JPS6439727A - Manufacture of semiconductor device - Google Patents
Manufacture of semiconductor deviceInfo
- Publication number
- JPS6439727A JPS6439727A JP19735287A JP19735287A JPS6439727A JP S6439727 A JPS6439727 A JP S6439727A JP 19735287 A JP19735287 A JP 19735287A JP 19735287 A JP19735287 A JP 19735287A JP S6439727 A JPS6439727 A JP S6439727A
- Authority
- JP
- Japan
- Prior art keywords
- vapor
- organic solvent
- wafer
- temperature
- conduit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE:To eliminate irregularity and dripping of droplets due to dew condensation and to process a wafer with uniform organic solvent vapor by making a conduit for introducing the vapor into a wafer processing chamber in double structure, and constructing in such a manner as to pass the vapor to an inner tube and wafer for regulating temperature to an outer tube. CONSTITUTION:An organic solvent 2 in a bubbling tank 1 is bubbled with nitrogen through a nitrogen bubbling nozzle 3, and organic solvent vapor 4 is generated in the tank 1. The vapor is introduced by an organic solvent vapor conduit 5 to a wafer processing chamber 6 to process wafer 10. A conduit 5 is passed in an outer tube 9 through which water being a medium for regulating temperature held at a predetermined temperature by a unit 7 via a temperature regulating water tube 8 on the way to hold the temperature of the vapor passing the interior constant.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19735287A JPS6439727A (en) | 1987-08-06 | 1987-08-06 | Manufacture of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19735287A JPS6439727A (en) | 1987-08-06 | 1987-08-06 | Manufacture of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6439727A true JPS6439727A (en) | 1989-02-10 |
Family
ID=16373056
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP19735287A Pending JPS6439727A (en) | 1987-08-06 | 1987-08-06 | Manufacture of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6439727A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000112534A (en) * | 1998-09-25 | 2000-04-21 | E & E Elektron Gmbh | Device for generating specified relative moisture |
EP1728907A1 (en) | 2005-06-02 | 2006-12-06 | Tsudakoma Kogyo Kabushiki Kaisha | Cloth-fell position adjuster |
JP2010007973A (en) * | 2008-06-27 | 2010-01-14 | Fujimori Kogyo Co Ltd | Burning treatment method and burning treatment apparatus for volatile organic compound |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61214520A (en) * | 1985-03-20 | 1986-09-24 | Hitachi Ltd | Coating device |
JPS62211643A (en) * | 1986-03-12 | 1987-09-17 | Mitsubishi Electric Corp | Coating method for adhesion intensifying agent |
-
1987
- 1987-08-06 JP JP19735287A patent/JPS6439727A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61214520A (en) * | 1985-03-20 | 1986-09-24 | Hitachi Ltd | Coating device |
JPS62211643A (en) * | 1986-03-12 | 1987-09-17 | Mitsubishi Electric Corp | Coating method for adhesion intensifying agent |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000112534A (en) * | 1998-09-25 | 2000-04-21 | E & E Elektron Gmbh | Device for generating specified relative moisture |
EP1728907A1 (en) | 2005-06-02 | 2006-12-06 | Tsudakoma Kogyo Kabushiki Kaisha | Cloth-fell position adjuster |
JP2010007973A (en) * | 2008-06-27 | 2010-01-14 | Fujimori Kogyo Co Ltd | Burning treatment method and burning treatment apparatus for volatile organic compound |
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