JPS6436082A - Manufacture of amorphous solar cell - Google Patents
Manufacture of amorphous solar cellInfo
- Publication number
- JPS6436082A JPS6436082A JP62191984A JP19198487A JPS6436082A JP S6436082 A JPS6436082 A JP S6436082A JP 62191984 A JP62191984 A JP 62191984A JP 19198487 A JP19198487 A JP 19198487A JP S6436082 A JPS6436082 A JP S6436082A
- Authority
- JP
- Japan
- Prior art keywords
- thickness
- transparent conductive
- conductive film
- film
- ito
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/548—Amorphous silicon PV cells
Abstract
PURPOSE:To patterning the transparent conductive film on the incident light side without using a resist by dipping and patterning only a first transparent conductive film in an etchant. CONSTITUTION:After depositing first an ITO (first transparent conductive film) 2 on a glass substrate 1 to a thickness of 2000Angstrom , a SnO2 (second transparent conductive film) 3 is deposited to a thickness of 200Angstrom . Then, using a knife edge (metal piece) of carbon steel as a scriber, the whole of the thickness of the deposited SnO2 film 3 and part of the thickness of the ITO film 2 are scribed off (4) with a predetermined pattern. Then, this is dipped in a strong hydrochrolic acid to remove the ITO film 2 left in the parts 4 of removal by the above scribing. Thereafter, an amorphous silicon (pi, n layer) 5 and an electrode 6 on the transmitted light side are formed in the respective predetermined patterns.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62191984A JPS6436082A (en) | 1987-07-31 | 1987-07-31 | Manufacture of amorphous solar cell |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62191984A JPS6436082A (en) | 1987-07-31 | 1987-07-31 | Manufacture of amorphous solar cell |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6436082A true JPS6436082A (en) | 1989-02-07 |
Family
ID=16283696
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62191984A Pending JPS6436082A (en) | 1987-07-31 | 1987-07-31 | Manufacture of amorphous solar cell |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6436082A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1998047183A1 (en) * | 1997-04-11 | 1998-10-22 | Robert Bosch Gmbh | Method for structuring transparent conductive layer |
WO2010135178A2 (en) * | 2009-05-20 | 2010-11-25 | Nanogram Corporation | Metal patterning for electrically conductive structures based on alloy formation |
JP5160565B2 (en) * | 2007-12-05 | 2013-03-13 | 株式会社カネカ | Integrated thin film photoelectric conversion device and manufacturing method thereof |
-
1987
- 1987-07-31 JP JP62191984A patent/JPS6436082A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1998047183A1 (en) * | 1997-04-11 | 1998-10-22 | Robert Bosch Gmbh | Method for structuring transparent conductive layer |
JP5160565B2 (en) * | 2007-12-05 | 2013-03-13 | 株式会社カネカ | Integrated thin film photoelectric conversion device and manufacturing method thereof |
WO2010135178A2 (en) * | 2009-05-20 | 2010-11-25 | Nanogram Corporation | Metal patterning for electrically conductive structures based on alloy formation |
WO2010135178A3 (en) * | 2009-05-20 | 2011-02-03 | Nanogram Corporation | Metal patterning for electrically conductive structures based on alloy formation |
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