JPS6426611A - Halogen-containing polymer - Google Patents
Halogen-containing polymerInfo
- Publication number
- JPS6426611A JPS6426611A JP18229087A JP18229087A JPS6426611A JP S6426611 A JPS6426611 A JP S6426611A JP 18229087 A JP18229087 A JP 18229087A JP 18229087 A JP18229087 A JP 18229087A JP S6426611 A JPS6426611 A JP S6426611A
- Authority
- JP
- Japan
- Prior art keywords
- acid ester
- polymer
- alpha
- halogen
- acrylic acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
PURPOSE:To provide a novel polymer which is an acrylic acid ester polymer containing specific recurring unit and having halogen at alpha-position and trifluoromethyl group and benzene ring at the ester part and useful as a resist material, a water-repellent, an antifouling agent, a polymer modifier, etc. CONSTITUTION:The objective polymer is composed of a recurring unit of formula (X is halogen; R is H or lower alkyl; n is 20-20,000). The polymer can be produced by (1) synthesizing an acrylic acid ester e.g. by the reaction of acryloyl chloride with an alcohol corresponding to the ester to be prepared, (2) reacting the acrylic acid ester with chlorine gas to obtain an alpha,beta- dichloropropionic acid ester, (3) adding equimolar amount of pyridine to the reaction mixture, (4) subjecting the mixture to vacuum distillation or refluxing and then to filtration, extraction and column separation and (5) polymerizing the resultant alpha-chloroacrylic acid ester monomer.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18229087A JPS6426611A (en) | 1987-07-23 | 1987-07-23 | Halogen-containing polymer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18229087A JPS6426611A (en) | 1987-07-23 | 1987-07-23 | Halogen-containing polymer |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6426611A true JPS6426611A (en) | 1989-01-27 |
Family
ID=16115696
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP18229087A Pending JPS6426611A (en) | 1987-07-23 | 1987-07-23 | Halogen-containing polymer |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6426611A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5526455A (en) * | 1993-09-17 | 1996-06-11 | Sumitomo Electric Industries, Ltd. | Connector including opposing lens surfaces, side surfaces, and contact surfaces for coupling optical devices |
KR20020032025A (en) * | 2000-10-25 | 2002-05-03 | 박종섭 | Photoresist monomer comprising bisphenol derivative and polymer thereof |
JP2018154754A (en) * | 2017-03-17 | 2018-10-04 | 日本ゼオン株式会社 | Copolymer and positive resist composition |
WO2020066806A1 (en) | 2018-09-25 | 2020-04-02 | 日本ゼオン株式会社 | Copolymer and positive resist composition |
WO2021261297A1 (en) * | 2020-06-22 | 2021-12-30 | 日本ゼオン株式会社 | Copolymer, positive resist composition, and method for forming resist pattern |
-
1987
- 1987-07-23 JP JP18229087A patent/JPS6426611A/en active Pending
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5526455A (en) * | 1993-09-17 | 1996-06-11 | Sumitomo Electric Industries, Ltd. | Connector including opposing lens surfaces, side surfaces, and contact surfaces for coupling optical devices |
KR20020032025A (en) * | 2000-10-25 | 2002-05-03 | 박종섭 | Photoresist monomer comprising bisphenol derivative and polymer thereof |
JP2018154754A (en) * | 2017-03-17 | 2018-10-04 | 日本ゼオン株式会社 | Copolymer and positive resist composition |
WO2020066806A1 (en) | 2018-09-25 | 2020-04-02 | 日本ゼオン株式会社 | Copolymer and positive resist composition |
KR20210064190A (en) | 2018-09-25 | 2021-06-02 | 니폰 제온 가부시키가이샤 | Copolymer and positive resist composition |
US11919985B2 (en) | 2018-09-25 | 2024-03-05 | Zeon Corporation | Copolymer and positive resist composition |
WO2021261297A1 (en) * | 2020-06-22 | 2021-12-30 | 日本ゼオン株式会社 | Copolymer, positive resist composition, and method for forming resist pattern |
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