JPS6425418A - Method of monitoring plasma etching - Google Patents
Method of monitoring plasma etchingInfo
- Publication number
- JPS6425418A JPS6425418A JP18149387A JP18149387A JPS6425418A JP S6425418 A JPS6425418 A JP S6425418A JP 18149387 A JP18149387 A JP 18149387A JP 18149387 A JP18149387 A JP 18149387A JP S6425418 A JPS6425418 A JP S6425418A
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- temperature
- lights
- wavelengths
- density
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Drying Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18149387A JPS6425418A (en) | 1987-07-21 | 1987-07-21 | Method of monitoring plasma etching |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18149387A JPS6425418A (en) | 1987-07-21 | 1987-07-21 | Method of monitoring plasma etching |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6425418A true JPS6425418A (en) | 1989-01-27 |
Family
ID=16101720
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP18149387A Pending JPS6425418A (en) | 1987-07-21 | 1987-07-21 | Method of monitoring plasma etching |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6425418A (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5374327A (en) * | 1992-04-28 | 1994-12-20 | Tokyo Electron Limited | Plasma processing method |
US5775836A (en) * | 1996-03-05 | 1998-07-07 | Dean, Jr.; Americo | Capping device for uniform capping of subaquatic sediments |
-
1987
- 1987-07-21 JP JP18149387A patent/JPS6425418A/ja active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5374327A (en) * | 1992-04-28 | 1994-12-20 | Tokyo Electron Limited | Plasma processing method |
US5775836A (en) * | 1996-03-05 | 1998-07-07 | Dean, Jr.; Americo | Capping device for uniform capping of subaquatic sediments |
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