JPS6439727A - Manufacture of semiconductor device - Google Patents

Manufacture of semiconductor device

Info

Publication number
JPS6439727A
JPS6439727A JP19735287A JP19735287A JPS6439727A JP S6439727 A JPS6439727 A JP S6439727A JP 19735287 A JP19735287 A JP 19735287A JP 19735287 A JP19735287 A JP 19735287A JP S6439727 A JPS6439727 A JP S6439727A
Authority
JP
Japan
Prior art keywords
vapor
organic solvent
wafer
temperature
conduit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP19735287A
Other languages
Japanese (ja)
Inventor
Yukihiro Yanabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Kyushu Ltd
Original Assignee
NEC Kyushu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Kyushu Ltd filed Critical NEC Kyushu Ltd
Priority to JP19735287A priority Critical patent/JPS6439727A/en
Publication of JPS6439727A publication Critical patent/JPS6439727A/en
Pending legal-status Critical Current

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  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To eliminate irregularity and dripping of droplets due to dew condensation and to process a wafer with uniform organic solvent vapor by making a conduit for introducing the vapor into a wafer processing chamber in double structure, and constructing in such a manner as to pass the vapor to an inner tube and wafer for regulating temperature to an outer tube. CONSTITUTION:An organic solvent 2 in a bubbling tank 1 is bubbled with nitrogen through a nitrogen bubbling nozzle 3, and organic solvent vapor 4 is generated in the tank 1. The vapor is introduced by an organic solvent vapor conduit 5 to a wafer processing chamber 6 to process wafer 10. A conduit 5 is passed in an outer tube 9 through which water being a medium for regulating temperature held at a predetermined temperature by a unit 7 via a temperature regulating water tube 8 on the way to hold the temperature of the vapor passing the interior constant.
JP19735287A 1987-08-06 1987-08-06 Manufacture of semiconductor device Pending JPS6439727A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19735287A JPS6439727A (en) 1987-08-06 1987-08-06 Manufacture of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19735287A JPS6439727A (en) 1987-08-06 1987-08-06 Manufacture of semiconductor device

Publications (1)

Publication Number Publication Date
JPS6439727A true JPS6439727A (en) 1989-02-10

Family

ID=16373056

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19735287A Pending JPS6439727A (en) 1987-08-06 1987-08-06 Manufacture of semiconductor device

Country Status (1)

Country Link
JP (1) JPS6439727A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000112534A (en) * 1998-09-25 2000-04-21 E & E Elektron Gmbh Device for generating specified relative moisture
EP1728907A1 (en) 2005-06-02 2006-12-06 Tsudakoma Kogyo Kabushiki Kaisha Cloth-fell position adjuster
JP2010007973A (en) * 2008-06-27 2010-01-14 Fujimori Kogyo Co Ltd Burning treatment method and burning treatment apparatus for volatile organic compound

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61214520A (en) * 1985-03-20 1986-09-24 Hitachi Ltd Coating device
JPS62211643A (en) * 1986-03-12 1987-09-17 Mitsubishi Electric Corp Coating method for adhesion intensifying agent

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61214520A (en) * 1985-03-20 1986-09-24 Hitachi Ltd Coating device
JPS62211643A (en) * 1986-03-12 1987-09-17 Mitsubishi Electric Corp Coating method for adhesion intensifying agent

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000112534A (en) * 1998-09-25 2000-04-21 E & E Elektron Gmbh Device for generating specified relative moisture
EP1728907A1 (en) 2005-06-02 2006-12-06 Tsudakoma Kogyo Kabushiki Kaisha Cloth-fell position adjuster
JP2010007973A (en) * 2008-06-27 2010-01-14 Fujimori Kogyo Co Ltd Burning treatment method and burning treatment apparatus for volatile organic compound

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