JPS6416831A - Solution of heat-resistant photosensitive material - Google Patents

Solution of heat-resistant photosensitive material

Info

Publication number
JPS6416831A
JPS6416831A JP17191987A JP17191987A JPS6416831A JP S6416831 A JPS6416831 A JP S6416831A JP 17191987 A JP17191987 A JP 17191987A JP 17191987 A JP17191987 A JP 17191987A JP S6416831 A JPS6416831 A JP S6416831A
Authority
JP
Japan
Prior art keywords
formula
polyamic acid
solution
contg
diamine
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17191987A
Other languages
English (en)
Inventor
Koichi Kunimune
Suketoshi Maeda
Shiro Konotsune
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JNC Corp
Original Assignee
Chisso Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chisso Corp filed Critical Chisso Corp
Priority to JP17191987A priority Critical patent/JPS6416831A/ja
Publication of JPS6416831A publication Critical patent/JPS6416831A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
JP17191987A 1987-07-09 1987-07-09 Solution of heat-resistant photosensitive material Pending JPS6416831A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17191987A JPS6416831A (en) 1987-07-09 1987-07-09 Solution of heat-resistant photosensitive material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17191987A JPS6416831A (en) 1987-07-09 1987-07-09 Solution of heat-resistant photosensitive material

Publications (1)

Publication Number Publication Date
JPS6416831A true JPS6416831A (en) 1989-01-20

Family

ID=15932276

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17191987A Pending JPS6416831A (en) 1987-07-09 1987-07-09 Solution of heat-resistant photosensitive material

Country Status (1)

Country Link
JP (1) JPS6416831A (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03275722A (ja) * 1990-03-23 1991-12-06 Shin Etsu Chem Co Ltd 硬化性樹脂及びその製造方法
GB2275475A (en) * 1993-02-25 1994-08-31 Chisso Corp Photosensitive resin composition

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03275722A (ja) * 1990-03-23 1991-12-06 Shin Etsu Chem Co Ltd 硬化性樹脂及びその製造方法
GB2275475A (en) * 1993-02-25 1994-08-31 Chisso Corp Photosensitive resin composition
GB2275475B (en) * 1993-02-25 1996-07-31 Chisso Corp Photosensitive resin composition

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