JPS6426611A - Halogen-containing polymer - Google Patents

Halogen-containing polymer

Info

Publication number
JPS6426611A
JPS6426611A JP18229087A JP18229087A JPS6426611A JP S6426611 A JPS6426611 A JP S6426611A JP 18229087 A JP18229087 A JP 18229087A JP 18229087 A JP18229087 A JP 18229087A JP S6426611 A JPS6426611 A JP S6426611A
Authority
JP
Japan
Prior art keywords
acid ester
polymer
alpha
halogen
acrylic acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18229087A
Other languages
Japanese (ja)
Inventor
Kouzaburou Matsumura
Toru Kiyota
Tsuneko Nakazawa
Yoshitaka Tsutsumi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tosoh Corp
Original Assignee
Tosoh Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tosoh Corp filed Critical Tosoh Corp
Priority to JP18229087A priority Critical patent/JPS6426611A/en
Publication of JPS6426611A publication Critical patent/JPS6426611A/en
Pending legal-status Critical Current

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  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

PURPOSE:To provide a novel polymer which is an acrylic acid ester polymer containing specific recurring unit and having halogen at alpha-position and trifluoromethyl group and benzene ring at the ester part and useful as a resist material, a water-repellent, an antifouling agent, a polymer modifier, etc. CONSTITUTION:The objective polymer is composed of a recurring unit of formula (X is halogen; R is H or lower alkyl; n is 20-20,000). The polymer can be produced by (1) synthesizing an acrylic acid ester e.g. by the reaction of acryloyl chloride with an alcohol corresponding to the ester to be prepared, (2) reacting the acrylic acid ester with chlorine gas to obtain an alpha,beta- dichloropropionic acid ester, (3) adding equimolar amount of pyridine to the reaction mixture, (4) subjecting the mixture to vacuum distillation or refluxing and then to filtration, extraction and column separation and (5) polymerizing the resultant alpha-chloroacrylic acid ester monomer.
JP18229087A 1987-07-23 1987-07-23 Halogen-containing polymer Pending JPS6426611A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18229087A JPS6426611A (en) 1987-07-23 1987-07-23 Halogen-containing polymer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18229087A JPS6426611A (en) 1987-07-23 1987-07-23 Halogen-containing polymer

Publications (1)

Publication Number Publication Date
JPS6426611A true JPS6426611A (en) 1989-01-27

Family

ID=16115696

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18229087A Pending JPS6426611A (en) 1987-07-23 1987-07-23 Halogen-containing polymer

Country Status (1)

Country Link
JP (1) JPS6426611A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5526455A (en) * 1993-09-17 1996-06-11 Sumitomo Electric Industries, Ltd. Connector including opposing lens surfaces, side surfaces, and contact surfaces for coupling optical devices
KR20020032025A (en) * 2000-10-25 2002-05-03 박종섭 Photoresist monomer comprising bisphenol derivative and polymer thereof
JP2018154754A (en) * 2017-03-17 2018-10-04 日本ゼオン株式会社 Copolymer and positive resist composition
WO2020066806A1 (en) 2018-09-25 2020-04-02 日本ゼオン株式会社 Copolymer and positive resist composition
WO2021261297A1 (en) * 2020-06-22 2021-12-30 日本ゼオン株式会社 Copolymer, positive resist composition, and method for forming resist pattern

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5526455A (en) * 1993-09-17 1996-06-11 Sumitomo Electric Industries, Ltd. Connector including opposing lens surfaces, side surfaces, and contact surfaces for coupling optical devices
KR20020032025A (en) * 2000-10-25 2002-05-03 박종섭 Photoresist monomer comprising bisphenol derivative and polymer thereof
JP2018154754A (en) * 2017-03-17 2018-10-04 日本ゼオン株式会社 Copolymer and positive resist composition
WO2020066806A1 (en) 2018-09-25 2020-04-02 日本ゼオン株式会社 Copolymer and positive resist composition
KR20210064190A (en) 2018-09-25 2021-06-02 니폰 제온 가부시키가이샤 Copolymer and positive resist composition
US11919985B2 (en) 2018-09-25 2024-03-05 Zeon Corporation Copolymer and positive resist composition
WO2021261297A1 (en) * 2020-06-22 2021-12-30 日本ゼオン株式会社 Copolymer, positive resist composition, and method for forming resist pattern

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