JPS6411936B2 - - Google Patents

Info

Publication number
JPS6411936B2
JPS6411936B2 JP56205876A JP20587681A JPS6411936B2 JP S6411936 B2 JPS6411936 B2 JP S6411936B2 JP 56205876 A JP56205876 A JP 56205876A JP 20587681 A JP20587681 A JP 20587681A JP S6411936 B2 JPS6411936 B2 JP S6411936B2
Authority
JP
Japan
Prior art keywords
group
carbon atoms
copolymer
general formula
methyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56205876A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58106535A (ja
Inventor
Tsuneo Fujii
Hiroshi Inukai
Takayuki Deguchi
Toshihiko Amano
Masami Kakuchi
Hiroshi Asakawa
Osamu Kogure
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daikin Industries Ltd
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Daikin Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp, Daikin Kogyo Co Ltd filed Critical Nippon Telegraph and Telephone Corp
Priority to JP56205876A priority Critical patent/JPS58106535A/ja
Priority to DE8282111725T priority patent/DE3279090D1/de
Priority to CA000418004A priority patent/CA1207099A/en
Priority to US06/450,726 priority patent/US4539250A/en
Priority to EP82111725A priority patent/EP0090089B1/en
Publication of JPS58106535A publication Critical patent/JPS58106535A/ja
Priority to US06/710,190 priority patent/US4686168A/en
Publication of JPS6411936B2 publication Critical patent/JPS6411936B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP56205876A 1981-12-19 1981-12-19 レジスト材料およびそれを用いる微細レジストパタ−ンの形成方法 Granted JPS58106535A (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP56205876A JPS58106535A (ja) 1981-12-19 1981-12-19 レジスト材料およびそれを用いる微細レジストパタ−ンの形成方法
DE8282111725T DE3279090D1 (en) 1981-12-19 1982-12-17 Resist material and process for forming fine resist pattern
CA000418004A CA1207099A (en) 1981-12-19 1982-12-17 Resist material and process for forming fine resist pattern
US06/450,726 US4539250A (en) 1981-12-19 1982-12-17 Resist material and process for forming fine resist pattern
EP82111725A EP0090089B1 (en) 1981-12-19 1982-12-17 Resist material and process for forming fine resist pattern
US06/710,190 US4686168A (en) 1981-12-19 1985-03-11 Fluoroalkyl acrylate resist material and process for forming fine resist pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56205876A JPS58106535A (ja) 1981-12-19 1981-12-19 レジスト材料およびそれを用いる微細レジストパタ−ンの形成方法

Publications (2)

Publication Number Publication Date
JPS58106535A JPS58106535A (ja) 1983-06-24
JPS6411936B2 true JPS6411936B2 (cg-RX-API-DMAC7.html) 1989-02-27

Family

ID=16514187

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56205876A Granted JPS58106535A (ja) 1981-12-19 1981-12-19 レジスト材料およびそれを用いる微細レジストパタ−ンの形成方法

Country Status (1)

Country Link
JP (1) JPS58106535A (cg-RX-API-DMAC7.html)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60117244A (ja) * 1983-11-30 1985-06-24 Fujitsu Ltd パタ−ン形成方法

Also Published As

Publication number Publication date
JPS58106535A (ja) 1983-06-24

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