JPS6415369A - Target for sputtering - Google Patents

Target for sputtering

Info

Publication number
JPS6415369A
JPS6415369A JP17033887A JP17033887A JPS6415369A JP S6415369 A JPS6415369 A JP S6415369A JP 17033887 A JP17033887 A JP 17033887A JP 17033887 A JP17033887 A JP 17033887A JP S6415369 A JPS6415369 A JP S6415369A
Authority
JP
Japan
Prior art keywords
target
alloy
contg
nonmagnetic
prescribed position
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17033887A
Other languages
Japanese (ja)
Inventor
Hirotoshi Niwa
Takashi Iguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daicel Corp
Original Assignee
Daicel Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daicel Chemical Industries Ltd filed Critical Daicel Chemical Industries Ltd
Priority to JP17033887A priority Critical patent/JPS6415369A/en
Publication of JPS6415369A publication Critical patent/JPS6415369A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Thin Magnetic Films (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To obtain the titled target enabling the formation of an amorphous perpendicularly magnetizable film contg. TM and RE at a low cost by embedding chips or a beltlike body made of an alloy for magneto-optical disk recording in a prescribed position of a nonmagnetic substrate. CONSTITUTION:Chips or a beltlike body 2 made of an alloy for magneto-optical disk recording such as a TM-RE alloy contg. one or more among Fe, Ni and Co and one or more among Gd, Tb, Dy and Nd is embedded in a prescribed position of a nonmagnetic target substrate 1 contg. at least one among Fe, Ni and Co to obtain the titled target 1, 2. The prescribed position may be a part which is efficiently sputtered. The target 1, 2 is set so that magnets 3 are positioned under the nonmagnetic target substrate 1 and sputtering is carried out.
JP17033887A 1987-07-08 1987-07-08 Target for sputtering Pending JPS6415369A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17033887A JPS6415369A (en) 1987-07-08 1987-07-08 Target for sputtering

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17033887A JPS6415369A (en) 1987-07-08 1987-07-08 Target for sputtering

Publications (1)

Publication Number Publication Date
JPS6415369A true JPS6415369A (en) 1989-01-19

Family

ID=15903076

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17033887A Pending JPS6415369A (en) 1987-07-08 1987-07-08 Target for sputtering

Country Status (1)

Country Link
JP (1) JPS6415369A (en)

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