JPS6431422A - Method of controlling plasma density - Google Patents

Method of controlling plasma density

Info

Publication number
JPS6431422A
JPS6431422A JP18847887A JP18847887A JPS6431422A JP S6431422 A JPS6431422 A JP S6431422A JP 18847887 A JP18847887 A JP 18847887A JP 18847887 A JP18847887 A JP 18847887A JP S6431422 A JPS6431422 A JP S6431422A
Authority
JP
Japan
Prior art keywords
probe
plasma
voltage
density
sticks
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18847887A
Other languages
Japanese (ja)
Other versions
JPH0828346B2 (en
Inventor
Sakae Handa
Minoru Sugawara
Yoshio Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Sagami Ltd
Original Assignee
Tokyo Electron Sagami Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Sagami Ltd filed Critical Tokyo Electron Sagami Ltd
Priority to JP62188478A priority Critical patent/JPH0828346B2/en
Publication of JPS6431422A publication Critical patent/JPS6431422A/en
Publication of JPH0828346B2 publication Critical patent/JPH0828346B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Abstract

PURPOSE:To measure the density of plasma at great speed, with high accuracy and obtain plasma that is always constant by removing a film which sticks to a probe prior to measurement of the density of plasma. CONSTITUTION:Heat treatment circuit 26 connecting to a probe 21 allows a heating current to flow into the probe 21 itself (through conductors 42a and 42b) and establishes a state of high temperature and then a film which sticks to the W-wire 46 surface of the probe 21 is removed. Next, the probe 21 is inserted into a plasma atmosphere. Then the probe voltage is impressed. The probe current corresponding to this voltage is converted into a voltage after its RF current composition is eliminated and its voltage is stored in a digital memory together with the probe voltage through an arithmetic circuit 35. Probe characteristics are inputted into a microcomputer through an interface (GP-IB) and the density of plasma and the like are obtained. As signals are sent to a plasma control circuit 37 by the value of density and the like and gas pressure or an RF electric power source 15 is controlled, plasma that is always constant is obtained.
JP62188478A 1987-07-28 1987-07-28 Plasma density control method Expired - Lifetime JPH0828346B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62188478A JPH0828346B2 (en) 1987-07-28 1987-07-28 Plasma density control method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62188478A JPH0828346B2 (en) 1987-07-28 1987-07-28 Plasma density control method

Publications (2)

Publication Number Publication Date
JPS6431422A true JPS6431422A (en) 1989-02-01
JPH0828346B2 JPH0828346B2 (en) 1996-03-21

Family

ID=16224430

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62188478A Expired - Lifetime JPH0828346B2 (en) 1987-07-28 1987-07-28 Plasma density control method

Country Status (1)

Country Link
JP (1) JPH0828346B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5211061A (en) * 1991-07-16 1993-05-18 Goodwin Jerry J Bolt clamping force sensor and clamping force validation method
EP0598128A1 (en) * 1991-08-05 1994-05-25 OHMI, Tadahiro Plasma processing apparatus

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58171821A (en) * 1982-03-31 1983-10-08 Matsushita Electric Ind Co Ltd Detection of contamination and purification degree in plasma processing and apparatus thereof

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58171821A (en) * 1982-03-31 1983-10-08 Matsushita Electric Ind Co Ltd Detection of contamination and purification degree in plasma processing and apparatus thereof

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5211061A (en) * 1991-07-16 1993-05-18 Goodwin Jerry J Bolt clamping force sensor and clamping force validation method
EP0598128A1 (en) * 1991-08-05 1994-05-25 OHMI, Tadahiro Plasma processing apparatus
EP0598128A4 (en) * 1991-08-05 1995-05-17 Tadahiro Ohmi Plasma processing apparatus.

Also Published As

Publication number Publication date
JPH0828346B2 (en) 1996-03-21

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