JPS6420618A - Device for editing mask pattern input - Google Patents

Device for editing mask pattern input

Info

Publication number
JPS6420618A
JPS6420618A JP62176186A JP17618687A JPS6420618A JP S6420618 A JPS6420618 A JP S6420618A JP 62176186 A JP62176186 A JP 62176186A JP 17618687 A JP17618687 A JP 17618687A JP S6420618 A JPS6420618 A JP S6420618A
Authority
JP
Japan
Prior art keywords
mask pattern
input
editor
pattern
energy distribution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62176186A
Other languages
Japanese (ja)
Inventor
Kazuji Ikeda
Yoshihiko Hirai
Sadafumi Tomita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP62176186A priority Critical patent/JPS6420618A/en
Publication of JPS6420618A publication Critical patent/JPS6420618A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To efficiently obtain a corrected mask pattern by composing a mask pattern input editor of electron beam exposing mask pattern input editing means used for manufacturing a VLSI, calculating means for energy distribution of electrons irradiated through the pattern, lost in a resist, and display means therefor. CONSTITUTION:A mask pattern input editor 1 inputs new input of position information of a mask pattern, new position information for input mask pattern, corrects and stores position information of the mask pattern information. An energy distribution calculator 2 calculates energy distribution stored in a resist from the trace of incident electrons by a Monte-Carlo method on the basis of mask information input and edited in the editor 1. A display unit 3 simultaneously displays the pattern edited by the editor 1 and the calculated result obtained by the calculator 2. Thus, a proximity effect in the fine mask pattern is suitably corrected while predicting it in advance.
JP62176186A 1987-07-15 1987-07-15 Device for editing mask pattern input Pending JPS6420618A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62176186A JPS6420618A (en) 1987-07-15 1987-07-15 Device for editing mask pattern input

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62176186A JPS6420618A (en) 1987-07-15 1987-07-15 Device for editing mask pattern input

Publications (1)

Publication Number Publication Date
JPS6420618A true JPS6420618A (en) 1989-01-24

Family

ID=16009153

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62176186A Pending JPS6420618A (en) 1987-07-15 1987-07-15 Device for editing mask pattern input

Country Status (1)

Country Link
JP (1) JPS6420618A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03175614A (en) * 1989-12-04 1991-07-30 Fujitsu Ltd Data processing method and data controlling method for automatic lsi designing system
JP2006343587A (en) * 2005-06-09 2006-12-21 Toshiba Corp Method for creating evaluation pattern, and program

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03175614A (en) * 1989-12-04 1991-07-30 Fujitsu Ltd Data processing method and data controlling method for automatic lsi designing system
JP2006343587A (en) * 2005-06-09 2006-12-21 Toshiba Corp Method for creating evaluation pattern, and program

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