JPS6437037U - - Google Patents
Info
- Publication number
- JPS6437037U JPS6437037U JP13301487U JP13301487U JPS6437037U JP S6437037 U JPS6437037 U JP S6437037U JP 13301487 U JP13301487 U JP 13301487U JP 13301487 U JP13301487 U JP 13301487U JP S6437037 U JPS6437037 U JP S6437037U
- Authority
- JP
- Japan
- Prior art keywords
- globe
- rotor
- outlet
- semiconductor material
- circumferential wall
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001035 drying Methods 0.000 claims description 3
- 230000002093 peripheral effect Effects 0.000 claims description 2
- 239000000463 material Substances 0.000 claims 3
- 239000004065 semiconductor Substances 0.000 claims 3
Landscapes
- Centrifugal Separators (AREA)
- Drying Of Solid Materials (AREA)
Description
第１図は本考案で用いられるグローブの一例の
斜視図、第２図はその側面図、第３図はその平面
図、第４図は従来の水切乾燥装置の斜視図、そし
て第５図はその概略断面図である。
図中、１：ロータ、２：グローブ、６：吸気口
、１０：出口、１１：周壁、１２：底面。
Fig. 1 is a perspective view of an example of a glove used in the present invention, Fig. 2 is a side view thereof, Fig. 3 is a plan view thereof, Fig. 4 is a perspective view of a conventional drain drying device, and Fig. 5 is a perspective view of an example of a glove used in the present invention. It is a schematic sectional view. In the figure, 1: rotor, 2: globe, 6: intake port, 10: outlet, 11: peripheral wall, 12: bottom surface.
Claims (1)
なり、半導体材料を収めたキヤリアはクレイドル
内に収められてロータの所定位置に取付けられ、
ロータ上方の吸気口から導入され且つロータを通
過してグローブの周壁に備えられた出口から流出
する気流によつてロータ上の半導体材料が乾燥さ
れる水切乾燥装置において、前記グローブの底面
は前記出口が低くなるように傾斜し且つその周壁
は下方に向かつて僅かに末広状に傾斜し、さらに
前記出口はグローブ周壁の高さの下半分またはそ
れ以下の部分に設けられていることを特徴とする
半導体材料の水切乾燥装置。 It consists of a globe and a rotor rotated within the globe, and a carrier containing semiconductor material is housed in a cradle and attached to a predetermined position of the rotor,
In a drain drying device in which a semiconductor material on a rotor is dried by an air flow introduced from an intake port above the rotor, passed through the rotor, and exited from an outlet provided in a peripheral wall of a globe, the bottom surface of the globe is connected to the outlet. is sloped so as to be lower, and its circumferential wall is sloped downwardly in a slightly divergent manner, and further, the outlet is provided at the lower half of the height of the circumferential wall of the globe or less. Draining and drying equipment for semiconductor materials.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13301487U JPS6437037U (en) | 1987-08-31 | 1987-08-31 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13301487U JPS6437037U (en) | 1987-08-31 | 1987-08-31 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6437037U true JPS6437037U (en) | 1989-03-06 |
Family
ID=31390502
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13301487U Pending JPS6437037U (en) | 1987-08-31 | 1987-08-31 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6437037U (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6012189B2 (en) * | 1976-08-03 | 1985-03-30 | 株式会社精工舎 | Processing equipment such as crystal resonators |
-
1987
- 1987-08-31 JP JP13301487U patent/JPS6437037U/ja active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6012189B2 (en) * | 1976-08-03 | 1985-03-30 | 株式会社精工舎 | Processing equipment such as crystal resonators |