JPS6425971A - Steel product plated with al-si alloy by vacuum deposition and having high corrosion resistance and production thereof - Google Patents

Steel product plated with al-si alloy by vacuum deposition and having high corrosion resistance and production thereof

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Publication number
JPS6425971A
JPS6425971A JP17984687A JP17984687A JPS6425971A JP S6425971 A JPS6425971 A JP S6425971A JP 17984687 A JP17984687 A JP 17984687A JP 17984687 A JP17984687 A JP 17984687A JP S6425971 A JPS6425971 A JP S6425971A
Authority
JP
Japan
Prior art keywords
vacuum deposition
corrosion resistance
alloy
steel
steel product
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17984687A
Other languages
Japanese (ja)
Inventor
Kazutoshi Shimogoori
Hiroshi Sato
Masao Toyama
Hidetoshi Nishimoto
Tsugumoto Ikeda
Jiyunji Kawafuku
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kobe Steel Ltd
Original Assignee
Kobe Steel Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kobe Steel Ltd filed Critical Kobe Steel Ltd
Priority to JP17984687A priority Critical patent/JPS6425971A/en
Publication of JPS6425971A publication Critical patent/JPS6425971A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To obtain the titled steel product having superior corrosion resistance, adhesion and formability by forming an Al-Si alloy plating layer having a specified compsn. and quality on steel by vacuum deposition. CONSTITUTION:Al and Si are separately evaporated at <=10<-2>Torr degree of vacuum to form an Al-Si alloy plating layer having a desired compsn. contg. 1-50% Si on steel by vacuum deposition. The plating layer does not contain brittle Fe-Al intermetallic compds. such as Fe2Al5 and the thickness is >=0.1mum. An underlayer of pure Al having >=0.01mum thickness may be previously formed on the steel by plating as required.
JP17984687A 1987-07-18 1987-07-18 Steel product plated with al-si alloy by vacuum deposition and having high corrosion resistance and production thereof Pending JPS6425971A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17984687A JPS6425971A (en) 1987-07-18 1987-07-18 Steel product plated with al-si alloy by vacuum deposition and having high corrosion resistance and production thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17984687A JPS6425971A (en) 1987-07-18 1987-07-18 Steel product plated with al-si alloy by vacuum deposition and having high corrosion resistance and production thereof

Publications (1)

Publication Number Publication Date
JPS6425971A true JPS6425971A (en) 1989-01-27

Family

ID=16072928

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17984687A Pending JPS6425971A (en) 1987-07-18 1987-07-18 Steel product plated with al-si alloy by vacuum deposition and having high corrosion resistance and production thereof

Country Status (1)

Country Link
JP (1) JPS6425971A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5573969A (en) * 1994-01-19 1996-11-12 Hyundai Electronics Industries Co., Ltd. Method for fabrication of CMOS devices having minimized drain contact area
KR100689157B1 (en) * 2005-10-12 2007-03-02 주식회사 포스코 Manufacturing method of al-si alloy films

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5573969A (en) * 1994-01-19 1996-11-12 Hyundai Electronics Industries Co., Ltd. Method for fabrication of CMOS devices having minimized drain contact area
KR100689157B1 (en) * 2005-10-12 2007-03-02 주식회사 포스코 Manufacturing method of al-si alloy films

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