JPS6410643A - Bonding method for semiconductor substrate - Google Patents
Bonding method for semiconductor substrateInfo
- Publication number
- JPS6410643A JPS6410643A JP62166148A JP16614887A JPS6410643A JP S6410643 A JPS6410643 A JP S6410643A JP 62166148 A JP62166148 A JP 62166148A JP 16614887 A JP16614887 A JP 16614887A JP S6410643 A JPS6410643 A JP S6410643A
- Authority
- JP
- Japan
- Prior art keywords
- bonding material
- semiconductor substrate
- bubbles
- substrate
- retaining base
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Mechanical Treatment Of Semiconductor (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
PURPOSE:To push out bubbles from bonding material when bubbles mix in the bonding material, and prevent effectively bubbles permeating into the bonding material, by pressing a semiconductor substrate in the state where the substrate is bent in the form of a partial sphere surface or in one direction, against a retaining base, via the bonding material. CONSTITUTION:Via bonding material 13, a semiconductor substrate 11 is pressed against a retaining base 12. At first, only a central part of the substrate is pressed against the retaining base 12. Then the vacuum state of a sucking member 14 is relaxed, and as the result, concentric circular ring parts of the semiconductor substrate 11 are pressed, in order, against the retaining substrate 12, by the effect of elastic restoring force of the semiconductor substrate 11. Therefore, even if bubbles are contained in the bonding material 13, they are pushed out in the form of concentric circles toward the outer periphery of the semiconductor substrate 11, and after all, bubbles are discharged from the bonding material 13. The pressing force at the central part of the semiconductor substrate 11 which is applied first to the retaining base 12 is kept, so that bubbles once discharged do not enter again the bonding material 13.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62166148A JPS6410643A (en) | 1987-07-02 | 1987-07-02 | Bonding method for semiconductor substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62166148A JPS6410643A (en) | 1987-07-02 | 1987-07-02 | Bonding method for semiconductor substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6410643A true JPS6410643A (en) | 1989-01-13 |
Family
ID=15825945
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62166148A Pending JPS6410643A (en) | 1987-07-02 | 1987-07-02 | Bonding method for semiconductor substrate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6410643A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5964978A (en) * | 1997-03-31 | 1999-10-12 | Shin-Etsu Handotai Co., Ltd. | Method and apparatus for adhesion of semiconductor substrate |
JP2001179578A (en) * | 1999-12-28 | 2001-07-03 | Shin Etsu Handotai Co Ltd | Wafer polishing method and wafer polishing device |
JP2002368023A (en) * | 2001-06-06 | 2002-12-20 | Hitachi Ltd | Method of manufacturing semiconductor device |
US6639392B2 (en) | 2001-08-08 | 2003-10-28 | Hitachi, Ltd. | Charged particle measuring device and measuring method thereof |
JP2005150311A (en) * | 2003-11-13 | 2005-06-09 | Nec Machinery Corp | Chip mounting method and apparatus thereof |
JP2019106493A (en) * | 2017-12-13 | 2019-06-27 | 第一精工株式会社 | Method for sticking adhesive tape to substrate and device for sticking adhesive tape to substrate |
-
1987
- 1987-07-02 JP JP62166148A patent/JPS6410643A/en active Pending
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5964978A (en) * | 1997-03-31 | 1999-10-12 | Shin-Etsu Handotai Co., Ltd. | Method and apparatus for adhesion of semiconductor substrate |
JP2001179578A (en) * | 1999-12-28 | 2001-07-03 | Shin Etsu Handotai Co Ltd | Wafer polishing method and wafer polishing device |
WO2001047664A1 (en) * | 1999-12-28 | 2001-07-05 | Shin-Etsu Handotai Co., Ltd. | Wafer polishing method and wafer polishing device |
US6764392B2 (en) | 1999-12-28 | 2004-07-20 | Shin-Etsu Handotai Co., Ltd. | Wafer polishing method and wafer polishing device |
JP2002368023A (en) * | 2001-06-06 | 2002-12-20 | Hitachi Ltd | Method of manufacturing semiconductor device |
US6639392B2 (en) | 2001-08-08 | 2003-10-28 | Hitachi, Ltd. | Charged particle measuring device and measuring method thereof |
US6774638B2 (en) | 2001-08-08 | 2004-08-10 | Hitachi, Ltd. | Charged particle measuring device and measuring method thereof |
JP2005150311A (en) * | 2003-11-13 | 2005-06-09 | Nec Machinery Corp | Chip mounting method and apparatus thereof |
JP2019106493A (en) * | 2017-12-13 | 2019-06-27 | 第一精工株式会社 | Method for sticking adhesive tape to substrate and device for sticking adhesive tape to substrate |
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