was devised in view of this point, and by providing a deflection electrode for deflecting ions in at least one of the regions sandwiched between the aperture plates, mass spectrometers can easily perform axis alignment. The purpose is to provide equipment.

本考案は、大気圧領域の圧力の高いイオン化部
と、該イオン化部で生成されたイオンを導入して
分析する圧力の低い質量分析部と、上記イオン化
部と質量分析部との間にイオンが通過するアパー
チヤの軸を合わせて間隔をおいて配列された複数
のアパーチヤ板と、該アパーチヤ板で挟まれた領
域を排気する手段と、前記アパーチヤ板で挟まれ
た領域の少なくとも1つに通過するイオンを偏向
する偏向電極を設けたことを特徴としている。以
下、図面を用いて本考案の一実施例を詳述する。
The present invention consists of an ionization section with high pressure in the atmospheric pressure region, a mass spectrometry section with low pressure that introduces and analyzes the ions generated in the ionization section, and ions between the ionization section and the mass spectrometry section. a plurality of aperture plates arranged at intervals with the axes of the apertures aligned, means for evacuating a region sandwiched by the aperture plates; and a device passing through at least one of the regions sandwiched by the aperture plates. It is characterized by the provision of a deflection electrode that deflects ions. Hereinafter, one embodiment of the present invention will be described in detail with reference to the drawings.

第2図は本考案を実施した質量分析装置の一例
を示す断面図である。第2図において、APIイオ
ン源1はガラス製の筒体11、コロナ放電により
励起されたキヤリアガス原子又はイオンを作成す
るコロナ放電部12、励起されたキヤリアガス原
子又はイオンの流れの中に試料を配置し、試料を
イオン化するための試料保持針13から成り、該
針13の先端で生成された試料イオンは、アパー
チヤ板3,4,7を介して四重極電極14,レン
ズ電極15,真空容器16等から成る四重極質量
分析装置2内へ導入される。上記アパーチヤ板
3,4,7は、上記真空容器16の端部を封止す
る絶縁物製のフランジ17に固定されており、ア
パーチヤ板3とアパーチヤ板4とで挾まれた領域
18は排気管19を介して、またアパーチヤ板4
とアパーチヤ板7で挾まれた領域20は排気管2
1を介して、夫々ロータリポンプ(図示せず)に
接続されている。22はイオンを偏向して軸合わ
せを行うための偏向電極で、A−A断面図である
第3図に示すように、イオン通路を挟んで対向配
置された4枚の電極22a〜22dから構成さ
れ、各電極には電源23a〜23dから適宜な正
の電圧が印加される。
FIG. 2 is a sectional view showing an example of a mass spectrometer implementing the present invention. In FIG. 2, the API ion source 1 includes a glass cylinder 11, a corona discharge section 12 that creates carrier gas atoms or ions excited by corona discharge, and a sample placed in the flow of the excited carrier gas atoms or ions. It consists of a sample holding needle 13 for ionizing the sample, and the sample ions generated at the tip of the needle 13 are transferred to a quadrupole electrode 14, a lens electrode 15, and a vacuum container via aperture plates 3, 4, and 7. 16, etc., into a quadrupole mass spectrometer 2. The aperture plates 3, 4, and 7 are fixed to an insulating flange 17 that seals the end of the vacuum vessel 16, and a region 18 sandwiched between the aperture plates 3 and 4 is an exhaust pipe. 19 and also the aperture plate 4
The region 20 sandwiched between the aperture plate 7 and the aperture plate 7 is the exhaust pipe 2
1, each is connected to a rotary pump (not shown). Reference numeral 22 denotes a deflection electrode for deflecting ions and aligning their axes, and as shown in FIG. 3, which is a cross-sectional view taken along line A-A, it is composed of four electrodes 22a to 22d arranged facing each other across an ion path. An appropriate positive voltage is applied to each electrode from power supplies 23a to 23d.

かかる構成をもつ本実施例では、単一のフラン
ジ17にアパーチヤ板3,4,7が取付けられる
ので、装置の製造過程で大気中においてフランジ
に3枚のアパーチヤ板を取付ける際、例えば光の
直進性を利用して軸合わせを予め精度良く行うこ
とができるが、その軸が多少ずれていた場合で
も、偏向電極によりイオンの方向を偏向し、イオ
ンがアパーチヤ板7を確実に通過するように調整
することができる。この調整は電気的に行えるた
め、アパーチヤ板を独立に移動させなければなら
なかつた従来に比べれば作業は極めて容易にな
る。
In this embodiment having such a configuration, the aperture plates 3, 4, and 7 are attached to a single flange 17, so when attaching the three aperture plates to the flange in the atmosphere during the manufacturing process of the device, for example, the straight propagation of light is prevented. However, even if the axis is slightly misaligned, the direction of the ions can be deflected by the deflection electrode to ensure that the ions pass through the aperture plate 7. can do. Since this adjustment can be done electrically, the work is much easier than in the past, where the aperture plates had to be moved independently.

