JPS6425975A - Preparation and production of raw material powder of sputtering target for producing oxide thin film - Google Patents

Preparation and production of raw material powder of sputtering target for producing oxide thin film

Info

Publication number
JPS6425975A
JPS6425975A JP62180153A JP18015387A JPS6425975A JP S6425975 A JPS6425975 A JP S6425975A JP 62180153 A JP62180153 A JP 62180153A JP 18015387 A JP18015387 A JP 18015387A JP S6425975 A JPS6425975 A JP S6425975A
Authority
JP
Japan
Prior art keywords
raw material
powder
contg
atmosphere
material powder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62180153A
Other languages
English (en)
Other versions
JPH086174B2 (ja
Inventor
Hideo Ihara
Shizuka Yoshii
Hiroshi Daimon
Kazuhiro Fujii
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Ube Corp
Original Assignee
Agency of Industrial Science and Technology
Ube Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology, Ube Industries Ltd filed Critical Agency of Industrial Science and Technology
Priority to JP62180153A priority Critical patent/JPH086174B2/ja
Publication of JPS6425975A publication Critical patent/JPS6425975A/ja
Publication of JPH086174B2 publication Critical patent/JPH086174B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E40/00Technologies for an efficient electrical power generation, transmission or distribution
    • Y02E40/60Superconducting electric elements or equipment; Power systems integrating superconducting elements or equipment

Landscapes

  • Inorganic Compounds Of Heavy Metals (AREA)
  • Physical Vapour Deposition (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)
  • Compositions Of Oxide Ceramics (AREA)
JP62180153A 1987-07-21 1987-07-21 酸化物薄膜製造用スパツタリングタ−ゲツトの原料粉末調製法及びその製造法 Expired - Lifetime JPH086174B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62180153A JPH086174B2 (ja) 1987-07-21 1987-07-21 酸化物薄膜製造用スパツタリングタ−ゲツトの原料粉末調製法及びその製造法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62180153A JPH086174B2 (ja) 1987-07-21 1987-07-21 酸化物薄膜製造用スパツタリングタ−ゲツトの原料粉末調製法及びその製造法

Publications (2)

Publication Number Publication Date
JPS6425975A true JPS6425975A (en) 1989-01-27
JPH086174B2 JPH086174B2 (ja) 1996-01-24

Family

ID=16078324

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62180153A Expired - Lifetime JPH086174B2 (ja) 1987-07-21 1987-07-21 酸化物薄膜製造用スパツタリングタ−ゲツトの原料粉末調製法及びその製造法

Country Status (1)

Country Link
JP (1) JPH086174B2 (ja)

Also Published As

Publication number Publication date
JPH086174B2 (ja) 1996-01-24

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term