JPS6442168A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPS6442168A
JPS6442168A JP62198419A JP19841987A JPS6442168A JP S6442168 A JPS6442168 A JP S6442168A JP 62198419 A JP62198419 A JP 62198419A JP 19841987 A JP19841987 A JP 19841987A JP S6442168 A JPS6442168 A JP S6442168A
Authority
JP
Japan
Prior art keywords
region
impurity diffusion
gate electrode
impurity
drain
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62198419A
Other languages
Japanese (ja)
Inventor
Kenji Sano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP62198419A priority Critical patent/JPS6442168A/en
Publication of JPS6442168A publication Critical patent/JPS6442168A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B20/00Read-only memory [ROM] devices

Abstract

PURPOSE:To read written data at high speed by forming an impurity diffusion of low resistance constructing a drain or source region by forming in a self- alignment manner a second conduction type impurity region using a field oxide film and a gate electrode as a mask. CONSTITUTION:A gate electrode and a gate wiring 12 are separately formed, and an impurity diffusion region which constructs a drain region 10 or a source region 11 is formed in a self-alignment manner using a gate electrode 9 and a fixed oxide film 7 as a mask. Hereby, an impurity is diffused simultaneously to the gate wiring 12 and an intersection of the impurity diffusion regions 10, 11 upon formation of the impurity diffusion region. Thus, resistance of the drain region being a signal extraction line is sharply reduced, assuring high speed read of written data.
JP62198419A 1987-08-07 1987-08-07 Semiconductor device Pending JPS6442168A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62198419A JPS6442168A (en) 1987-08-07 1987-08-07 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62198419A JPS6442168A (en) 1987-08-07 1987-08-07 Semiconductor device

Publications (1)

Publication Number Publication Date
JPS6442168A true JPS6442168A (en) 1989-02-14

Family

ID=16390796

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62198419A Pending JPS6442168A (en) 1987-08-07 1987-08-07 Semiconductor device

Country Status (1)

Country Link
JP (1) JPS6442168A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2758418A1 (en) * 1997-01-16 1998-07-17 United Microelectronics Corp SEMICONDUCTOR READ ONLY MEMORY DEVICE AND MANUFACTURING METHOD THEREOF
FR2758653A1 (en) * 1997-01-17 1998-07-24 United Microelectronics Corp SEMICONDUCTOR DEAD MEMORY AND MANUFACTURING METHOD

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2758418A1 (en) * 1997-01-16 1998-07-17 United Microelectronics Corp SEMICONDUCTOR READ ONLY MEMORY DEVICE AND MANUFACTURING METHOD THEREOF
NL1006214C2 (en) * 1997-01-16 1998-12-04 United Microelectronics Corp Semiconductor read-only memory device and method of manufacturing it.
FR2758653A1 (en) * 1997-01-17 1998-07-24 United Microelectronics Corp SEMICONDUCTOR DEAD MEMORY AND MANUFACTURING METHOD
NL1006265C2 (en) * 1997-01-17 1998-12-10 United Microelectronics Corp Semiconductor read-only memory device and method of manufacturing it.

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