JPS6437841A - Semiconductor wafer cleaner - Google Patents
Semiconductor wafer cleanerInfo
- Publication number
- JPS6437841A JPS6437841A JP19368187A JP19368187A JPS6437841A JP S6437841 A JPS6437841 A JP S6437841A JP 19368187 A JP19368187 A JP 19368187A JP 19368187 A JP19368187 A JP 19368187A JP S6437841 A JPS6437841 A JP S6437841A
- Authority
- JP
- Japan
- Prior art keywords
- brush
- wafer
- semiconductor wafer
- active agent
- water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Cleaning In General (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
PURPOSE:To reduce the sliding load of a brush, and to prevent the breakdown of a pattern on the surface of a wafer by sliding a brush member on the surface of the semiconductor wafer, to which water is injected, which is supplied with a surface active agent and which is turned. CONSTITUTION:The load of a brush 8 is adjusted by a weight 9 while water is injected onto the surface of a semiconductor wafer 1 attracted to a chuck drive section 2 and rotated around a shaft vertical to the surface of the section 2 through a pure water nozzle 10, and the brush 8 is lowered. When water injection is interrupted and a surface active agent is dropped onto the surface of the wafer 1 from a surface active agent nozzle 11, the suction force of foreign matters on the surface of the wafer 1 is weakened, and forsign matters are removed by the brush 8. The sliding load of the brush is reduced by using the surface active agent, and the semiconductor wafer is washed while the breakdown of a pattern on the surface of the wafer is prevented.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19368187A JPS6437841A (en) | 1987-08-04 | 1987-08-04 | Semiconductor wafer cleaner |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19368187A JPS6437841A (en) | 1987-08-04 | 1987-08-04 | Semiconductor wafer cleaner |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6437841A true JPS6437841A (en) | 1989-02-08 |
Family
ID=16312015
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP19368187A Pending JPS6437841A (en) | 1987-08-04 | 1987-08-04 | Semiconductor wafer cleaner |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6437841A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0641131U (en) * | 1993-10-01 | 1994-05-31 | 大日本スクリーン製造株式会社 | Substrate cleaning equipment |
US6277203B1 (en) | 1998-09-29 | 2001-08-21 | Lam Research Corporation | Method and apparatus for cleaning low K dielectric and metal wafer surfaces |
JP2005142524A (en) * | 2003-04-29 | 2005-06-02 | Soi Tec Silicon On Insulator Technologies | Surface treatment of semiconductor wafer before bonding |
-
1987
- 1987-08-04 JP JP19368187A patent/JPS6437841A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0641131U (en) * | 1993-10-01 | 1994-05-31 | 大日本スクリーン製造株式会社 | Substrate cleaning equipment |
US6277203B1 (en) | 1998-09-29 | 2001-08-21 | Lam Research Corporation | Method and apparatus for cleaning low K dielectric and metal wafer surfaces |
US6319330B1 (en) | 1998-09-29 | 2001-11-20 | Lam Research Corporation | Method and apparatus for cleaning low K dielectric and metal wafer surfaces |
JP2005142524A (en) * | 2003-04-29 | 2005-06-02 | Soi Tec Silicon On Insulator Technologies | Surface treatment of semiconductor wafer before bonding |
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