JPS6424320A - Superconductive thin film forming device - Google Patents

Superconductive thin film forming device

Info

Publication number
JPS6424320A
JPS6424320A JP62181887A JP18188787A JPS6424320A JP S6424320 A JPS6424320 A JP S6424320A JP 62181887 A JP62181887 A JP 62181887A JP 18188787 A JP18188787 A JP 18188787A JP S6424320 A JPS6424320 A JP S6424320A
Authority
JP
Japan
Prior art keywords
pressure
vacuum tank
vacuum
gas
thin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62181887A
Other languages
Japanese (ja)
Other versions
JP2584633B2 (en
Inventor
Shinji Osako
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Anelva Corp
Original Assignee
Anelva Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Anelva Corp filed Critical Anelva Corp
Priority to JP62181887A priority Critical patent/JP2584633B2/en
Publication of JPS6424320A publication Critical patent/JPS6424320A/en
Application granted granted Critical
Publication of JP2584633B2 publication Critical patent/JP2584633B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To form a superconductive thin film with the desired composition ratio by monitoring the gas pressure in a vacuum tank, comparing the measured value of the pressure in the vacuum tank with the preset value of the pressure in the vacuum tank preset in advance, and controlling the pressure in the vacuum tank. CONSTITUTION:In addition to the control of the evaporating speed of a superconductive material, the pressure signal in a vacuum tank 11 monitored by a vacuum measuring piece 1 and a vacuum meter 2 is sent to a pressure adjuster 3, and the measured value of the pressure in the vacuum tank 11 when a film is formed is compared with the preset value of the pressure in the vacuum tank 11 inputted to the pressure adjuster 3 in advance as the optimum value. If there is a difference between the measured value and the preset value, a comparison signal is sent to a gas guiding means 4 such as a gas flow adjuster or a variable flow leak valve or an exhaust speed variable unit 8 adjusting the exhaust speed of a vacuum pump so that the measured value matches with the preset value. The gas guide quantity or the gas exhaust speed is adjusted, and the optimum pressure is obtained. A superconductive thin film with the desired composition ratio can be thereby formed.
JP62181887A 1987-07-20 1987-07-20 Superconducting thin film production equipment Expired - Lifetime JP2584633B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62181887A JP2584633B2 (en) 1987-07-20 1987-07-20 Superconducting thin film production equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62181887A JP2584633B2 (en) 1987-07-20 1987-07-20 Superconducting thin film production equipment

Publications (2)

Publication Number Publication Date
JPS6424320A true JPS6424320A (en) 1989-01-26
JP2584633B2 JP2584633B2 (en) 1997-02-26

Family

ID=16108614

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62181887A Expired - Lifetime JP2584633B2 (en) 1987-07-20 1987-07-20 Superconducting thin film production equipment

Country Status (1)

Country Link
JP (1) JP2584633B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110200450A1 (en) * 2010-02-16 2011-08-18 Edwards Limited Apparatus and method for tuning pump speed

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5358487A (en) * 1976-11-08 1978-05-26 Hitachi Ltd Decompressive gas phase reaction apparatus
JPS5710323A (en) * 1980-05-20 1982-01-19 Schumacher Co J C Chemical vapor distributing system

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5358487A (en) * 1976-11-08 1978-05-26 Hitachi Ltd Decompressive gas phase reaction apparatus
JPS5710323A (en) * 1980-05-20 1982-01-19 Schumacher Co J C Chemical vapor distributing system

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110200450A1 (en) * 2010-02-16 2011-08-18 Edwards Limited Apparatus and method for tuning pump speed
US8657584B2 (en) * 2010-02-16 2014-02-25 Edwards Limited Apparatus and method for tuning pump speed

Also Published As

Publication number Publication date
JP2584633B2 (en) 1997-02-26

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