また、通常正の電荷を持つ試料イオンに対して
4つの偏向電極に正電位を印加している本実施例
では、偏向電極に収束レンズ作用を持たせること
ができるため、アパーチヤ板4を通過して発散す
る傾向のあるイオンは収束しつつある状態でアパ
ーチヤ板7へ向かうことになり、イオンの通過効
率はその分向上する結果となる。試料イオンが負
の場合には負電位を偏向電極に印加すれば良いこ
とは言うまでもない。
In addition, in this embodiment, in which a positive potential is applied to the four deflection electrodes for sample ions that normally have a positive charge, the deflection electrodes can have a converging lens effect, so that the sample ions that pass through the aperture plate 4 Ions that tend to diverge will head toward the aperture plate 7 in a converging state, resulting in an improvement in the ion passage efficiency. Needless to say, if the sample ions are negative, a negative potential may be applied to the deflection electrode.

尚、上述した実施例では偏向電極を領域20の
みに設けたが、領域18にも設置すれば更に精度
良く軸合わせを行うことができるし、アパーチヤ
板を更に数多く備えた装置に適用すれば効果は更
に大きい。
In the above-mentioned embodiment, the deflection electrode was provided only in the region 20, but if it is also provided in the region 18, alignment can be performed with even more accuracy, and if applied to a device equipped with more aperture plates, it will be more effective. is even larger.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来例の構造を説明するための断面
図、第2図は本考案を実施した質量分析装置の一
例を示す断面図、第3図はそのA−A断面図であ
る。 1:APIイオン源、2:四重極質量分析装置、
3,4,7:アパーチヤ板、17:フランジ、1
9,21:排気管、22a〜22d:偏向電極、
23a〜23d:電源。
FIG. 1 is a cross-sectional view for explaining the structure of a conventional example, FIG. 2 is a cross-sectional view showing an example of a mass spectrometer embodying the present invention, and FIG. 3 is a cross-sectional view taken along line A-A. 1: API ion source, 2: quadrupole mass spectrometer,
3, 4, 7: Aperture plate, 17: Flange, 1
9, 21: exhaust pipe, 22a to 22d: deflection electrode,
23a-23d: Power supply.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 大気圧領域の圧力の高いイオン化部と、該イオ
ン化部で生成されたイオンを導入して分析する圧
力の低い質量分析部と、上記イオン化部と質量分
析部との間にイオンが通過するアパーチヤの軸を
合わせて間隔をおいて配列された複数のアパーチ
ヤ板と、該アパーチヤ板で挟まれた領域を排気す
る手段と、前記アパーチヤ板で挟まれた領域の少
なくとも1つに通過するイオンを偏向する偏向電
極を設けたことを特徴とする質量分析装置。
An ionization section with high pressure in the atmospheric pressure region, a mass spectrometry section with low pressure that introduces and analyzes ions generated in the ionization section, and an aperture through which ions pass between the ionization section and the mass spectrometry section. a plurality of aperture plates arranged at intervals with their axes aligned; means for evacuating a region sandwiched by the aperture plates; and deflecting ions passing through at least one of the regions sandwiched by the aperture plates. A mass spectrometer characterized by being provided with a deflection electrode.
JP2787184U 1984-02-28 1984-02-28 mass spectrometer Granted JPS60140356U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2787184U JPS60140356U (en) 1984-02-28 1984-02-28 mass spectrometer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2787184U JPS60140356U (en) 1984-02-28 1984-02-28 mass spectrometer

Publications (2)

Publication Number Publication Date
JPS60140356U JPS60140356U (en) 1985-09-17
JPH0342611Y2 true JPH0342611Y2 (en) 1991-09-06

Family

ID=30525224

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2787184U Granted JPS60140356U (en) 1984-02-28 1984-02-28 mass spectrometer

Country Status (1)

Country Link
JP (1) JPS60140356U (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4581184B2 (en) * 2000-06-07 2010-11-17 株式会社島津製作所 Mass spectrometer

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5550563A (en) * 1978-10-07 1980-04-12 Ulvac Corp Mass analyzer
JPS5623273A (en) * 1979-07-31 1981-03-05 Takara Belmont Co Ltd Sieve for scattering glaze

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5550563A (en) * 1978-10-07 1980-04-12 Ulvac Corp Mass analyzer
JPS5623273A (en) * 1979-07-31 1981-03-05 Takara Belmont Co Ltd Sieve for scattering glaze

Also Published As

Publication number Publication date
JPS60140356U (en) 1985-09-17

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