JPS6422082A - High frequency discharge excitation laser equipment - Google Patents

High frequency discharge excitation laser equipment

Info

Publication number
JPS6422082A
JPS6422082A JP17857287A JP17857287A JPS6422082A JP S6422082 A JPS6422082 A JP S6422082A JP 17857287 A JP17857287 A JP 17857287A JP 17857287 A JP17857287 A JP 17857287A JP S6422082 A JPS6422082 A JP S6422082A
Authority
JP
Japan
Prior art keywords
high frequency
discharge tube
matching circuit
power supply
frequency power
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP17857287A
Other languages
Japanese (ja)
Other versions
JP2796295B2 (en
Inventor
Akira Egawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fanuc Corp
Original Assignee
Fanuc Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fanuc Corp filed Critical Fanuc Corp
Priority to JP62178572A priority Critical patent/JP2796295B2/en
Priority to US07/329,790 priority patent/US4937834A/en
Priority to EP88906098A priority patent/EP0331734B1/en
Priority to DE88906098T priority patent/DE3884790T2/en
Priority to PCT/JP1988/000710 priority patent/WO1989000776A1/en
Publication of JPS6422082A publication Critical patent/JPS6422082A/en
Application granted granted Critical
Publication of JP2796295B2 publication Critical patent/JP2796295B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0975—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser using inductive or capacitive excitation

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)

Abstract

PURPOSE:To enable the stable high frequency discharge excitation, by connecting the middle point of reactances of a matching circuit seen from a discharge tube to the earth point of a high frequency circuit, insulating the matching circuit from a high frequency power supply in the DC manner, and making it not be connected to the earth point of the high frequency circuit. CONSTITUTION:A matching circuit 16 to match a high frequency power supply 12 with a discharge tube 1 is constituted of inductances L1, L2 and capacitors C1, C2, C3. The middle point between the capacitors C1 and C2 is earthed. Thereby, the interference between segments of the discharge tube can be prevented. Since the matching circuit 16 is a balanced network, the same effects are obtained even if any point is earthed, in the case where the impedance seeing the high frequency power supply 12 from the discharge tube is divided into two part. T1 is an insulating transformer, and an electrode 8b is not earthed when the high frequency power supply 12 and the matching circuit 16 are mutually insulated in the DC manner. According to this constitution, there is no loop in which a mutual current flows, so that the current interference between the segments of the discharge tube can be prevented.
JP62178572A 1987-07-17 1987-07-17 High frequency discharge pumped laser device Expired - Fee Related JP2796295B2 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP62178572A JP2796295B2 (en) 1987-07-17 1987-07-17 High frequency discharge pumped laser device
US07/329,790 US4937834A (en) 1987-07-17 1988-07-15 High-frequency discharge pumping laser device
EP88906098A EP0331734B1 (en) 1987-07-17 1988-07-15 R-f discharge-excited laser
DE88906098T DE3884790T2 (en) 1987-07-17 1988-07-15 LASER EXTENDED BY HF DISCHARGE.
PCT/JP1988/000710 WO1989000776A1 (en) 1987-07-17 1988-07-15 R-f discharge-excited laser

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62178572A JP2796295B2 (en) 1987-07-17 1987-07-17 High frequency discharge pumped laser device

Publications (2)

Publication Number Publication Date
JPS6422082A true JPS6422082A (en) 1989-01-25
JP2796295B2 JP2796295B2 (en) 1998-09-10

Family

ID=16050824

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62178572A Expired - Fee Related JP2796295B2 (en) 1987-07-17 1987-07-17 High frequency discharge pumped laser device

Country Status (1)

Country Link
JP (1) JP2796295B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03250677A (en) * 1990-02-28 1991-11-08 Toshiba Corp Laser device
JP2017073420A (en) * 2015-10-05 2017-04-13 ファナック株式会社 Gas laser generator with auxiliary electrode

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6035836A (en) * 1983-08-05 1985-02-23 Nec Corp Intermediate frequency amplifier
JPS60177692A (en) * 1984-02-24 1985-09-11 Mitsubishi Electric Corp Laser oscillator
JPS6179724A (en) * 1984-09-28 1986-04-23 Nippon Kokan Kk <Nkk> Manufacture of thin plate of high-silicon iron alloy
JPS61208883A (en) * 1985-03-14 1986-09-17 Toshiba Corp Alternate current discharge type gas laser apparatus

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6035836A (en) * 1983-08-05 1985-02-23 Nec Corp Intermediate frequency amplifier
JPS60177692A (en) * 1984-02-24 1985-09-11 Mitsubishi Electric Corp Laser oscillator
JPS6179724A (en) * 1984-09-28 1986-04-23 Nippon Kokan Kk <Nkk> Manufacture of thin plate of high-silicon iron alloy
JPS61208883A (en) * 1985-03-14 1986-09-17 Toshiba Corp Alternate current discharge type gas laser apparatus

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03250677A (en) * 1990-02-28 1991-11-08 Toshiba Corp Laser device
JP2017073420A (en) * 2015-10-05 2017-04-13 ファナック株式会社 Gas laser generator with auxiliary electrode
US9819139B2 (en) 2015-10-05 2017-11-14 Fanuc Corporation Gas laser oscillator having auxiliary electrodes

Also Published As

Publication number Publication date
JP2796295B2 (en) 1998-09-10

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Legal Events

Date Code Title Description
R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees