JPS6393631U - - Google Patents
Info
- Publication number
- JPS6393631U JPS6393631U JP18677486U JP18677486U JPS6393631U JP S6393631 U JPS6393631 U JP S6393631U JP 18677486 U JP18677486 U JP 18677486U JP 18677486 U JP18677486 U JP 18677486U JP S6393631 U JPS6393631 U JP S6393631U
- Authority
- JP
- Japan
- Prior art keywords
- stage
- light
- pattern
- photoelectric conversion
- conversion element
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005259 measurement Methods 0.000 claims description 3
- 238000006243 chemical reaction Methods 0.000 claims description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000001514 detection method Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
Landscapes
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Description
第１図は本案において、測定の対象となる像面
評価ウエハの説明図、第２図は本案の概略図、第
３図および第４図は第１図でウエハに露光されて
いるパターン部の断面図およびパターンからの反
射光検出例を示す図である。
１…レテイクル、２…パターン、３…ウエハ、
４…光電変換素子、５…結像レンズ、６…ハーフ
ミラー、７…コリメートレンズ、８…光源、９…
制御部、１０…プロツタ、１１…対物レンズ、１
２…ＸＹステージ、１３…測長系、１４…反射光
。
Figure 1 is an explanatory diagram of the image plane evaluation wafer that is the object of measurement in this proposal, Figure 2 is a schematic diagram of the invention, and Figures 3 and 4 are of the pattern portion exposed on the wafer in Figure 1. It is a figure which shows the cross-sectional view and the example of reflected light detection from a pattern. 1...Reticle, 2...Pattern, 3...Wafer,
4... Photoelectric conversion element, 5... Imaging lens, 6... Half mirror, 7... Collimating lens, 8... Light source, 9...
Control unit, 10... plotter, 11... objective lens, 1
2...XY stage, 13...Length measurement system, 14...Reflected light.
Claims (1)
態を確認する装置に於て、その位置を測定可能な
測長系を備えたＸＹステージと、ＸＹステージに
照射可能な光源と、照射光の反射光を電気信号に
変換可能な光電変換素子を設けたことを特徴とす
るパターン読み取り装置。 A device that confirms the resolution state of a pattern exposed and developed on a wafer includes an XY stage equipped with a length measurement system that can measure its position, a light source that can irradiate the XY stage, and reflection of the irradiated light. A pattern reading device characterized by being provided with a photoelectric conversion element capable of converting light into an electrical signal.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18677486U JPS6393631U (en) | 1986-12-05 | 1986-12-05 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18677486U JPS6393631U (en) | 1986-12-05 | 1986-12-05 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6393631U true JPS6393631U (en) | 1988-06-17 |
Family
ID=31136638
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18677486U Pending JPS6393631U (en) | 1986-12-05 | 1986-12-05 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6393631U (en) |
-
1986
- 1986-12-05 JP JP18677486U patent/JPS6393631U/ja active Pending
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