JPS6420434A - Ion etching device - Google Patents

Ion etching device

Info

Publication number
JPS6420434A
JPS6420434A JP62177870A JP17787087A JPS6420434A JP S6420434 A JPS6420434 A JP S6420434A JP 62177870 A JP62177870 A JP 62177870A JP 17787087 A JP17787087 A JP 17787087A JP S6420434 A JPS6420434 A JP S6420434A
Authority
JP
Japan
Prior art keywords
sample
vessel
shielding member
cylindrical shielding
arrive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62177870A
Other languages
Japanese (ja)
Other versions
JP2581695B2 (en
Inventor
Shigehiro Mitamura
Yoshiaki Okui
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimadzu Corp
Original Assignee
Shimadzu Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corp filed Critical Shimadzu Corp
Priority to JP62177870A priority Critical patent/JP2581695B2/en
Publication of JPS6420434A publication Critical patent/JPS6420434A/en
Application granted granted Critical
Publication of JP2581695B2 publication Critical patent/JP2581695B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

PURPOSE:To prevent the contamination by the secondary radioactive material generated except from a sample by utilizing a carbon graphite which has a low etching rate and ionization rate to prevent ions from coming into contact with the base and side walls of a vessel. CONSTITUTION:A bottomed cylindrical shielding member 3 formed of the carbon graphite is disposed in the lower part in the vessel. The gaseous argon ions A1, A5 biased from the sample S arrive at the base of the cylindrical shielding member 3 and the gaseous argon ions A2, A4 bounced from the surface of the sample S arrive at the peripheral wall of the cylindrical shielding member 3 and are so shielded as not to come into contact with the wall surface, etc., of the vessel 1. The cylindrical shielding member 3' enclosing ion beams is mounted to the exit port of an ion gun 2 to shield the spacing between the exit port and the side walls of the vessel 1. The evaporation or ionization of the elements except the sample S by receiving etching and the consequent hindrance of the analysis by vapor deposition on the sample S are, therefore, prevented.
JP62177870A 1987-07-15 1987-07-15 Ion etching equipment Expired - Lifetime JP2581695B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62177870A JP2581695B2 (en) 1987-07-15 1987-07-15 Ion etching equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62177870A JP2581695B2 (en) 1987-07-15 1987-07-15 Ion etching equipment

Publications (2)

Publication Number Publication Date
JPS6420434A true JPS6420434A (en) 1989-01-24
JP2581695B2 JP2581695B2 (en) 1997-02-12

Family

ID=16038503

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62177870A Expired - Lifetime JP2581695B2 (en) 1987-07-15 1987-07-15 Ion etching equipment

Country Status (1)

Country Link
JP (1) JP2581695B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6121943A (en) * 1995-07-04 2000-09-19 Denso Corporation Electroluminescent display with constant current control circuits in scan electrode circuit
JP2012156077A (en) * 2011-01-28 2012-08-16 Hitachi High-Technologies Corp Ion milling apparatus

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54145592A (en) * 1978-05-04 1979-11-13 Mitsubishi Electric Corp X-ray analyzer
JPS56125650A (en) * 1980-03-07 1981-10-02 Hitachi Ltd Sample holding device
JPS61135460U (en) * 1985-02-14 1986-08-23

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54145592A (en) * 1978-05-04 1979-11-13 Mitsubishi Electric Corp X-ray analyzer
JPS56125650A (en) * 1980-03-07 1981-10-02 Hitachi Ltd Sample holding device
JPS61135460U (en) * 1985-02-14 1986-08-23

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6121943A (en) * 1995-07-04 2000-09-19 Denso Corporation Electroluminescent display with constant current control circuits in scan electrode circuit
JP2012156077A (en) * 2011-01-28 2012-08-16 Hitachi High-Technologies Corp Ion milling apparatus

Also Published As

Publication number Publication date
JP2581695B2 (en) 1997-02-12

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