JPS6411969A - Sputtering device - Google Patents

Sputtering device

Info

Publication number
JPS6411969A
JPS6411969A JP16535187A JP16535187A JPS6411969A JP S6411969 A JPS6411969 A JP S6411969A JP 16535187 A JP16535187 A JP 16535187A JP 16535187 A JP16535187 A JP 16535187A JP S6411969 A JPS6411969 A JP S6411969A
Authority
JP
Japan
Prior art keywords
permanent magnet
magnetic metal
target
magnetron sputtering
peripheral part
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16535187A
Other languages
Japanese (ja)
Inventor
Yukio Nakagawa
Yoichi Oshita
Hidetsugu Setoyama
Kenichi Natsui
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP16535187A priority Critical patent/JPS6411969A/en
Publication of JPS6411969A publication Critical patent/JPS6411969A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To reduce the quantity of permanent magnets and the manufacturing cost by arranging a magnetic metal on the inside of a permanent magnet on the reverse side of a target in a magnetron sputtering devise and bringing one end of the magnetic metal into contact with a permanent magnet to be magnetized. CONSTITUTION:When a permanent magnet for the center part and a permanent magnet for the peripheral part are arranged on the reverse side of target 2 as a film forming material to a base 3 in a magnetron sputtering device, Fe or other magnetic metal 6 on behalf of the permanent magnet for the center part is arranged, the magnetic metal 6 is magnetized by bringing its one end into contact with the permanent magnet 5 for the external peripheral part and at the same time, the part facing the target 2 of the magnetic metal 6 is operated as a magnetic pole. A permanent magnet of past complicated form composed of a permanent magnet for the peripheral part and a permanent magnet for the central part is not required, part of a permanent magnet on the rear of a target for a magnetron sputtering is substituted by a magnetic metal and, accordingly, the structure of permanent magnet is simplified and the cost of the permanent magnet also can be drastically reduced.
JP16535187A 1987-07-03 1987-07-03 Sputtering device Pending JPS6411969A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16535187A JPS6411969A (en) 1987-07-03 1987-07-03 Sputtering device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16535187A JPS6411969A (en) 1987-07-03 1987-07-03 Sputtering device

Publications (1)

Publication Number Publication Date
JPS6411969A true JPS6411969A (en) 1989-01-17

Family

ID=15810709

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16535187A Pending JPS6411969A (en) 1987-07-03 1987-07-03 Sputtering device

Country Status (1)

Country Link
JP (1) JPS6411969A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006224989A (en) * 2005-02-17 2006-08-31 Casio Comput Co Ltd Fuel container

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006224989A (en) * 2005-02-17 2006-08-31 Casio Comput Co Ltd Fuel container

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