JPS643648A - Photoresist composition - Google Patents

Photoresist composition

Info

Publication number
JPS643648A
JPS643648A JP63144553A JP14455388A JPS643648A JP S643648 A JPS643648 A JP S643648A JP 63144553 A JP63144553 A JP 63144553A JP 14455388 A JP14455388 A JP 14455388A JP S643648 A JPS643648 A JP S643648A
Authority
JP
Japan
Prior art keywords
allene
resin
urea
formula
curing agent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP63144553A
Other languages
English (en)
Other versions
JP2597886B2 (ja
Inventor
Maiyaa Kuruto
Rozeruto Ebaruto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Novartis AG
Original Assignee
Ciba Geigy AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy AG filed Critical Ciba Geigy AG
Publication of JPS643648A publication Critical patent/JPS643648A/ja
Application granted granted Critical
Publication of JP2597886B2 publication Critical patent/JP2597886B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Epoxy Resins (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Materials For Photolithography (AREA)
JP63144553A 1987-06-12 1988-06-11 ホトレジスト組成物 Expired - Lifetime JP2597886B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH221487 1987-06-12
CH02214/87-6 1987-06-12

Publications (2)

Publication Number Publication Date
JPS643648A true JPS643648A (en) 1989-01-09
JP2597886B2 JP2597886B2 (ja) 1997-04-09

Family

ID=4228527

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63144553A Expired - Lifetime JP2597886B2 (ja) 1987-06-12 1988-06-11 ホトレジスト組成物

Country Status (6)

Country Link
US (1) US5124233A (ja)
EP (1) EP0295211B1 (ja)
JP (1) JP2597886B2 (ja)
BR (1) BR8802836A (ja)
CA (1) CA1331926C (ja)
DE (1) DE3888400D1 (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0358050A (ja) * 1989-07-20 1991-03-13 Internatl Business Mach Corp <Ibm> 感光性組成物
CN1056641C (zh) * 1993-06-11 2000-09-20 大不列颠及北爱尔兰联合王国国防大臣 液晶材料、混合物及器件
JP2015135522A (ja) * 2015-04-13 2015-07-27 太陽インキ製造株式会社 ポジ型感光性樹脂組成物、ドライフィルム、硬化物及びプリント配線板

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0294333B1 (de) * 1987-06-05 1993-03-17 Ciba-Geigy Ag Kationisch polymerisierbare Gemische enthaltend ausgewählte Härter
EP0409169A3 (en) * 1989-07-20 1992-03-25 Ciba-Geigy Ag Exposing method
EP0452263B1 (de) * 1990-04-10 1995-07-19 Ciba-Geigy Ag Epoxidharz-Stoffgemische enthaltend Eisen-Aren-Komplexe und bestimmte Amine
US5480585A (en) * 1992-04-02 1996-01-02 Nagase Electronic Chemicals, Ltd. Stripping liquid compositions
US20030157414A1 (en) * 1997-11-13 2003-08-21 Pradeep K. Dhal Holographic medium and process for use thereof
US6168898B1 (en) * 1998-02-17 2001-01-02 Isola Laminate Systems Corp. Positive acting photodielectric composition
CA2357001C (en) 1998-12-22 2009-01-20 Vantico Ag Production of photoresist coatings
US6297294B1 (en) * 1999-10-07 2001-10-02 E. I. Du Pont De Nemours And Company Method for improving the adhesion of a photopolymerizable composition to copper
TWI228639B (en) * 2000-11-15 2005-03-01 Vantico Ag Positive type photosensitive epoxy resin composition and printed circuit board using the same
JP4429620B2 (ja) * 2002-10-15 2010-03-10 出光興産株式会社 感放射線性有機化合物
KR101232179B1 (ko) * 2006-12-04 2013-02-12 엘지디스플레이 주식회사 박막 패턴의 제조장치 및 방법

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5187028A (ja) * 1975-01-29 1976-07-30 Hitachi Ltd Handarejisutososeibutsu
JPS60184518A (ja) * 1984-02-10 1985-09-20 チバ‐ガイギー　アーゲー 硬化可能な組成物及びその使用法
JPS6290648A (ja) * 1985-09-23 1987-04-25 チバ−ガイギ−　アクチエンゲゼル　シヤフト 光重合性組成物、その光重合方法及び写真レリ−フ画像の形成方法
JPS6291934A (ja) * 1985-10-18 1987-04-27 Toyo Ink Mfg Co Ltd ソルダ−レジスト組成物

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3752669A (en) * 1971-12-17 1973-08-14 Ibm Method of producing positive images from epoxy compositions and compositions therefor
EP0099856B1 (de) * 1982-06-24 1987-11-11 Ciba-Geigy Ag Photopolymerisierbares Beschichtungsmittel, photopolymerisierbares Material und seine Verwendung
DE3565013D1 (en) * 1984-02-10 1988-10-20 Ciba Geigy Ag Process for the preparation of a protection layer or a relief pattern
EP0265373B1 (de) * 1986-09-19 1991-03-13 Ciba-Geigy Ag Verfahren zur Härtung von Polyisocyanat-Beschichtungen
EP0294333B1 (de) * 1987-06-05 1993-03-17 Ciba-Geigy Ag Kationisch polymerisierbare Gemische enthaltend ausgewählte Härter

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5187028A (ja) * 1975-01-29 1976-07-30 Hitachi Ltd Handarejisutososeibutsu
JPS60184518A (ja) * 1984-02-10 1985-09-20 チバ‐ガイギー　アーゲー 硬化可能な組成物及びその使用法
JPS6290648A (ja) * 1985-09-23 1987-04-25 チバ−ガイギ−　アクチエンゲゼル　シヤフト 光重合性組成物、その光重合方法及び写真レリ−フ画像の形成方法
JPS6291934A (ja) * 1985-10-18 1987-04-27 Toyo Ink Mfg Co Ltd ソルダ−レジスト組成物

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0358050A (ja) * 1989-07-20 1991-03-13 Internatl Business Mach Corp <Ibm> 感光性組成物
CN1056641C (zh) * 1993-06-11 2000-09-20 大不列颠及北爱尔兰联合王国国防大臣 液晶材料、混合物及器件
JP2015135522A (ja) * 2015-04-13 2015-07-27 太陽インキ製造株式会社 ポジ型感光性樹脂組成物、ドライフィルム、硬化物及びプリント配線板

Also Published As

Publication number Publication date
EP0295211A2 (de) 1988-12-14
JP2597886B2 (ja) 1997-04-09
DE3888400D1 (de) 1994-04-21
EP0295211A3 (en) 1990-01-17
EP0295211B1 (de) 1994-03-16
US5124233A (en) 1992-06-23
CA1331926C (en) 1994-09-13
BR8802836A (pt) 1989-01-03

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